Patent classifications
G02B6/29326
TECHNOLOGIES FOR OPTICAL DEMULTIPLEXING WITH BACKWARDS COMPATIBILITY
In one embodiment, a silicon photonic integrated circuit (PIC) includes a pair of Mach-Zehnder Interferometers (MZI) with a phase shifter to function as a 1x2 optical switches. On one path between the MZIs is a wavelength interleaver. The MZI switch can be controlled to either an all-pass mode or a by-pass mode, therefore setting configurable optical demultiplexing bandwidths to support dual 1.6 T FR8/800G FR4 network backward compatibility. The configurable multiplexer operates at set-and-forget mode for the entire operating temperature and the product’s lifetime.
Temperature insensitive filter
An integrated wavelength-selective filter device comprises a first optical element, for directing received radiation into a direction defined by a first angle, and a second optical element being a diffractive element configured for diffracting the directed radiation under a second angle. The second angle is such that for a single reference wavelength the diffracted radiation is directed into a propagation medium for advancing therein towards a predetermined position on the first optical element or on a further optical element for filtering radiation having a wavelength substantially matching the reference wavelength from radiation having a substantially different wavelength. The propagation medium is formed from a material that is different from any material of the substrate of the first and the second optical element.
Wafer level coatings for photonic die
A photonic die includes an optical component that can emit output light. The optical component includes a substrate having a length and width that are substantially greater than a thickness thereof, the thickness defining a vertical direction. The optical component includes a vertical edge, and a reflective or antireflective coating on the vertical edge, wherein the reflective or antireflective coating includes a silicon-based material.
Tunable echelle grating
Configurations for a tunable Echelle grating are disclosed. The tunable Echelle grating may include an output waveguide centered in a waveguide array, with input waveguides on both sides of the output waveguide. A metal tuning pad may be located over the slab waveguide and may be heated to induce a temperature change in the slab waveguide. By increasing the temperature of the propagation region of the slab waveguide, the index of refraction may shift, thus causing the peak wavelength of the channel to shift. This may result in an optical component capable of multiplexing multiple light sources in an energy efficient manner while maintaining a small form factor.
Tunable Echelle Grating
Configurations for a tunable Echelle grating are disclosed. The tunable Echelle grating may include an output waveguide centered in a waveguide array, with input waveguides on both sides of the output waveguide. A metal tuning pad may be located over the slab waveguide and may be heated to induce a temperature change in the slab waveguide. By increasing the temperature of the propagation region of the slab waveguide, the index of refraction may shift, thus causing the peak wavelength of the channel to shift. This may result in an optical component capable of multiplexing multiple light sources in an energy efficient manner while maintaining a small form factor.
TEMPERATURE INSENSITIVE FILTER
An integrated wavelength-selective filter device comprises a first optical element, for directing received radiation into a direction defined by a first angle, and a second optical element being a diffractive element configured for diffracting the directed radiation under a second angle. The second angle is such that for a single reference wavelength the diffracted radiation is directed into a propagation medium for advancing therein towards a predetermined position on the first optical element or on a further optical element for filtering radiation having a wavelength substantially matching the reference wavelength from radiation having a substantially different wavelength. The propagation medium is formed from a material that is different from any material of the substrate of the first and the second optical element.
Echelle grating demux/mux in SiN
In an example, an Echelle grating wavelength division multiplexing (WDM) device includes a first waveguide, a slab waveguide, multiple second waveguides, an Echelle grating, and a metal-filled trench. The first waveguide includes either an input waveguide or an output waveguide. The multiple second waveguides are optically coupled to the first waveguide through the slab waveguide. The multiple second waveguides include multiple output waveguides if the first waveguide includes the input waveguide or multiple input waveguides if the first waveguide includes the output waveguide. The Echelle grating includes multiple grating teeth formed in the slab waveguide. The metal-filled trench forms a mirror at the grating teeth to reflect incident light from the first waveguide toward the multiple second waveguides or from the multiple second waveguides toward the first waveguide.
ECHELLE GRATING DEMUX/MUX IN SIN
In an example, an Echelle grating wavelength division multiplexing (WDM) device includes a first waveguide, a slab waveguide, multiple second waveguides, an Echelle grating, and a metal-filled trench. The first waveguide includes either an input waveguide or an output waveguide. The multiple second waveguides are optically coupled to the first waveguide through the slab waveguide. The multiple second waveguides include multiple output waveguides if the first waveguide includes the input waveguide or multiple input waveguides if the first waveguide includes the output waveguide. The Echelle grating includes multiple grating teeth formed in the slab waveguide. The metal-filled trench forms a mirror at the grating teeth to reflect incident light from the first waveguide toward the multiple second waveguides or from the multiple second waveguides toward the first waveguide.
Echelle grating demux/mux in SiN
In an example, an Echelle grating wavelength division multiplexing (WDM) device includes a first waveguide, a slab waveguide, multiple second waveguides, an Echelle grating, and a metal-filled trench. The first waveguide includes either an input waveguide or an output waveguide. The multiple second waveguides are optically coupled to the first waveguide through the slab waveguide. The multiple second waveguides include multiple output waveguides if the first waveguide includes the input waveguide or multiple input waveguides if the first waveguide includes the output waveguide. The Echelle grating includes multiple grating teeth formed in the slab waveguide. The metal-filled trench forms a mirror at the grating teeth to reflect incident light from the first waveguide toward the multiple second waveguides or from the multiple second waveguides toward the first waveguide.
ECHELLE GRATING DEMUX/MUX IN SIN
In an example, an Echelle grating wavelength division multiplexing (WDM) device includes a first waveguide, a slab waveguide, multiple second waveguides, an Echelle grating, and a metal-filled trench. The first waveguide includes either an input waveguide or an output waveguide. The multiple second waveguides are optically coupled to the first waveguide through the slab waveguide. The multiple second waveguides include multiple output waveguides if the first waveguide includes the input waveguide or multiple input waveguides if the first waveguide includes the output waveguide. The Echelle grating includes multiple grating teeth formed in the slab waveguide. The metal-filled trench forms a mirror at the grating teeth to reflect incident light from the first waveguide toward the multiple second waveguides or from the multiple second waveguides toward the first waveguide.