Provided is a wire grid polarization plate that has heat resistance and excellent polarization properties, and has durability even in a thin wire structure with a small pitch, and an optical apparatus and a manufacturing method of a polarization plate. A periodic lamellar structure is formed with a material forming arrangement by self-assembling performance, and then, is metallized, and thus, metal wires arranged at a small pitch are prepared, and the obtained wires are fixed by a dielectric material.

A HUD system including a light source projecting p-polarized light towards a glazing, the glazing includes an outer sheet of glass having a first surface and a second surface, and an inner sheet of glass having a first surface and a second surface, and the second surface of the inner sheet of glass has a first coating, where both sheets are bonded by at least one sheet of interlayer material, and the first coating includes at least one high refractive index layer having a thickness from 50 to 100 nm, and at least one low refractive index layer having a thickness from 70 to 160 nm, and the least one high refractive index layer has at least one of an oxide of Zr, Nb, Sn; a mixed oxide of Ti, Zr, Nb, Si, Sb, Sn, Zn, In; a nitride of Si, Zr; or a mixed nitride of Si, Zr.

To provide a light-emitting apparatus capable of shaping light from a plurality of light-emitting elements into light with a plurality of shapes and a manufacturing method thereof. A light-emitting apparatus according to the present disclosure, including: a substrate; a plurality of light-emitting elements which are provided on a side of a first surface of the substrate; and a plurality of first lenses which are provided on a side of a second surface of the substrate and on which light emitted from the plurality of light-emitting elements is incident, wherein the plurality of first lenses include at least two types of lenses among a concave lens, a convex lens, and a flat lens.

An electronic device is provided. The electronic device includes a display panel, a conductive layer, and a first refractive index matching layer. The first refractive index matching layer is between the conductive layer and the second substrate. The refractive index of the first refractive index matching layer is smaller than the refractive index of the conductive layer. The display panel includes a first substrate and a second substrate. The second substrate is above the first substrate.

An electronic device is provided. The electronic device includes a display panel, a conductive layer, and a first refractive index matching layer. The first refractive index matching layer is between the conductive layer and the second substrate. The refractive index of the first refractive index matching layer is smaller than the refractive index of the conductive layer. The display panel includes a first substrate and a second substrate. The second substrate is above the first substrate.

The present technology relates to a solid state imaging sensor that is possible to suppress the reflection of incident light with a wide wavelength band. A reflectance adjusting layer is provided on the substrate in an incident direction of the incident light with respect to the substrate such as Si and configured to adjust reflection of the incident light on the substrate. The reflectance adjusting layer includes a first layer formed on the substrate and a second layer formed on the first layer. The first layer includes a concavo-convex structure provided on the substrate and a material which is filled into a concave portion of the concavo-convex structure and has a refractive index lower than that of the substrate, and the second layer includes a material having a refractive index lower than that of the first layer. It is possible to reduce the reflection on the substrate such as Si by using the principle of the interference of the thin film. Such a technology can be applied to solid state imaging sensors.

The present technology relates to a solid state imaging sensor that is possible to suppress the reflection of incident light with a wide wavelength band. A reflectance adjusting layer is provided on the substrate in an incident direction of the incident light with respect to the substrate such as Si and configured to adjust reflection of the incident light on the substrate. The reflectance adjusting layer includes a first layer formed on the substrate and a second layer formed on the first layer. The first layer includes a concavo-convex structure provided on the substrate and a material which is filled into a concave portion of the concavo-convex structure and has a refractive index lower than that of the substrate, and the second layer includes a material having a refractive index lower than that of the first layer. It is possible to reduce the reflection on the substrate such as Si by using the principle of the interference of the thin film. Such a technology can be applied to solid state imaging sensors.

An antireflection film substrate that is provided on a surface of a substrate includes a surface layer having an alumina hydrate as a main component. The surface layer has an uneven structure in which a volume proportion of the alumina hydrate per unit volume decreases in a direction from the substrate side to a surface side, and a period of apexes distributed on the uneven structure on the surface side is configured to be equal to or less than a wavelength of light of which reflection is to be suppressed.

A coated article may comprise a substrate and an optical coating. The substrate may have a major surface comprising a first portion and a second portion. A first direction that is normal to the first portion of the major surface may not be equal to a second direction that is normal to the second portion of the major surface. The optical coating may be disposed on at least the first portion and the second portion of the major surface. The coated article may exhibit at the first portion of the substrate and at the second portion of the substrate hardness of about 8 GPa or greater at an indentation depth of about 50 nm or greater as measured on the anti-reflective surface by a Berkovich Indenter Hardness Test.

An optical plastic product has an optical multilayer film formed on one or both surfaces of a base made of plastic, directly or via an intermediate film, wherein the optical multilayer film includes a tensile-stress high-refractive-index layer having tensile stress as internal stress and made of a high refractive index material, and a low refractive index layer made of a low refractive index material, and the tensile-stress high-refractive-index layer is disposed with a physical film thickness of not greater than 10 nm, in a first layer as counted from the base side in the optical multilayer film.