G02F1/13685

DISPLAY DEVICE
20230051710 · 2023-02-16 ·

According to one embodiment, a display device includes a first substrate, a second substrate, a liquid crystal layer and an illumination device. The first substrate includes a base, a sensor, a sensor circuit and a sensor light-shielding layer. The sensor is located between the base and the liquid crystal layer in a display area that includes pixels, and outputs a detection signal corresponding to light becoming incident from a side of the liquid crystal layer. The sensor circuit includes a switching element and is connected to the sensor. The sensor light-shielding layer is opposed to a channel area formed in a semiconductor layer included in the switching element, and blocks light from the illumination device on the channel area.

Manufacturing method of semiconductor device

A semiconductor device with favorable electrical characteristics is provided. A semiconductor device with stable electrical characteristics is provided. A highly reliable semiconductor device is provided. A semiconductor layer is formed, a gate insulating layer is formed over the semiconductor layer, a metal oxide layer is formed over the gate insulating layer, and a gate electrode which overlaps with part of the semiconductor layer is formed over the metal oxide layer. Then, a first element is supplied through the metal oxide layer and the gate insulating layer to a region of the semiconductor layer that does not overlap with the gate electrode. Examples of the first element include phosphorus, boron, magnesium, aluminum, and silicon. The metal oxide layer may be processed after the first element is supplied to the semiconductor layer.

Display device and semiconductor substrate
11556035 · 2023-01-17 · ·

According to one embodiment, a semiconductor substrate including, a switching element, a first organic insulating film, first and second metal lines arranged in a first direction and extending in a second direction, and a metal electrode located between the first and second metal lines. The first organic insulating film includes first and second surfaces. The switching element is covered with the first surface. The first and second metal lines and the metal electrode are located on the second surface side. The first metal line includes a first portion extending in the second direction and a second portion having a width larger than a width of the first portion. The second portion includes arcuate first and second edge. The metal electrode has a polygonal shape having n corners or an elliptic shape where n is larger than four.

Display Panel, Method of Manufacturing the Same and Display Device

A display panel and the method of manufacturing the same, includes a first substrate disposed relatively to a second substrate, disposed above the first substrate. A black matrix, a poly silicon layer, a gate layer and a source drain layer disposed successively on the first substrate along direction facing the second substrate. The black matrix shelters the surrounding light which is incident from the first substrate onto the poly crystal layer, and the gate layer and the source-drain layer shelter the backlight which is incident from the second substrate onto the poly crystal layer. The manufacturing method of the display panel of the present invention could be simplified by the method described above.

ARRAY SUBSTRATE AND MANUFACTURE METHOD THEREOF

A method for manufacturing an array substrate is provided. The array substrate, by providing a black matrix and a color resist layer on the array substrate and providing the color resist layer on the TFT layer, prevents bad influences on the color resist layer caused by a high temperature TFT process so as to provide a liquid crystal panel with improved displaying quality. The method includes, firstly, forming a black matrix on a substrate, and secondly, implementing a TFT manufacture process on the black matrix, and then forming a color resist layer after the TFT manufacture process. Accordingly, forming both the black matrix and the color resist layer on the array substrate can be achieved, where the color resist layer is formed after the TFT manufacture process to prevent bad phenomenon caused by the high temperature of the TFT process.

DISPLAY DEVICE
20180013007 · 2018-01-11 · ·

The purpose of the invention is suppressing a kink phenomenon and improvoning the image quality of a display device. The display device has a TFT in a pixel. The TFT has a semiconductor layer, a first insulating layer under the semiconductor layer, a second insulating layer over the semiconductor layer, and a gate electrode facing the semiconductor layer with a gap. The gate electrode has a first gate electrode portion facing a lower surface of the semiconductor layer, a second gate electrode portion facing an upper surface of the semiconductor layer, and a third gate electrode portion facing a lateral surface of the semiconductor layer and connected to the first and second gate electrode portions. A laminated part where the first and second insulating layers are stacked is around the semiconductor layer, and a part of the laminated part is between the lateral surface and the third gate electrode portion.

Display device comprising a sensor located between a base and a liquid crystal layer and that outputs a detection signal corresponding to incident light

According to one embodiment, a display device includes a first substrate, a second substrate, a liquid crystal layer and an illumination device. The first substrate includes a base, a sensor, a sensor circuit and a sensor light-shielding layer. The sensor is located between the base and the liquid crystal layer in a display area that includes pixels, and outputs a detection signal corresponding to light becoming incident from a side of the liquid crystal layer. The sensor circuit includes a switching element and is connected to the sensor. The sensor light-shielding layer is opposed to a channel area formed in a semiconductor layer included in the switching element, and blocks light from the illumination device on the channel area.

DISPLAY DEVICE
20230004056 · 2023-01-05 · ·

A display device including a pixel electrode disposed in an opening area; a common electrode of which at least a region is disposed to be overlapped with the pixel electrode; a gate line extending along a first direction in a non-opening area surrounding the opening area and transmitting a gate signal to the pixel electrode; a data line extending along a second direction different from the first direction in the non-opening area, and transmitting a data signal to the pixel electrode; and a dummy line disposed to be overlapped with the data line in the non-opening area and electrically connected to the common electrode.

Display device
11714306 · 2023-08-01 · ·

A display device is disclosed. The display device includes a first substrate, a frame positioned in the rear of the first substrate, a second substrate opposite the first substrate and positioned between the first substrate and the frame, the second substrate having an area less than an area of the first substrate, and a member layer electrically connected to the first substrate and extended toward the frame.

ARRAY SUBSTRATE AND DISPLAY PANEL
20230028565 · 2023-01-26 ·

An array substrate, includes: a substrate, a first metal layer, a first buffer layer, and an active layer, a gate insulating layer, a second metal layer, a first insulating layer, a third metal layer and a first planarization layer. The first metal layer is electrically connected with the first doped area of the active layer through the bridge layer of the second metal layer. The third metal layer is electrically connected with the second doped area of the active layer. The array substrate of the present disclosure reduces a size of a thin film transistor by stacking the first metal layer, the second metal layer, and the third metal layer, thereby increasing pixel density. A display panel is also provided.