A lithography apparatus includes an original conveying path, a substrate conveying path, and a plurality of patterning devices each configured to perform patterning on a substrate using an original. The plurality of patterning devices are arranged in two rows. The substrate conveying path is provided between and along the two rows. The original conveying path is provided in each of two rows between and along which the two rows of the patterning devices are arranged.

An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

There are provided an image exposure device, an image exposure method, and a program, the image exposure device including: an image display device; a support portion that supports a photosensitive recording medium for recording an image displayed on the image display device in a state in which an exposure surface thereof faces the image display device; a louver film that is provided between the image display device and the support portion and limits an angle of light radiated from the image display device; an image generation unit that generates a display image in which an image quality of a color input image is deteriorated by emphasizing a density difference of a high-frequency component of the input image; and a controller that performs a control for generating an image of an R component, an image of a G component, and an image of a B component from the display image and sequentially displaying each of the image of the R component, the image of the G component, and the image of the B component on the image display device in a predetermined order to sequentially expose the photosensitive recording medium.

There are provided an image exposure device, an image exposure method, and a program, the image exposure device including: an image display device; a support portion that supports a photosensitive recording medium for recording an image displayed on the image display device in a state in which an exposure surface thereof faces the image display device; a louver film that is provided between the image display device and the support portion and limits an angle of light radiated from the image display device; an image generation unit that generates a display image in which an image quality of a color input image is deteriorated by emphasizing a density difference of a high-frequency component of the input image; and a controller that performs a control for generating an image of an R component, an image of a G component, and an image of a B component from the display image and sequentially displaying each of the image of the R component, the image of the G component, and the image of the B component on the image display device in a predetermined order to sequentially expose the photosensitive recording medium.