Various techniques are provided for prevent excessive accumulation of moisture onto a surface of an optical component of an imaging device. In one example, a method includes providing a bulk layer of an optical component of a thermal imaging system, wherein the bulk layer is configured to pass thermal radiation. The method further includes depositing a diamond like coating (DLC) to provide an external surface of the optical component, wherein the DLC exhibits a resistance to abrasion. The method further includes forming a plurality of nanostructures in the optical component, wherein the nanostructures exhibit a superhydrophobic property to prevent excessive moisture accumulation on the external surface of the optical component. Additional methods and systems are also provided.

Provided is a wire grid polarization plate that has heat resistance and excellent polarization properties, and has durability even in a thin wire structure with a small pitch, and an optical apparatus and a manufacturing method of a polarization plate. A periodic lamellar structure is formed with a material forming arrangement by self-assembling performance, and then, is metallized, and thus, metal wires arranged at a small pitch are prepared, and the obtained wires are fixed by a dielectric material.

A meta-lens, an imaging optics, and an electronic device including the imaging optics are provided. The meta-lens includes at least one meta-layer having a plurality of nanostructures with a less shape dimension than an operating wavelength, modulates a phase and intensity of incident light, and forms a plurality of spots of different brightness on an imaging plane in an asymmetric distribution. The plurality of spots formed on the imaging plane include a main spot and at least one sub-spot that is separated from a center of the main spot and has lower illuminance than the main spot.

An optical element comprising a window formed of synthetic diamond material and an optical surface pattern formed directly in a surface of the synthetic diamond material. The window of synthetic diamond material is in the form of a wedged diamond window with non-parallel major surfaces defining a wedge angle in a range (1) arcminute to 10° and the optical surface pattern is formed directly in one or both of the non-parallel major surfaces. There is also described a laser system comprising the optical element and a laser having a coherence length, wherein the coherence length of the laser is greater than twice a thickness of the wedged diamond window at its thickest point.

An optical element comprising a window formed of synthetic diamond material and an optical surface pattern formed directly in a surface of the synthetic diamond material. The window of synthetic diamond material is in the form of a wedged diamond window with non-parallel major surfaces defining a wedge angle in a range (1) arcminute to 10° and the optical surface pattern is formed directly in one or both of the non-parallel major surfaces. There is also described a laser system comprising the optical element and a laser having a coherence length, wherein the coherence length of the laser is greater than twice a thickness of the wedged diamond window at its thickest point.

The present technology relates to a solid state imaging sensor that is possible to suppress the reflection of incident light with a wide wavelength band. A reflectance adjusting layer is provided on the substrate in an incident direction of the incident light with respect to the substrate such as Si and configured to adjust reflection of the incident light on the substrate. The reflectance adjusting layer includes a first layer formed on the substrate and a second layer formed on the first layer. The first layer includes a concavo-convex structure provided on the substrate and a material which is filled into a concave portion of the concavo-convex structure and has a refractive index lower than that of the substrate, and the second layer includes a material having a refractive index lower than that of the first layer. It is possible to reduce the reflection on the substrate such as Si by using the principle of the interference of the thin film. Such a technology can be applied to solid state imaging sensors.

The present technology relates to a solid state imaging sensor that is possible to suppress the reflection of incident light with a wide wavelength band. A reflectance adjusting layer is provided on the substrate in an incident direction of the incident light with respect to the substrate such as Si and configured to adjust reflection of the incident light on the substrate. The reflectance adjusting layer includes a first layer formed on the substrate and a second layer formed on the first layer. The first layer includes a concavo-convex structure provided on the substrate and a material which is filled into a concave portion of the concavo-convex structure and has a refractive index lower than that of the substrate, and the second layer includes a material having a refractive index lower than that of the first layer. It is possible to reduce the reflection on the substrate such as Si by using the principle of the interference of the thin film. Such a technology can be applied to solid state imaging sensors.

There is provided a method for making an optical element having a textured surface. The method comprises the steps of: a) providing a plurality of primary optical fiber segments, each primary fiber segment comprising one or more cores; b) bundling the primary fiber segments into an assembly with the cores of said primary fiber segments extending parallely; c) transforming the assembly into a secondary structure comprising the parallely extending cores; and d) etching a surface of the secondary structure according to an etch profile of said secondary structure, the etch profile being defined by the parallely extending cores, thereby forming the textured surface of the optical element. An optical element having a textured surface is also provided.

There is provided a method for making an optical element having a textured surface. The method comprises the steps of: a) providing a plurality of primary optical fiber segments, each primary fiber segment comprising one or more cores; b) bundling the primary fiber segments into an assembly with the cores of said primary fiber segments extending parallely; c) transforming the assembly into a secondary structure comprising the parallely extending cores; and d) etching a surface of the secondary structure according to an etch profile of said secondary structure, the etch profile being defined by the parallely extending cores, thereby forming the textured surface of the optical element. An optical element having a textured surface is also provided.

An antireflection film substrate that is provided on a surface of a substrate includes a surface layer having an alumina hydrate as a main component. The surface layer has an uneven structure in which a volume proportion of the alumina hydrate per unit volume decreases in a direction from the substrate side to a surface side, and a period of apexes distributed on the uneven structure on the surface side is configured to be equal to or less than a wavelength of light of which reflection is to be suppressed.