Disclosed is a depth sensor for determining depth. The depth sensor can include a photosensor, a metalens configured to manipulate light to simultaneously produce at least two images having different focal distances on a surface of the photosensor, and processing circuitry configured to receive, from the photosensor, a measurement of the at least two images having different focal distances. The depth sensor can determine, according to the measurement, a depth associated with at least one feature in the at least two images.

A metallic grating includes a substrate; a plurality of high aspect ratio trenches disposed in the substrate such that the high aspect ratio trenches are spaced apart from one another by a field surface of the substrate; a metallic superconformal filling formed and disposed in the high aspect ratio trenches; and a grating including a spatial arrangement of the high aspect ratio trenches that are filled with the metallic superconformal filling such that the metallic superconformal filling is void-free, and the high aspect ratio trenches are bottom-up filled with the metallic superconformal filling, wherein a height of the metallic superconformal filling is less than or equal to the height of the high aspect ratio trenches.

A manufacturing system performs a deposition of an etch-compatible film over a substrate. The etch-compatible film includes a first surface and a second surface opposite to the first surface. The manufacturing system performs a partial removal of the etch-compatible film to create a surface profile on the first surface with a plurality of depths relative to the substrate. The manufacturing system performs a deposition of a second material over the profile created in the etch-compatible film. The manufacturing system performs a planarization of the second material to obtain a plurality of etch heights of the second material in accordance with the plurality of depths in the profile created in the etch-compatible film. The manufacturing system performs a lithographic patterning of a photoresist deposited over the planarized second material to obtain the plurality of etch heights and one or more duty cycles in the second material.

Provided is a meta optical device including a plurality of phase modulation regions respectively including a plurality of nanostructures and configured to modulate a phase of incident light, wherein a phase retardation profile of the plurality of phase modulation regions monotonically change with respect to light of a plurality of wavelength bands apart from each other, and wherein phase modulation ranges with respect to the light of the plurality of wavelength bands are different from each other.

Provided is a structured light projector including a light source configured to emit light, and a nanostructure array configured to form a dot pattern based on the light emitted by the light source, the nanostructure array including a plurality of super cells each respectively including a plurality of nanostructures, wherein each of the plurality of super cells includes a first sub cell that includes a plurality of first nanostructures having a first shape distribution and a second sub cell that includes a plurality of second nanostructures having a second shape distribution.

An optical arrangement for spectral decomposition of light is disclosed. In an embodiment the optical arrangement includes a reflection diffraction grating, a first medium with a refractive index n.sub.in arranged on a light incidence side of the reflection diffraction grating; and a second medium with a refractive index n.sub.G arranged on a side of the reflection diffraction grating that faces away from the light incidence side, with n.sub.in>n.sub.G, wherein the optical arrangement is configured in such a way that light impinges on the reflection diffraction grating from the first medium at an angle of incidence α, wherein a condition sin(α)>n.sub.G/n.sub.in is satisfied, wherein the reflection diffraction grating comprises a layer system with at least one unstructured layer and at least one structured layer, wherein the at least one structured layer has a periodic structure with a period p in lateral direction, and wherein the period p meets the following conditions: p<λ/[n.sub.in*sin(α)+n.sub.G] and p>λ/[n.sub.in*sin(α)+n.sub.in].

As described above, one or more aspects of the present disclosure provide articles having structural color, and methods of making articles having structural color.

An optical structure is provided. The optical structure includes an optical element and a plurality of protrusions. The optical element has a planarized top surface. The plurality of protrusions are disposed on the planarized top surface, wherein each of the plurality of protrusions independently has a size in the subwavelength dimensions.

The present disclosure relates to a light-emitting device (100), comprising a dielectric layer (110) including a plurality of first quantum dots (112) embedded therein, wherein the plurality of first quantum dots (112) is configured to emit light of a first color; and a metamaterial structure (120) embedded in the dielectric layer (110), wherein the metamaterial structure (120) is configured to convert at least a portion of an energy released by the plurality of first quantum dots into surface plasmons.

To improve luminance of image information visually recognized by a user while using plastic for a light guide plate. An image display element includes: a plastic substrate; an incident diffraction grating integrally formed on a surface of the plastic substrate and configured to diffract incident video light; an emission diffraction grating integrally formed on a surface of the plastic substrate and configured to emit the video light; and a coating layer formed on the emission diffraction grating and having a thickness of 10 nm or more and 1000 nm or less and a refractive index of 1.64 or more and 2.42 or less.