The present specification provides a detector for an X-ray imaging system. The detector includes at least one high resolution layer having high resolution wavelength-shifting optical fibers, each fiber occupying a distinct region of the detector, at least one low resolution layer with low resolution regions, and a single segmented multi-channel photo-multiplier tube for coupling signals obtained from the high resolution fibers and the low resolution regions.

The present specification provides a detector for an X-ray imaging system. The detector includes at least one high resolution layer having high resolution wavelength-shifting optical fibers, each fiber occupying a distinct region of the detector, at least one low resolution layer with low resolution regions, and a single segmented multi-channel photo-multiplier tube for coupling signals obtained from the high resolution fibers and the low resolution regions.

This disclosure relates to an apparatus and methods for applying X-ray reflectometry (XRR) in characterizing three dimensional nanostructures supported on a flat substrate with a miniscule sampling area and a thickness in nanometers. In particular, this disclosure is targeted for addressing the difficulties encountered when XRR is applied to samples with intricate nanostructures along all three directions, e.g. arrays of nanostructured poles or shafts. Convergent X-ray with long wavelength, greater than that from a copper anode of 0.154 nm and less than twice of the characteristic dimensions along the film thickness direction, is preferably used with appropriate collimations on both incident and detection arms to enable the XRR for measurements of samples with limited sample area and scattering volumes.

This disclosure relates to an apparatus and methods for applying X-ray reflectometry (XRR) in characterizing three dimensional nanostructures supported on a flat substrate with a miniscule sampling area and a thickness in nanometers. In particular, this disclosure is targeted for addressing the difficulties encountered when XRR is applied to samples with intricate nanostructures along all three directions, e.g. arrays of nanostructured poles or shafts. Convergent X-ray with long wavelength, greater than that from a copper anode of 0.154 nm and less than twice of the characteristic dimensions along the film thickness direction, is preferably used with appropriate collimations on both incident and detection arms to enable the XRR for measurements of samples with limited sample area and scattering volumes.

A method of inspecting a structure during additive manufacturing of the structure and additive manufacturing systems are presented. An additive manufacturing system comprises additive manufacturing equipment comprising a casing and an additive manufacturing head configured to form a plurality of layers of a structure within the casing; and an x-ray backscatter imaging system configured to send an x-ray beam into a structure formed within the additive manufacturing equipment and detect scattered x-rays for imaging and analysis of the structure during fabrication.

A method of inspecting a structure during additive manufacturing of the structure and additive manufacturing systems are presented. An additive manufacturing system comprises additive manufacturing equipment comprising a casing and an additive manufacturing head configured to form a plurality of layers of a structure within the casing; and an x-ray backscatter imaging system configured to send an x-ray beam into a structure formed within the additive manufacturing equipment and detect scattered x-rays for imaging and analysis of the structure during fabrication.

Described herein are systems and methods for backscatter imaging. A backscatter imaging system configurable in real-time for imaging an object is provided. The backscatter imaging system includes a source array including a plurality of discrete sources, and a collimator array including a plurality of collimators corresponding to the plurality of discrete sources. The source array is configured to selectively activate the plurality of discrete sources at a frequency that is determined based at least in part on a speed of the object relative to the backscatter imaging system.

Described herein are systems and methods for backscatter imaging. A backscatter imaging system configurable in real-time for imaging an object is provided. The backscatter imaging system includes a source array including a plurality of discrete sources, and a collimator array including a plurality of collimators corresponding to the plurality of discrete sources. The source array is configured to selectively activate the plurality of discrete sources at a frequency that is determined based at least in part on a speed of the object relative to the backscatter imaging system.

A device and method for measuring angles of orientation of an x-ray imaging system including an x-ray source, an x-ray detector and a sample holder arranged to receive a sample to be analysed. The method includes: emitting a polychromatic x-ray beam through a reference sample installed on the sample holder in order to form a diffraction pattern on the sensing area of the x-ray detector, generating, with the x-ray detector, an observed image comprising the diffraction pattern, and determining the orientation of the x-ray source and the orientation of the x-ray detector by comparing the observed image with at least one target image comprising a diffraction pattern obtained for the reference sample with preset orientations of the x-ray source and of the x-ray detector.

A method and assembly for protecting flat detectors for electromagnetic radiation and/or particle radiation from excessive local intensities in an experiment to be conducted. Multiple absorbers are intelligently positioned in front of sections of a detector area, and further disclosing a detector protection arrangement for protecting area detectors for electromagnetic radiation and/or particle radiation from excessive local intensities.