A doubly bent X-ray spectroscopic device (1) according to the present invention includes: a glass plate (3) which is deformed into a shape having a doubly bent surface by being sandwiched between a doubly curved convex surface (21a) of a convex forming die (21) and a doubly curved concave surface (22a), of a concave forming die (22), that matches the doubly curved convex surface (21a), and being heated to a temperature of 400° C. to 600° C.; and a reflection coating (5) configured to reflect X-rays, which is formed on a concave surface (3a) of the deformed glass plate (3 ).

A method and a device for determining the material properties of a polycrystalline, in particular metallic, product during production or quality control of the polycrystalline, in particular metallic, product by means of X-ray diffraction using at least one X-ray source and at least one X-ray detector. In this case, an X-ray generated by the X-ray source is directed onto a surface of the polycrystalline product and the resulting diffraction image of the X-ray is recorded by the X-ray detector. After exiting the X-ray source, the X-ray is passed through an X-ray mirror, wherein the X-ray is both monochromatized and focused, by the X-ray mirror, in the direction of the polycrystalline product and/or the X-ray detector, and then reaches a surface of the metallic product.

Backscatter imaging systems and methods that involve moving an emitter and a broad spectrum detector in helical motion along a medium being imaged while the emitter emits substantially monochromatic X-rays and/or gamma rays, and the broad spectrum detector acquires intensity measurement of photons backscattered from the medium. The intensity measurements are transformed into three-dimensional image data of the medium corresponding to density variations.

An X-ray thin film inspection device of the present invention includes an X-ray irradiation unit 40 installed on a first rotation arm 32, an X-ray detector 50 installed on a second rotation arm 33, and a fluorescence X-ray detector 60 for detecting fluorescence X-rays generated from an inspection target upon irradiation of X-rays. The X-ray irradiation unit 40 includes an X-ray optical element 43 comprising a confocal mirror for receiving X-rays radiated from an X-ray tube 42, reflects plural focused X-ray beams monochromatized at a specific wavelength and focuses the plural focused X-ray beams to a preset focal point, and a slit mechanism 46 for passing therethrough any number of focused X-ray beams out of the plural focused X-ray beams reflected from the X-ray optical element 43.

This disclosure relates to an apparatus and methods for applying X-ray reflectometry (XRR) in characterizing three dimensional nanostructures supported on a flat substrate with a miniscule sampling area and a thickness in nanometers. In particular, this disclosure is targeted for addressing the difficulties encountered when XRR is applied to samples with intricate nanostructures along all three directions, e.g. arrays of nanostructured poles or shafts. Convergent X-ray with long wavelength, greater than that from a copper anode of 0.154 nm and less than twice of the characteristic dimensions along the film thickness direction, is preferably used with appropriate collimations on both incident and detection arms to enable the XRR for measurements of samples with limited sample area and scattering volumes. In one embodiment, the incident angle of the long-wavelength focused X-ray is ≥24°, and the sample area is ≤25 μm×25 μm.

The present invention relates to a method, and a corresponding device, for testing a radius of curvature and/or for detecting inhomogeneities of a curved X-ray grating for a grating-based X-ray imaging device. The method comprises generating a beam of light diverging from a source point, propagating along a main optical axis and having a line-shaped beam profile. The method comprises reflecting the beam off a concave reflective surface of the grating. A principal axis of the concave reflective surface coincides with the main optical axis and the source point is at a predetermined distance from a point where the main optical axis intersects the concave reflective surface. The method comprises determining whether a projection of the reflected beam in a plane at or near the source point is present outside a central region around the source point, in which an absence of this projection outside the central region indicates that a radius of curvature of the concave reflective surface corresponds to the predetermined distance and/or that the reflective surface is substantially homogeneously curved along a curve formed by the beam impinging on the concave reflective surface.

The density difference of particle beam irradiation with two optical statuses is produced utilizing a diffraction effect, within the same field of vision, such that a diffraction grating manufactured with a material which passes through a particle beam is provided on the upper side of a specimen and on the lower side of the irradiation optical system. Further, a region wider than the opening region of the diffraction grating is irradiated with the particle beam to produce the density difference of the particle beam emitted to the specimen, by superposing the particle beam, Bragg-diffracted with the opening region, and the particle beam, transmitted through the outer peripheral part of the opening region without being diffracted, with each other, and emitting the beam to the specimen.

A wavelength dispersive X-ray fluorescence spectrometer includes a single one-dimensional detector (10) having detection elements (7) arranged linearly, and includes a detector position change mechanism (11) for setting a position of the one-dimensional detector (10) to either a parallel position at which an arrangement direction of the detection elements (7) is parallel to a spectral angle direction of a spectroscopic device (6) or an intersection position at which the arrangement direction intersects the spectral angle direction. At the parallel position, a receiving surface of the one-dimensional detector (10) is located at a focal point of focused secondary X-rays (42). At the intersection position, a receiving slit (9) is disposed at the focal point of the focused secondary X-rays (42), and the receiving surface is located at a traveling direction side of the focused secondary X-rays (42) farther from the spectroscopic device (6) than the receiving slit (9).

An X-ray generation apparatus comprising: an X-ray generating unit; a dispersive crystal whose surface is irradiated with an X-ray generated from the X-ray generating unit in order to monochromatize the X-ray; and a detecting unit that detects an X-ray generated from a sample irradiated with the X-ray monochromatized by the dispersive crystal. The dispersive crystal has a single-bent shape containing the surface that is a concave surface formed by integrating concave curve lines continuously along an axis perpendicular to a plane including the concave curve line. A direction in which a position on the surface irradiated with the X-ray generated from the X-ray generating unit moves is the direction along the axis.

This disclosure relates to an apparatus and methods for applying X-ray reflectometry (XRR) in characterizing three dimensional nanostructures supported on a flat substrate with a miniscule sampling area and a thickness in nanometers. In particular, this disclosure is targeted for addressing the difficulties encountered when XRR is applied to samples with intricate nanostructures along all three directions, e.g. arrays of nanostructured poles or shafts. Convergent X-ray with long wavelength, greater than that from a copper anode of 0.154 nm and less than twice of the characteristic dimensions along the film thickness direction, is preferably used with appropriate collimations on both incident and detection arms to enable the XRR for measurements of samples with limited sample area and scattering volumes. In one embodiment, the incident angle of the long-wavelength focused X-ray is 24, and the sample area is 25 m25 m.