A method comprises the steps of: (a) Obtaining a measured X-ray spectrum for the coated sample, for determining characteristics for the sample and for a coating material; (b) Determining a simulated X-ray spectrum for the sample based on an initial sample composition; (c) Determining an adapted sample composition that improves a match between the characteristics of the sample and an adapted simulated X ray spectrum; (d) Determining an adapted coating thickness for the coating material based on the adapted sample composition and characteristics of the coating; and (e) Repeating the steps (b) to (d) using the adapted sample composition and the adapted coating thickness of the coating material instead of the initial values, wherein the coating thickness is used for determining an absorption of X-rays.

An X-ray fluorescence spectrometer of the present invention includes: a determination module (21) configured to determine, with respect to every one of measurement lines that correspond to secondary X-rays having intensities to be measured, whether or not a ratio of a theoretical intensity in thin film calculated on the basis of an assumed thickness and known contents of respective components to a theoretical intensity in bulk calculated on the basis of the known contents of the respective components exceeds a predetermined threshold; and a saturation thickness quantification module (23) configured to, according to a positive determination by the determination module (21), calculate a saturation thickness with respect to each of the measurement lines, at which the theoretical intensity saturates, on the basis of the known contents of the respective components and to adopt a largest saturation thickness as a quantitative value of a thickness.

There is provided a system and method of measuring a lateral recess in a semiconductor specimen, comprising: obtaining a first image acquired by collecting SEs emitted from the surface of the specimen, and a second image acquired by collecting BSEs scattered from an interior region of the specimen between the surface and a target second layer, the specimen scanned using an electron beam with a landing energy selected to penetrate to a depth corresponding to the target second layer; generating a first GL waveform based on the first image, and a second GL waveform based on the second image; estimating a first width of the first layers based on the first GL waveform, and a second width with respect to at least the target second layer based on the second GL; and measuring a lateral recess based on the first width and the second width.

A method for measuring average thickness of a metal or alloy coating on a metal or alloy substrate using an X-ray fluorescence (XRF) spectrometer is used when the coating has an uneven surface at different distances from a measurement window of the XRF spectrometer. The method includes measuring elemental composition of the coating or substrate using the XRF spectrometer and obtaining the average thickness of the coating using a calibration relationship between coating thickness and elemental composition of the coating or substrate. The metal or alloy coating may be a metal or alloy coating of a plurality of outer armor wires wrapped around a cable. The method may be used to analyze coating thickness changes over time or along the length of the cable, or to analyze a corrosive environment in order to choose optimal material for a metal or alloy coating.

There is provided an acquiring method of a projection image of a sample whose shape is uneven with respect to a rotation center, the method comprising the steps of setting the sample S0 at a position of the rotation center C0 provided between an X-ray source 116a and a detector 117, and acquiring the projection image of the sample S0 at each different rotation angle for each different magnification ratio over a rotation angle of 180° or more by rotating the sample S0 around the rotation center C0, and by relatively changing a separation distance between the X-ray source and the rotation center, or a separation distance between the rotation center and the detector in an optical axis direction according to the shape of the sample S0 and the rotation angle of the sample S0.

A film forming apparatus and a film forming apparatus usage. The film forming apparatus has a film forming chamber, a substrate retaining part, a heating unit, a shower head, and a physical characteristics detector. The physical characteristics detector includes an irradiation part that irradiates a film formed on a surface of a substrate with a beam, a receiver to receive the beam reflected by the film, and a detection unit that detects physical characteristics of the film based on the beam received by the receiver. The shower head includes a supply plane facing the film forming plane, multiple discharge outlets provided in the supply plane, a main body to transport source gas to the multiple discharge outlets, a first transmissive part that transmits the beam emitted by the irradiation part, and a second transmissive part that transmits the reflected beam and is located at a different position than the first transmissive part.

Use of high resolution environmental scanning electron microscopy to capture images of contact lens coating layers, enabling measurement of the coating thickness and structures of the coating layer to be precisely characterized. The coating layer can be directly visualized and quantitatively measured. Furthermore, controlled environments of varying temperatures and varying levels of relative humidity can be established in environmental scanning electron microscopy, such that the dynamic changes of the coating in such conditions can be imaged and measured. The controlled environments can be set up to mimic either the manufacturing process conditions, or be set up to simulate lens-on-eye conditions.

Provided are a standard sample film for use in laser ablation inductively coupled plasma mass spectrometry, the standard sample film containing an organic substance and having a small variation in signal intensity of an ion of a metal element depending on a measurement position; a standard sample; a method for producing a standard sample film; a sample set; a quantitative analysis method; and a transfer film. The standard sample film of the present invention is a standard sample film for use in laser ablation inductively coupled plasma mass spectrometry, the standard sample film containing a polymer and a metal element, and having a maximum height difference in film thickness of the standard sample film of 0.50 μm or less.

A method of manufacturing a film (F1) including cavities and formed from a polymer in which a cavitating agent is dispersed, said method including a step of extruding the polymer through an extrusion die equipped with adjustment actuators for adjusting thickness of the extruded film, and a step of stretching (Str1) the film, as well as establishing a mapping function of the film on the basis of mass-per-unit-area profiles of the film before and after the stretching step, establishing a stretch profile of the film as stretched on the basis of said mapping function and of said transverse mass-per-unit-area profiles, and establishing a characteristic transverse profile that is characteristic of the film on the basis of said stretch profile and of a transverse profile of the concentration by mass of cavitating agent in the film as stretched that makes it possible to take into account the distribution of the cavities in the film; in which method said adjustment actuators are controlled as a function of said characteristic transverse profile.

An insulating device includes a first electrode, a second electrode, and an insulating film. The insulating film is located between the first electrode and the second electrode. The insulating film includes a positive charged region. The positive charged region is located at a portion in a direction from the first electrode toward the second electrode.