An optical measuring device having a base for placing the measuring device and a targeting unit that is rotatable with respect to the base and defines a target axis for targeting a target object that is to be measured. The targeting unit has a first beam path for emitting optical measurement radiation in the direction of the target object that is to be measured. The targeting unit furthermore has a diffractive optical element (DOE), which is arranged or arrangeable in the beam path such that the optical measurement radiation is homogenized.

Methods and apparatus for eye-glow suppression in waveguide systems is disclosed herein. Some embodiments of the methods and the apparatus include a waveguide based display including a waveguide including an in-coupling optical element and an out-coupling optical element, where the in-coupling optical element is configured to in-couple image containing light and the out-coupling optical element is configured to out-couple the image counting light towards a user, where the waveguide comprises an outer surface and an inner surface opposite to the outer surface, and wherein the inner surface is closer to the user than the outer surface; and a partially light blocking layer above the outer surface of the waveguide opposite to the user, where the partially light blocking layer is configured to keep eye glow light from entering the environment outside the outer surface of the waveguide.

A compact folded projection system is described that includes a laser light source, a folded lens system comprising a lens stack including two or more refractive lenses and a light folding element (e.g., a prism), and a diffractive beam splitter that includes at least one diffractive surface. The light folding element provides a “folded” optical axis for the lens system to reduce the Z-height of the projection system, for example to within a range of 1.7 to 4 millimeters (e.g., 2 millimeters in some implementations). The laser light source emits light that is refracted by the lens stack to the folding element. The folding element redirects the light to the beam splitter which replicates the light into N×M duplications or tiles to thus generate a larger field of view (FOV) than the internal FOV of the lens system.

Aberrations of a projection lens for microlithography can be subdivided into two classes: a first class of aberrations, which are distinguished by virtue of the fact that their future size increases by a non-negligible value after a constant time duration, independently of their current size, and a second class of aberrations, which, after reaching a threshold, only increase by a negligible value after each further time duration. An adjustment method is proposed, which adjusts these two classes of aberrations in parallel in time with one another.

The invention relates to a method for compensating at least one defect of an optical system which includes introducing an arrangement of local persistent modifications in at least one optical element of the optical system, which does not have pattern elements on one of its optical surfaces, so that the at least one defect is at least partially compensated.

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

An imaging optical system comprises adjusters for adjusting a shape of each of at least two reflecting surfaces by applying a force to a rear surface of each of the reflecting surfaces. Points obtained by projecting force acting points of the adjusters in an optical axis direction defined with respect to the reflecting surface are defined as correction points, the acting points are set such that, when first and second rays in a light flux emitted from one point on the object plane are reflected by first and second reflecting surfaces, the first ray strikes the correction point of the first reflecting surface but does not strike the correction point of the second reflecting surface, and the second ray does not strike the correction point of the first reflecting surface but strikes the correction point of the second reflecting surface.

Disclosed is a method for correcting an image, a storage medium, and a projection device. The method is applied to a projection device, the projection device including a grating and a light generation component. The method includes: determining, in a region in which a projection image projected by the projection device overlaps with a projected image projected through the grating by detection light output from the projection device, diffraction spots having a diameter not equal to a preset value as target diffraction spots; determining a group of target diffraction spots continuously arranged in a horizontal or vertical direction, as well as diffraction spots having a diameter equal to the preset value that are respectively located on both sides of the group of target diffraction spots, as a region to be corrected; determining an angle α.sub.i between a plane of an i.sup.th diffraction spot and a plane of an (i+1).sup.th diffraction spot that are adjacent in the horizontal or vertical direction in the region to be corrected; and determining a corrected projection length of the (i+1).sup.th diffraction spot according to the preset value and angles α.sub.1 to α.sub.i.

The disclosure provides a method and to an apparatus for determining the heating state of a mirror in an optical system, in particular in a microlithographic projection exposure apparatus. A method for determining the heating state of an optical element includes: measuring values of a first temperature that the optical element has at a first position using a temperature sensor; and estimating a second temperature that the optical element has at a second position, which is located at a distance from the first position, on the basis of the measured values, wherein estimating the second temperature is accomplished while taking into account a temporal change in the previously measured values.