A multilayer mirror for reflecting Extreme Ultraviolet (EUV) radiation and a method for producing the same are disclosed. In an embodiment a multilayer mirror includes a layer sequence having a plurality of alternating first layers and second layers, the first layers including lanthanum or a lanthanum compound and the second layers including boron, wherein the second layers are doped with carbon, and wherein a molar fraction of carbon in the second layers is 10% or less.

A fixed-focus lens includes an anti-radiation first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens and a seventh lens arranged in order in a direction. An aperture stop is disposed between the first lens and the fourth lens. A ratio of a lens diameter of the first lens to an overall length is within a range of 0.4 to 0.5, where the overall length is an axial distance between an outer surface of the first lens and an outer surface of the seventh lens. Each of the first lens to the seventh lens is a spherical glass lens.

According to at least one feature of the present disclosure, a method of forming a film of an optical element, includes: positioning a substantially transparent lens in a reactor chamber, wherein the lens defines a curved surface; exposing the lens to a first precursor comprising one of lanthanum or gadolinium such that the first precursor is deposited on the curved surface of the lens; exposing the first precursor on the curved surface to a first oxidizer such that the first precursor present on the curved surface of the lens reacts with the first oxidizer to form a high refractive index layer of the film; exposing the high refractive index layer to a second precursor such that the second precursor is deposited on the high refractive index layer; and exposing the second precursor on the high refractive index layer to a second oxidizer such that the second precursor present on the high refractive index layer reacts with the second oxidizer to form a low refractive index layer of the film.

An optical lens system includes, in order from a magnified side to a minified side, a first lens group of positive refractive power and a second lens group of positive refractive power. The first lens group includes a first lens and a second lens, and the second lens group includes a third lens and a fourth lens. One of the third lens and the fourth lens includes one aspheric surface, and each of the lenses in the optical lens system is a singlet lens. The optical lens satisfies a condition of TE.sub.(λ=400)>94%, where TE.sub.(λ=400) denotes an overall transmittance of all of the lenses in the optical lens system measured at a wavelength of 400 nm.

An objective lens configured by multiple lenses each consisting of a single lens has a retro ratio of 1.5 or higher. The multiple lenses configure a substantially afocal first lens group and a positive second lens group arranged in this order from a magnification side. The first lens group includes a 1a lens group having a negative power and a 1b lens group having a positive power which are arranged in this order from the magnification side. Provided that a focal length of the first lens group is represented by f(Gr1) and a focal length of a whole system of the objective lens is represented by f(total), a condition of |f(Gr1)/f(total)|>10 is satisfied. The second lens group includes a 2a lens group having a negative power and a 2b lens group having a positive power which are arranged in this order from the magnification side.

Method and system for inspecting a manufactured part supported on an optically-transparent window of a rotary actuator at an inspection station are provided. The window rotatably supports the part in a generally vertical orientation at which a bottom end surface of the part has a position and orientation for optical inspection. An illuminator is configured to illuminate the bottom end surface of the part through the window with radiant energy to obtain reflected radiation signals which are reflected off the bottom end surface of the part. The reflected radiation signals travel through the window. A lens and detector assembly is configured to form a bottom image from the reflected radiation signals at a bottom imaging location below the window and is configured to detect the bottom image. The window is made of a material which is substantially transparent to the radiant energy and the reflected radiation signals.

Provided in the present invention is an adjustment and design method of an illumination system matched with multiple objective lenses in an extreme ultraviolet lithography machine; the illumination system to which the method is applied comprises a light source, a collection lens, a field compound eye, a pupil compound eye and a relay lens group; the method specifically comprises the steps: before a projection objective lens of an extreme ultraviolet lithography machine is replaced, calculating aperture angles of emergent ray of a relay lens A on a meridian plane and a sagittal plane by means of ray tracing; after the projection objective lens of the extreme ultraviolet lithography machine is replaced, taking out a central point of a exit pupil plane as an object point for ray tracing; adjusting inclination angles and positions of the relay lens A and a relay lens B, and adjusting inclination angles of central compound eye units of the pupil compound eye and the field compound eye, till an image plane of a current illumination system approximates to an arc-shaped image plane corresponding to the projection objective lens. By adjusting the illumination system on the basis of the adjustment method of the present invention, an illumination system matched with the projection objective lens system can be obtained, which dramatically reduces the cost of designing a projection lithography machine.

Described herein are systems and methods for improving light-sheet microscopy with cost-effective and simplified components. Such cost-effective and simplified components can be implemented in a light focusing system, a light generation system, and/or in imaging system. The light focusing system can be improved by attaching a voice coil motor to a focusing lens to increase the imagable field of view. The light generation system can be improved with a multimode laser diode to increase the uniformity of the beam profile and to increase the usable optical power. The imaging system can be improved by using a fluid chamber with positive cylindrical optical window for minimizing spherical aberrations.

In accordance with an embodiment of the disclosure, a method of patterning can include dividing an image into a set of frame sections; determining a tip pattern for a respective portion of an image to be patterned by each tip of the tip array in each frame section of the set of frame sections; disposing the tip array in a patterning position in a first location of the substrate corresponding to a location of the substrate in which the first frame section in the set of frame sections is to be patterned; projecting a first pattern of radiation onto the tip array to selectively irradiate one or more tips of the tip array and pattern the substrate, wherein the first pattern of radiation corresponds to a tip pattern for the first frame section; disposing the tip array in a patterning position in a second location of the substrate corresponding to a location of the substrate in which the second frame section in the set of frame sections is to be patterned; projecting a second pattern of radiation onto the tip array to selectively irradiate tips of the tip array and pattern the substrate, wherein the second pattern of radiation corresponds to a tip pattern for the second frame section; and repeating the disposing and projecting for each frame section in the set of frame sections to pattern the image.

The disclosure provides a projection lens including a first lens set and a second lens set disposed sequentially from a magnified side to a reduced side. The first lens set and the second lens set are separated by a minimum inner diameter of a lens barrel. The first lens set includes 4 to 6 spherical lenses, and a refractive power of the first lens set is negative. The second lens set includes 4 to 6 lenses, where one of the lenses is an aspheric lens, and a refractive power of the second lens set is positive. A transmittance of the projection lens at a wavelength of 365 nm is greater than or equal to 75%.