Provided are an array substrate and a manufacturing method thereof, and a display device. The array substrate comprises a plurality of data lines and sub-pixels. At least one sub-pixel comprises: a first insulating layer; a gate; an active layer located on one side of the first insulating layer away from the gate; a pixel electrode; a first electrode located connected to the active layer and in contact with the pixel electrode; a second electrode connected to the active layer and a data line; a second insulating layer having a first opening, wherein the orthographic projection of the first opening partially overlaps with the orthographic projections of the pixel electrode and the first electrode; a connection electrode in contact with the pixel electrode and the first electrode through the first opening; and a common electrode located on one side of the second insulating layer away from the pixel electrode.

According to one embodiment, a semiconductor substrate including, a switching element, a first organic insulating film, first and second metal lines arranged in a first direction and extending in a second direction, and a metal electrode located between the first and second metal lines. The first organic insulating film includes first and second surfaces. The switching element is covered with the first surface. The first and second metal lines and the metal electrode are located on the second surface side. The first metal line includes a first portion extending in the second direction and a second portion having a width larger than a width of the first portion. The second portion includes arcuate first and second edge. The metal electrode has a polygonal shape having n corners or an elliptic shape where n is larger than four.

A display substrate including a scan driving circuit, a scan line, and an insulating pattern. The scan driving circuit includes a connection electrode disposed on a plurality of insulating layers, a plurality of signal lines, and a stage circuit connected to the signal lines and overlaps a non-display area. The scan line overlaps a display area and is connected to the scan driving circuit. The insulating pattern is disposed on the insulating layers, covers the connection electrode, and makes contact with a sealant.

It is an object of the present invention to apply a sufficient electrical field to a liquid crystal material in a horizontal electrical field liquid crystal display device typified by an FFS type. In a horizontal electrical field liquid crystal display, an electrical field is applied to a liquid crystal material right above a common electrode and a pixel electrode using plural pairs of electrodes rather than one pair of electrodes. One pair of electrodes includes a comb-shaped common electrode and a comb-shaped pixel electrode. Another pair of electrodes includes a common electrode provided in a pixel portion and the comb-shaped pixel electrode.

A display substrate includes: a base substrate, a drive circuit on the base substrate, an insulating layer on a side of the drive circuit away from the base substrate, and a fingerprint recognition device on a side of the insulating layer away from the base substrate. The fingerprint recognition device includes: a first electrode, a photosensitive layer and a second electrode that are disposed in a stacked manner. The first electrode electrically connects to the drive circuit through a via hole running through the insulating layer; and the first electrode forms a recess in the via hole, and the recess is filled with an insulating material, so that a surface of the first electrode on a side away from the base substrate is a flat surface, and the photosensitive layer is disposed on the flat surface.

It is an object of the present invention to form a pixel electrode and a metal film using one resist mask in manufacturing a stacked structure by forming the metal film over the pixel electrode. A conductive film to be a pixel electrode and a metal film are stacked. A resist pattern having a thick region and a region thinner than the thick region is formed over the metal film using an exposure mask having a semi light-transmitting portion. The pixel electrode, and the metal film formed over part of the pixel electrode to be in contact therewith are formed using the resist pattern. Accordingly, a pixel electrode and a metal film can be formed using one resist mask.

A liquid crystal display includes a pixel electrode including a first subpixel electrode and a second subpixel electrode spaced apart with a gap therebetween, a common electrode facing the pixel electrode, and a liquid crystal layer formed between the pixel electrode and the common electrode and including a plurality of liquid crystal molecules. The first and second subpixel electrodes include a plurality of branches, and each of the first and second subpixel electrodes includes a plurality of subregions. The branches extend in different directions in different subregions.

A display panel and the method of manufacturing the same, includes a first substrate disposed relatively to a second substrate, disposed above the first substrate. A black matrix, a poly silicon layer, a gate layer and a source drain layer disposed successively on the first substrate along direction facing the second substrate. The black matrix shelters the surrounding light which is incident from the first substrate onto the poly crystal layer, and the gate layer and the source-drain layer shelter the backlight which is incident from the second substrate onto the poly crystal layer. The manufacturing method of the display panel of the present invention could be simplified by the method described above.

Disclosed are a spatial light modulator and a display device, where 2*2 adjacent pixel electrodes are a pixel group, through-holes corresponding to the respective pixel electrodes are located proximate to the center of the pixel group, and a photo spacer is located at the center of the pixel group, so that the photo spacer can overlap with the through-holes, or the photo spacer can be arranged in close proximity to the through-holes. If the photo spacer overlaps with the through-holes, then a black matrix layer covering the photo spacer, and a black matrix layer covering the surrounding of the photo spacer may cover at least a part of the through-holes; and if the photo spacer is arranged in close proximity to the through-holes, then the black matrix layer covering the surrounding of the photo spacer may cover at least a part of the through-holes.

A technique is provided that reduces dullness of a potential provided to a line such as gate line on an active-matrix substrate to enable driving the line at high speed and, at the same time, reduces the size of the picture frame region. On an active-matrix substrate (20a) are provided gate lines (13G) and source lines. On the active-matrix substrate (20a) are further provided: gate drivers (11) each including a plurality of switching elements, at least one of which is located in a pixel region, for supplying a scan signal to a gate line (13G); and lines (15L1) each for supplying a control signal to the associated gate driver (11). A control signal is supplied by a display control circuit (4) located outside the display region to the gate drivers (11) via the lines (15L1). In response to a control signal supplied, each gate driver (11) drives the gate line (13G) to which it is connected.