An X-ray analysis system is provided with multi-source design and an X-ray analysis method is provided with multi-source design. According to the embodiments, the X-ray analysis system includes a ray source including a plurality of ray generating devices that generate a ray; a detector that detects a signal generated due to an analyzed object being irradiated by the ray from the ray source; and a controller that controls the ray source, so that two or more ray generating devices in the ray source simultaneously generate corresponding rays to irradiate the analyzed object.

This application addresses an integrated smart system to control the variables involved in the process for melting mineral concentrates. Specifically, it addresses an integrated smart system that allows the whole melting process operation to be controlled, measuring the mineralogical quality and quantity of the concentrate that is injected into the melting furnace, as well as variables such as the temperature, the level of the liquid phases and the percentage of copper within the furnace. In this manner, by reading said variables, it acts autonomously on manipulated variables, considering uncertainties, allowing a stable temperature to be maintained in the reactor, allowing products to be obtained at the required quality and controlling the liquid phases therein, among other controlled variables, to achieve efficient melting.

A system and methods for petro-steering methodologies are provided. An exemplary method obtains rock fabric data, and integrate rock fabric data with dynamic productivity data to identify patterns between the rock fabric data and dynamic productivity data. Gas rates and steering values are predicted across UBCT wells based on the patterns.

The present disclosure relates to methods of obtaining electron diffraction data of microcrystalline samples.

A high harmonic radiation source and associated method of generating high harmonic radiation is disclosed. The high harmonic radiation source is configured to condition a gas medium by irradiating the gas medium with a pre-pulse of radiation, thereby generating a plasma comprising a pre-pulse plasma distribution; and irradiate the gas medium with a main pulse of radiation to generate said high harmonic radiation. The conditioning step is such that the plasma comprising a pre-pulse plasma distribution acts to configure a wavefront of said main pulse to improve one or both of: the efficiency of the high harmonic generation process and the beam quality of the high harmonic radiation. The high harmonic radiation source further may comprise a beam shaping device configured to shape said customized pre-pulse prior to said conditioning.

A device for examining a sample by means of X-radiation is provided, the device comprising: a radiation generation system for generating primary radiation; a first goniometer arm on which the radiation generation system is mounted and which is pivotable about a goniometer axis; a detection system configured to detect secondary radiation emanating from the sample; a second goniometer arm on which the detection system is mounted and which is pivotable about the goniometer axis; an evacuable sample chamber within which the sample is arrangeable in a sample region encompassing a portion of the goniometer axis, the sample chamber being delimited by a sample chamber wall which has a transmission region which is transmissive to the primary radiation and is vacuum-tight, in order to allow the primary radiation to penetrate into the sample chamber and to impinge on the sample region at different angles of incidence; wherein the sample chamber has a first opening in a detection beam path, at which the sample chamber and the detection system are connectable in a vacuum-tight manner so that the detection beam path is evacuable.

An object of the present invention is to provide a method of preparing a sample for crystallographic analysis used for structure determination based on the crystalline sponge method. The present invention provides a method of preparing a sample for crystallographic analysis used for structure determination based on the crystalline sponge method, the method including the steps: (A) forming an ionic pair of a target compound of analysis with a counterionic compound, and (B) soaking the ionic pair of the compounds into a crystalline sponge, wherein the target compound of analysis is a basic compound or an acidic compound.

A well-logging tool may include a sonde housing and a radiation generator carried by the sonde housing. The radiation generator may include a generator housing, a target carried by the generator housing, a charged particle source carried by the generator housing to direct charged particles at the target, and at least one voltage source coupled to the charged particle source. The at least one voltage source may include a voltage ladder comprising a plurality of voltage multiplication stages coupled in a uni-polar configuration, and at least one loading coil coupled at at least one intermediate position along the voltage ladder. The well-logging tool may further include at least one radiation detector carried by the sonde housing.

An airborne particle-measuring device quantifies and qualifies contaminants of an air environment in clean-rooms, open spaces, and enclosed spaces such as homes, offices, industrial environments, airplanes in flight, cars and others. The device may include a sensor system, an electronics system, communications and information storage. The sensor system may include a high-power low-wavelength single-frequency continuous laser, an open-cavity high-efficiency mirror having an optical surface tuned to the laser frequency and a flow system that includes a vacuum pump to sample the air. The electronics system may be mounted on a single multilayer PC board with a microprocessor, firmware, electronics and a touch-screen LCD display. Innovations in light source, flow control, analog and digital signal processing, components integration and software allow provision of equipment in a wide range of high-complexity settings that require precise particle measurements.

Methods and systems for characterizing dimensions and material properties of semiconductor devices by full beam x-ray scatterometry are described herein. A full beam x-ray scatterometry measurement involves illuminating a sample with an X-ray beam and detecting the intensities of the resulting zero diffraction order and higher diffraction orders simultaneously for one or more angles of incidence relative to the sample. The simultaneous measurement of the direct beam and the scattered orders enables high throughput measurements with improved accuracy. The full beam x-ray scatterometry system includes one or more photon counting detectors with high dynamic range and thick, highly absorptive crystal substrates that absorb the direct beam with minimal parasitic backscattering. In other aspects, model based measurements are performed based on the zero diffraction order beam, and measurement performance of the full beam x-ray scatterometry system is estimated and controlled based on properties of the measured zero order beam.