This invention discloses methods and apparatus for providing an ophthalmic lens of variable optical power. The variable optic insert may have surfaces within that have differing radii of curvature. The variable optic insert may also comprise polarizing elements. In some examples, an intermediate optic piece may be formed to comprise a UV absorbing dye, allowing differential processing of regions on either side of the intermediate optic piece. In some embodiments, an ophthalmic lens is cast-molded from a silicone hydrogel. The various ophthalmic lens entities may include electroactive liquid crystal layers to electrically control refractive characteristics.

The present invention provides an apparatus and method for optical centering of lenses, potentially to be used for automatic accurate alignment and bonding of said lenses into an imaging system. The non-rotating lens centering device includes a motorized focusing autocollimator, one or two aiming lasers coupled to the motorized focusing autocollimator, and an optical laser redirector such as retro-reflectors or beam splitters and mirrors. The system may comprise an imaging device for alignment and beam profiling, a computer device and algorithms for data analysis to provide information related to centering offsets to be corrected. Motorized correcting system will realign and eliminate the unwanted decentering and adjustment of the lens.

Methods, apparatus, and systems for mitigating pinhole defects in optical devices such as electrochromic windows. One method mitigates a pinhole defect in an electrochromic device by identifying the site of the pinhole defect and obscuring the pinhole to make it less visually discernible. In some cases, the pinhole defect may be the result of mitigating a short-related defect.

The present invention relates to a measuring device (10) and a method for determining a depth of field of an optical structure (100). In this case, the measuring device comprises a device body (12) with a measuring axis (14), the device body (12) being formed such that, in a measuring position, it can be placed in a stationary manner on a deposit plane of the optical structure such that the measuring axis (14) of the device body (12) coincides with an optical axis of the optical structure, wherein the device body (12) has a measurement scale (18) arranged along a scale line (16) such that the scale line (16) encloses with the direction of the measuring axis (14) a scale angle φ greater than 0° and less than 90° and the measurement scale (18) can be optically detected in the measuring position of the device body (12) by the optical structure (100) for determining the depth of field.

Optical gratings, such as those used in waveguide displays, may have large aspect ratios. For example, a grating characteristic (e.g., period, feature size, etc.) can be much smaller than the grating area. Variations in the grating characteristic over the grating area may appear like a secondary grating having a long grating period superimposed on a primary grating for which the optical grating was designed. Because variations responsible for the secondary grating occur over a long distance relative to the primary grating period, it may be difficult to locate and characterize these variations with testing methods designed for shorter distances. The present disclosure presents systems and methods to detect and characterize the secondary gratings quickly and efficiently.

According to one embodiment, an optical test apparatus includes a first aperture, a second aperture, an image sensor, and a first lens. The first aperture includes a first aperture plane provided with a first wavelength selecting region. The second aperture includes a second aperture plane provided with a second wavelength selecting region different from the first wavelength selecting region. The image sensor is configured to image a light beam passing through the first aperture plane and the second aperture plane and reaching an imaging plane. The first lens is configured to make a light beam passing through the first aperture plane and the second aperture plane be incident on the imaging plane.

An endpoint detection system for enhanced spectral data collection is provided. An optical bundle is coupled to a light source configured to generate incident light. The optical bundle includes two or more sets of optical fibers that each include an emitting optical fiber and a receiving optical fiber. The receiving optical fibers are disposed within the optical bundle at a pairing angle relative to a respective emitting optical fiber. The optical bundle is also coupled to a collimator assembly that includes an achromatic lens. The achromatic lens receives a first light beam of incident light from a first emitting optical fiber and directs spectral components of the first light beam to a first and second portion of a surface of a substrate. The first portion of the substrate surface is substantially the same as the second portion. The achromatic lens collects reflected spectral components that are produced by the spectral components directed to the first and second portions of the substrate surface. The achromatic lens transmits the reflected spectral components to a first receiving fiber of the optical fiber bundle, which transmits the reflected spectral components to a light detection component. A processing device coupled to the light detection component determines a reflectance of the substrate surface based on the reflected spectral components.

To determine an imaging quality of an optical system when illuminated by illumination light within a pupil to be measured of the optical system and/or to qualify the phase effect of a test structure, a test structure that is periodic in at least one dimension is initially arranged in an object plane of the optical system. An initial illumination angle distribution for illuminating the test structure with an initial pupil region, whose area is less than 10% of a total pupil area, is specified and the test structure is illuminated thereby in different distance positions relative to the object plane. In this way, an initial measured aerial image of the test structure is determined. Specifying the illumination distribution, illuminating and determining the aerial image are then repeated for a further illumination angle distribution and an imaging contribution of the optical system is determined from a comparison of the measured aerial images, the imaging quality parameter to be determined and/or a complex-valued diffraction spectrum of the test structure being determined from said imaging contribution. A metrology system for carrying out the method comprises a holder for the test structure, an illumination optical unit, a specification device for specifying the illumination angle distributions, the optical system to be examined in respect of its imaging quality, and a spatially resolving detection device for determining aerial images. This yields an improved imaging quality determination method.

A new diversity concept is provided for achieving accurate phase retrieval with a singleshot acquisition. Multiple irradiance data are obtained by a diffractive grating or CGH designed to generate multiple diffraction orders with different diversity values. The effective filters associated with the individual diffraction orders from the diffractive grating or CGH are calculated. The effective filters are extracted by numerical propagation, and they preferably include both real and imaginary values, which signify both absorption and phase shift versus position in the filter plane. The reconstruction process utilizes accurate knowledge of the effective filters for each diffraction order for high quality reconstruction of the extrinsic phase.

When replacing a mirror in a projection exposure apparatus, a mirror for replacement is initially removed (41). Position- and orientation data of the removed mirror for replacement are measured (43) by a position -and orientation data measuring device. Furthermore, position- and orientation data of a replacement mirror, to be inserted in place of the mirror for replacement, are measured (46) using the position- and orientation data measuring device. Bearing points of the replacement mirror are reworked (48) on the basis of ascertained differences between, firstly, the position- and orientation data of the mirror for replacement and, secondly, the position- and orientation data of the replacement mirror. The reworked replacement mirror is installed (54). This yields a mirror replacement method, in which an adjustment outlay of the replacement mirror in the projection exposure apparatus is reduced.