The disclosed electrochromic element includes a first electrode, a second electrode opposed to the first electrode, an electrochromic layer disposed between the first electrode and the second electrode, and a plurality of first interconnections electrically connected to the first electrode. The first electrode has a single section in a first region overlapping with the electrochromic layer in a plan view. The plurality of first interconnections is electrically connected to the first electrode via a first lead-out electrode provided in a second region in contact with the first region in the plan view. A region between the plurality of first interconnections and the first electrode has a resistance lower than a region between adjacent first interconnections.

A vehicular rearview mirror assembly includes an electrochromic reflective element having front and rear glass substrates with an electrochromic medium disposed therebetween. The front glass substrate includes a specularly reflective perimeter layer at least partially around a perimeter border region of the rear side of the front glass substrate. At least one light source is disposed behind the perimeter layer. With the vehicular rearview mirror assembly mounted at the vehicle and when the at least one light source is electrically powered, the at least one light source emits light that passes through the perimeter border region of the second side of the front glass substrate and that is visible to a viewer viewing the first side of the front glass substrate of the electrochromic reflective element at the perimeter layer.

A multi-layer device comprising a first substrate, a first electrically conductive layer and a first current modulating structure on a surface thereof, the first current modulating structure comprising a composite of a resistive material and a patterned insulating material, the first current modulating structure having a cross-layer resistance to the flow of electrical current through the first current modulating structure that varies as a function of position.

A non-light-emitting, variable transmission device can include a first substrate, a first transparent conductive layer, an electrochromic layer, a second transparent conductive layer, a second substrate; and an interlayer disposed between the first substrate and the second substrate. The non-light-emitting, variable transmission device is configured such that a failure of the non-light-emitting, variable transmission device is less likely than another non-light-emitting, variable transmission device in which the interlayer directly contacts the second transparent conductive layer and has a moisture content of at least 0.08 wt %. In an embodiment, the interlayer has a moisture content of at most 0.05 wt %. In another embodiment, the non-light emitting, variable transmission device further includes a barrier layer disposed between the second transparent conductive layer and the interlayer, wherein the barrier layer extends at least partly through the second transparent conductive layer or seals off a passageway.

Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.

Electrochromic devices and methods may employ the addition of a defect-mitigating insulating layer which prevents electronically conducting layers and/or electrochromically active layers from contacting layers of the opposite polarity and creating a short circuit in regions where defects form. In some embodiments, an encapsulating layer is provided to encapsulate particles and prevent them from ejecting from the device stack and risking a short circuit when subsequent layers are deposited. The insulating layer may have an electronic resistivity of between about 1 and 10.sup.8 Ohm-cm. In some embodiments, the insulating layer contains one or more of the following metal oxides: aluminum oxide, zinc oxide, tin oxide, silicon aluminum oxide, cerium oxide, tungsten oxide, nickel tungsten oxide, and oxidized indium tin oxide. Carbides, nitrides, oxynitrides, and oxycarbides may also be used.

An electrochromic device, comprising a first conductive base layer, an electrochromic layer and a second conductive base layer stacked in sequence. The first conductive base layer comprises a first transparent conductive layer and a first base material layer stacked in sequence; the first transparent conductive layer is adhered to one side of the electrochromic layer; the second conductive base layer comprises a second transparent conductive layer and a second base material layer stacked in sequence; the second transparent conductive layer is adhered to the other side of the electrochromic layer; a partition groove is provided in the second transparent conductive layer for partitioning the second transparent conductive layer into a first conductive area and a second conductive area independent of each other; a conduction member is provided on the second conductive area, and the first transparent conductive layer is electrically connected to the second conductive area by the conduction member.

Electrochromic devices and components thereof and systems and methods for controlling electrochromic devices are disclosed. Further, electrochromic materials, electrochromic compositions and electrochromic layers useful for the devices and systems can be in the form of a gel. The present disclosure also provide methods to fabricate electrochromic devices and components thereof, electrochromic compositions, layers and gels.

Certain embodiments relate to optical devices and methods of fabricating optical devices that pre-treat a sub-layer to enable selective removal of the pre-treated sub-layer and overlying layers. Other embodiments pertain to methods of fabricating an optical device that apply a sacrificial material layer.

An inorganic solid-state electrochromic module containing an inorganic transparent conductive film, including a transparent substrate and a first transparent conductive layer, a first transparent metal layer, a first transparent protective layer, an inorganic electrochromic layer, an inorganic ion conductive layer, an inorganic ion storage layer, a second transparent metal layer, a second transparent protective layer, a second transparent conductive layer, a encapsulating film and a transparent front plate successively formed on the transparent substrate.