A method of determining a presence, concentration or change in concentration of a first or second material in an environment is disclosed. The method comprises measuring a response of a first sensor to the first and second material, wherein the first sensor is one of a metal oxide sensor, an electrochemical sensor, a photoionisation sensor, an infrared sensor, a pellistor sensor, an optical particle monitor, a quartz crystal microbalance sensor, a surface acoustic wave sensor, a cavity ring-down spectroscopy sensor, or a biosensor. The method further comprises measuring a response of a second sensor to the first and second material, wherein the second sensor is another one of a metal oxide sensor, an electrochemical sensor, a photoionisation sensor, an infrared sensor, a pellistor sensor, an optical particle monitor, a quartz crystal microbalance sensor, a surface acoustic wave sensor, a cavity ring-down spectroscopy sensor, a biosensor or a field effect transistor sensor. The method further comprises determining from first and second sensor measurements, a presence, concentration or change in concentration of the first or second material.

An apparatus for determining a presence, a concentration or a change in concentration of a target material in an environment is disclosed. The apparatus comprises first and second sensors configured to respond to the target material. The apparatus further comprises a fluid inlet in fluid communication with the environment, and a valve assembly having a first and second configuration. In the first configuration, the fluid inlet is in fluid communication with only the first sensor. In the second configuration, the fluid inlet is in fluid communication with the first sensor and the second sensor.

Certain aspects of the technology disclosed herein include an apparatus and method for programming a crystal lattice structure of a nanoparticle. A particle programming apparatus can include an input channel connected a particle sampling system. The particle sampling system can direct freshly milled nanoparticles to the particle programming apparatus if the nanoparticles are determined to be below a threshold size. The particle programming apparatus can include one or more programming devices configured to alter a crystal lattice of the received nanoparticles including an ultrasonic sound generator, a magnetic pulse generator, and a voltage generator. The one or more programming devices applies any of a sound, magnetic pulse, and voltage to the received nanoparticles within a time threshold of receiving the nanoparticles from the mill core.

An apparatus for determining a presence, a concentration or a change in concentration of a target material in an environment is disclosed. The apparatus comprises first and second sensors configured to respond to the target material. The apparatus further comprises a fluid inlet in fluid communication with the environment, and a valve assembly having a first and second configuration. In the first configuration, the fluid inlet is in fluid communication with only the first sensor. In the second configuration, the fluid inlet is in fluid communication with the first sensor and the second sensor.

Certain aspects of the technology disclosed herein include an apparatus and method for programming a crystal lattice structure of a nanoparticle. A particle programming apparatus can include an input channel connected a particle sampling system. The particle sampling system can direct freshly milled nanoparticles to the particle programming apparatus if the nanoparticles are determined to be below a threshold size. The particle programming apparatus can include one or more programming devices configured to alter a crystal lattice of the received nanoparticles including an ultrasonic sound generator, a magnetic pulse generator, and a voltage generator. The one or more programming devices applies any of a sound, magnetic pulse, and voltage to the received nanoparticles within a time threshold of receiving the nanoparticles from the mill core.