The invention relates to a beam polarization rotator, which comprises: (a) a waveguide having an input facet, an output facet, and four side facets; (b) a core material of the waveguide having a first refractive index; (c) a coating material of the side facets having a refractive index lower than said refractive index of the core material; wherein the waveguide has a cuboid-twisted shape, such that a distal portion of an originally cuboid body is twisted at an angle α about a longitudinal-central axis of the waveguides body, while a proximal portion of the body remains fixed relative to said axis, resulting in said output facet be at an offset orientation angle α relative to the orientation of said input facet.

The invention relates to a beam polarization rotator, which comprises: (a) a waveguide having an input facet, an output facet, and four side facets; (b) a core material of the waveguide having a first refractive index; (c) a coating material of the side facets having a refractive index lower than said refractive index of the core material; wherein the waveguide has a cuboid-twisted shape, such that a distal portion of an originally cuboid body is twisted at an angle α about a longitudinal-central axis of the waveguides body, while a proximal portion of the body remains fixed relative to said axis, resulting in said output facet be at an offset orientation angle α relative to the orientation of said input facet.

A LiDAR system has a field of view and includes a polarization-based waveguide splitter. The splitter includes a first splitter port, a second splitter port and a common splitter port. A laser is optically coupled to the first splitter port via a single-polarization waveguide. An objective lens optically couples each optical emitter of an array of optical emitters to a respective unique portion of the field of view. An optical switching network is coupled via respective dual-polarization waveguides between the common splitter port and the array of optical emitters. An optical receiver is optically coupled to the second splitter port via a dual-polarization waveguide and is configured to receive light reflected from the field of view. A controller, coupled to the optical switching network, is configured to cause the optical switching network to route light from the laser to a sequence of the optical emitters according to a temporal pattern.

An integrated waveguide polarizer comprising: a plurality of silicon layers and a plurality of silicon-nitride layers; each of the plurality of silicon layers and each of the plurality of silicon-nitride layers having a first end and an opposite second end, the first end having a wide width and the second end having a narrow width, such that each silicon layer and each silicon-nitride layer have tapered shapes; wherein the pluralities of silicon and silicon-nitride layers are overlapped, such that at least a portion of each silicon-nitride layer overlaps at least a portion of each silicon layer; and a plurality of oxide layers disposed between the pluralities of silicon-nitride and silicon layers, each oxide layer creating a separation spacing between each silicon-nitride and each silicon layers; wherein, when an optical signal is launched through the integrated waveguide polarizer, the optical signal is transitioned between each silicon-nitride layer and each silicon layer.

An integrated waveguide polarizer comprising: a plurality of silicon layers and a plurality of silicon-nitride layers; each of the plurality of silicon layers and each of the plurality of silicon-nitride layers having a first end and an opposite second end, the first end having a wide width and the second end having a narrow width, such that each silicon layer and each silicon-nitride layer have tapered shapes; wherein the pluralities of silicon and silicon-nitride layers are overlapped, such that at least a portion of each silicon-nitride layer overlaps at least a portion of each silicon layer; and a plurality of oxide layers disposed between the pluralities of silicon-nitride and silicon layers, each oxide layer creating a separation spacing between each silicon-nitride and each silicon layers; wherein, when an optical signal is launched through the integrated waveguide polarizer, the optical signal is transitioned between each silicon-nitride layer and each silicon layer.

A three-dimensional photonic integrated structure includes a first semiconductor substrate and a second semiconductor substrate. The first substrate incorporates a first waveguide and the second semiconductor substrate incorporates a second waveguide. An intermediate region located between the two substrates is formed by a one dielectric layer. The second substrate further includes an optical coupler configured for receiving a light signal. The first substrate and dielectric layer form a reflective element located below and opposite the grating coupler in order to reflect at least one part of the light signal.

A three-dimensional photonic integrated structure includes a first semiconductor substrate and a second semiconductor substrate. The first substrate incorporates a first waveguide and the second semiconductor substrate incorporates a second waveguide. An intermediate region located between the two substrates is formed by a one dielectric layer. The second substrate further includes an optical coupler configured for receiving a light signal. The first substrate and dielectric layer form a reflective element located below and opposite the grating coupler in order to reflect at least one part of the light signal.

Aspects of the present disclosure are directed to configurations of compact ultra-low loss integrated photonics-based waveguides for optical gyroscope applications, and the methods of fabricating those waveguides for ease of large scale manufacturing. Four main process flows are described: (1) process flow based on a repeated sequence of oxide deposition and anneal; (2) chemical-mechanical polishing (CMP)-based process flow followed by wafer bonding; (3) Damascene process flow followed by oxide deposition and anneal, or wafer bonding; and (4) CMP-based process flows followed by oxide deposition. Any combination of these process flows may be adopted to meet the end goal of fabricating optical gyroscope waveguides in one or more layers on a silicon substrate using standard silicon fabrication technologies.

Aspects of the present disclosure are directed to configurations of compact ultra-low loss integrated photonics-based waveguides for optical gyroscope applications, and the methods of fabricating those waveguides for ease of large scale manufacturing. Four main process flows are described: (1) process flow based on a repeated sequence of oxide deposition and anneal; (2) chemical-mechanical polishing (CMP)-based process flow followed by wafer bonding; (3) Damascene process flow followed by oxide deposition and anneal, or wafer bonding; and (4) CMP-based process flows followed by oxide deposition. Any combination of these process flows may be adopted to meet the end goal of fabricating optical gyroscope waveguides in one or more layers on a silicon substrate using standard silicon fabrication technologies.

A first waveguide and a second waveguide including a first layer and a second layer are provided. In a first longitudinal segment, the first layer gradually approaches a first waveguide in a first transverse direction. In a second longitudinal segment, the first and second waveguides are longitudinally oriented. In a third longitudinal segment, the first layer includes a length portion having a width in the first transverse direction that gradually decreases along the third longitudinal segment, and the second layer includes a length portion having a width in the first transverse direction that gradually increases along the third longitudinal segment.