An optical assembly includes a first prism and a second prism. The first prism has a first surface. The first surface includes a first optical region. The second prism has a second surface. The first and the second surface are disposed facing each other. The second surface includes a second optical region, in which on a first reference plane, an orthographic projection of the first optical region overlaps an orthographic projection of the second optical region, and the first reference plane is substantially parallel to the first surface or the second surface. When the optical assembly is at a first temperature, at least one of the first optical region and the second optical region is concave, and a vertical distance between the first and the second optical region gradually decreases from a first center point of the first optical region to a first edge of the first optical region.

Provided is a reflective optical element that is lightweight and excellent in damping capacity. In the reflective optical element, a resin layer having an optical surface is formed on a metal substrate, and a reflective film is formed on the optical surface, and also, the metal substrate includes an alloy containing Mg as a main component.

An optical bench for supporting a reflex sight in a weapon-mounted sight assembly includes a reflex sight mounting portion having a first surface for receiving a reticle light source and a first reticle lens mounting arm spaced apart from a second reticle lens mounting arm. The first and second reticle lens mounting arms are attached to the reflex sight mounting portion and the first and second reticle lens mounting arms are configured to engage opposite sides of a reticle lens to support the reticle lens in an optical path of the reticle light source. The first and second reticle lens mounting arms are sufficiently resilient to accommodate thermal expansion and contraction of the reticle lens. In further aspects, a weapon sight assembly employing an optical bench and a method for manufacturing an optical bench are provided.

Rotatable mirror assemblies and light detection and ranging systems containing rotatable mirror assemblies are described herein. An example rotatable mirror assembly may include (1) a housing having a top end, a bottom end, and a longitudinal axis intersecting the top and bottom ends, and (2) a set of reflective surfaces, where each reflective surface in the set is coupled to the top end of the housing and the bottom end of the housing such that each reflective surface possesses limited freedom of movement with respect to the housing.

A light reflection device is provided with a light source configured to emit irradiation light, a reflector configured to reflect the irradiation light emitted from the light source, a housing, and a holder attached to the housing to hold the reflector. The holder is configured to restrict a movement of the reflector and allows a size of the reflector to change in contrast with the holder. A mobile object is provided with the light reflection device, a screen on which an image is formed by the irradiation light reflected by the reflector, a front windshield configured to reflect the irradiation light diverged and projected through the screen, and an imaging optical system configured to project the irradiation light emitted from the screen toward the front windshield.

A light source module includes a light source, a fluorescent ring, a reflector, and a driving device. The light source is configured to emit light. The fluorescent ring has an inner surface. The reflector is configured to reflect the light to form a light spot on the inner surface. The driving device is configured to rotate the reflector to cause the light spot to move along a circular path on the inner surface.

An optical assembly of a projection exposure apparatus for semiconductor lithography comprises an optical element and an actuator for deforming the optical element. The actuator is subjected to a bias voltage by a controller that is present. A projection exposure apparatus for semiconductor lithography comprises an optical assembly. A method for operating an actuator for deforming an optical element for semiconductor lithography comprises subjecting the actuator to a bias voltage by a controller.

A spherically mounted retroreflector comprising an optic inlay, the optic inlay comprising a retroreflector having a vertex and an axis of symmetry, and a carrier having an at least partly spherical outer surface and a cavity, wherein the optic inlay is arranged in the cavity, and wherein the at least partly spherical outer surface has a sphere center, which sphere center coincides with the vertex, wherein the optic inlay is connected to the carrier. The optic inlay comprises a coupling portion, and the spherically mounted retroreflector comprises a coupling element arranged between the optic inlay and the carrier.

The invention relates to an optical element including a resin body having a functional surface covered with a reflective coating capable of reflecting light beams, the reflective coating including a copper layer covering at least the functional surface, a nickel layer covering the copper layer, and a chromium layer covering the nickel layer.

A light scanning system includes a mirror device, a magnet, a temperature sensor, and an arithmetic part. The arithmetic part generates first and second current signals based on a first target deflection angle and a first target frequency, a second target deflection angle and a second target frequency, an operating temperature, first data for correcting a change in a deflection angle of a mirror with respect to a change in a frequency of a current signal input to each of first and second drive coils, second data for correcting at least one of a shift of the mirror swinging with a first axis from a Y-axis and a shift of the mirror swinging with a second axis from an X-axis, and third data for correcting a change in a deflection angle of the mirror with respect to a change in the operating temperature.