A system includes a sensor comprising a sensor bonding layer disposed on a surface of the sensor, wherein the sensor bonding layer is a metallic alloy. An inlay includes a planar outer surface, wherein the inlay may be disposed on a curved surface of a structure. A structure bonding layer may be disposed on the planar outer surface of the inlay, wherein the structure bonding layer is a metallic alloy. The sensor bonding layer is coupled to the structure bonding layer via a metallic joint, and the sensor is configured to sense data of the structure through the metallic joint, the structure bonding layer, and the sensor bonding layer. The inlay comprises at least one of a modulus of elasticity, a shape, a thickness, and a size configured to reduce strain transmitted to the sensor.

Sensors, as well as systems and methods of using the same are provided. Aspects of the sensors include a piezoelectric base, a plurality of surface-associated compositions that are stably associated with the piezoelectric base, and a plurality of crosslinking compositions that are configured to crosslink one or more surface-associated compositions in the presence of an analyte. The sensors, systems and methods described herein find use in a variety of applications, including the detection of an analyte in a sample.

A sensor apparatus capable of measuring an analyte with excellent sensitivity is provided. A sensor apparatus includes an element substrate; a detecting section disposed on an upper surface of the element substrate, the detecting element including a reaction section having an immobilization film to detect an analyte, a first IDT electrode configured to generate an acoustic wave which propagates toward the reaction section, and a second IDT electrode configured to receive the acoustic wave which has passed through the reaction section; and a protective film which covers the first IDT electrode and the second IDT electrode. The element substrate is configured so that a region where the reaction section is located is at a lower level than a region where the first IDT electrode is located and a region where the second IDT electrode is located.

Devices, systems, methods, and kits of parts for monitoring operation of an electron beam additive manufacturing systems are disclosed. A monitoring system includes one or more measuring devices positioned on the at least one wall in the interior of a build chamber of the additive manufacturing system. Each one of the one or more measuring devices includes a piezoelectric crystal. The monitoring system further includes an analysis component communicatively coupled to the one or more measuring devices. The analysis component is programmed to receive information pertaining to a frequency of oscillation of the piezoelectric crystal. A collection of material on the one or more measuring devices during formation of an article within the build chamber causes a change to the frequency of oscillation of the piezoelectric crystal that is detectable by the analysis component and usable to determine a potential build anomaly of the article.

Devices, systems, methods, and kits of parts for monitoring operation of an electron beam additive manufacturing systems are disclosed. A monitoring system includes one or more measuring devices positioned on the at least one wall in the interior of a build chamber of the additive manufacturing system. Each one of the one or more measuring devices includes a piezoelectric crystal. The monitoring system further includes an analysis component communicatively coupled to the one or more measuring devices. The analysis component is programmed to receive information pertaining to a frequency of oscillation of the piezoelectric crystal. A collection of material on the one or more measuring devices during formation of an article within the build chamber causes a change to the frequency of oscillation of the piezoelectric crystal that is detectable by the analysis component and usable to determine a potential build anomaly of the article.

A polymer material is contained in a sensing film of a sensor element having a quartz plate, an electrode made of a metal film provided on the quartz plate, and a sensing film provided on the electrode, and has a structural unit that contains one or more ethylene unsaturated bonds and is originated from a compound containing one or more functional groups reactive to a gas.

A method for operating an optical apparatus (100A, 100B, 200), having a structural element (201) which is arranged in a residual gas atmosphere (RGA) of the apparatus and which is formed at least partly from an element material subjected to a chemical reduction process and/or an etching process with a plasma component (PK) present in the residual gas atmosphere includes: feeding (S2) a gas component (GK) that at least partly suppresses the reduction process depending on a detected suppression extent (UM) for a suppression of the etching process and/or reduction process by the suppressing gas component in the residual gas atmosphere; and detecting (S1) the suppression extent with a sensor unit (208) arranged in the residual gas atmosphere. The sensor unit includes a sensor material section (211) composed of a sensor material and exhibiting a sensor section property that is measurable under the influence of the suppressing gas component.

In a preferred embodiment, there is provided a quartz crystal microbalance comprising a pair of electrodes and a quartz crystal disposed therebetween, one said electrode operable as a sensing electrode for interacting with an analyte, wherein said sensing electrode comprises an array of sensing electrode members positioned within a sensing electrode surface portion on the quartz crystal.

Surface modifications and improvements to piezoelectric-based sensors, such as QCMs and other piezoelectric devices, that significantly increase the sensitivity and the specificity (selectivity). These modifications can comprise mechanical and chemical changes to the surfaces of the sensors, either individually or together. For example, nanosize structures may be provided on the surface to improve sensitivity. Additionally, chemical coatings may be tethered to the surfaces, walls, or crystal to provide targeted sensitivity. Additionally, porous, layered and multiple sensor arrays may be formed to enhance sensitivity and selectivity.

Apparatus and method of characterizing a material. A sample of a material to be characterized is placed into a thermomechanical analyzer (TMA) instrument, the material sample being a cylindrically- or rectangularly-shaped pellet having parallel top and bottom faces. The TMA has a measurement probe with a single buffer rod intermediate an ultrasound transducer and the top face of the material sample. Ultrasound waves are transmitted through the buffer rod and the top face of the material sample. Signals from the ultrasound waves passing through the material sample are received using a receiving sensor below the bottom face of the material sample. The TMA instrument is then used to control the temperature and forces applied to the material sample and to measure changing length of the material sample. Finally, the ultrasonic attenuation and velocity properties of the material are calculated as a function of the material sample length measurement and received ultrasound signals.