A printing system (100) comprising a projecting device (200) configured to project a digital content. The device (200) includes a memory (102) for storing instructions, a processor (104) coupled to the memory (102), an input unit (106) configured to receive at least one input corresponding to the digital content from a user, a digital content processing unit (110) configured to process the digital content, a sensing unit (112) configured to monitor an ambient environment conditions, and a projecting unit (114) configured to project the processed digital content; and a printable substrate (202) configured to receive and imprint the projected digital content from the projecting device (200).

A digital microform imaging apparatus includes a bracket movably coupled to a chassis. A microform media support is coupled to the bracket and includes a frame and a window supported by the frame. An illumination source is provided to direct light through the window of the microform media support along an optical axis. An optical sensor is positioned along the optical axis. A motor is operatively engaged with the microform media support to move the bracket and frame relative to the chassis along an axis perpendicular to the optical axis.

A digital microform imaging apparatus includes a bracket movably coupled to a chassis. A microform media support is coupled to the bracket and includes a frame and a window supported by the frame. An illumination source is provided to direct light through the window of the microform media support along an optical axis. An optical sensor is positioned along the optical axis. A motor is operatively engaged with the microform media support to move the bracket and frame relative to the chassis along an axis perpendicular to the optical axis.

Fringe-projection autofocus system devoid of a reference mirror. Contributions to error in determination of a target surface profile caused by air non-uniformities are measured based on multiple measurements of the target surface performed at different wavelengths, and/or angles of incidence, and/or grating pitches and subtracted from the measured profile, rendering the system substantially insensitive to presence of air turbulence. Same optical beams forming a fringe irradiance pattern on target surface are used for measurement of the surface profile and reduction of measurement error by the amount attributed to air turbulence.

A lithographic apparatus (LA) prints product features and at least one focus metrology pattern (T) on a substrate. The focus metrology pattern is defined by a reflective reticle and printing is performed using EUV radiation (404) incident at an oblique angle (). The focus metrology pattern comprises a periodic array of groups of first features (422). A spacing (S1) between adjacent groups of first features is much greater than a dimension (CD) of the first features within each group. Due to the oblique illumination, the printed first features become distorted and/or displaced as a function of focus error. Second features 424 may be provided as a reference against which displacement of the first features may be seen. Measurement of this distortion and/or displacement may be by measuring asymmetry as a property of the printed pattern. Measurement can be done at longer wavelengths, for example in the range 350-800 nm.

A digital microform imaging apparatus includes a bracket movably coupled to a chassis. A microform media support is coupled to the bracket and includes a frame and a window supported by the frame. An illumination source is provided to direct light through the window of the microform media support along an optical axis. An optical sensor is positioned along the optical axis. A motor is operatively engaged with the microform media support to move the bracket and frame relative to the chassis along an axis perpendicular to the optical axis.

A digital microform imaging apparatus includes a bracket movably coupled to a chassis. A microform media support is coupled to the bracket and includes a frame and a window supported by the frame. An illumination source is provided to direct light through the window of the microform media support along an optical axis. An optical sensor is positioned along the optical axis. A motor is operatively engaged with the microform media support to move the bracket and frame relative to the chassis along an axis perpendicular to the optical axis.

An exposure method includes, in a case of exposing unmeasurable shots which are arranged linearly and whose focus value cannot be measured and a measurable shot which is adjacent to the unmeasurable shots and whose focus value can be measured, exposing alternately the measurable shot and the unmeasurable shots such that the unmeasurable shots are exposed using the focus value of the adjacent measurable shot exposed immediately before the unmeasurable shots.

An imaging apparatus comprising a chassis, a light source for directing light along a first optical axis segment of the light path, at least a first fold mirror supported within the light path for redirecting light along a second optical axis segment, the at least a first fold mirror having a top edge, a first elongated lead member supported by the chassis, the first elongated lead member forming at least a first substantially straight surface that extends substantially parallel to the second optical axis segment, a first drive mechanism supported by the chassis and extending alongside and spaced apart from the first lead member, an area sensor aligned for movement with a segment of the light path, wherein the first lead member and the first drive mechanism are located to first and second different sides of the second optical axis segment and wherein each of the first lead member and the first drive mechanism are located at a height below the top edge of the at least a first fold mirror.

An exposure method includes, in a case of exposing unmeasurable shots which are arranged linearly and whose focus value cannot be measured and a measurable shot which is adjacent to the unmeasurable shots and whose focus value can be measured, exposing alternately the measurable shot and the unmeasurable shots such that the unmeasurable shots are exposed using the focus value of the adjacent measurable shot exposed immediately before the unmeasurable shots.