Patent classifications
G
G01
G01N
21/00
G01N21/84
G01N21/88
G01N21/95
G01N21/956
G01N2021/9563
G01N2021/9563
System and Method for Inspection of Multiple Features of Patterned Objects in the Manufacture of Electrical Circuits
A method for inspection of multiple features of patterned objects in the manufacture of electrical circuits, the method including performing defect detection on the patterned object, employing an optical defect detection machine (ODDM) and employing the ODDM to measure at least one of spatial coordinates and physical attributes of at least some of the multiple features.