Patent classifications
G03B27/52
Image forming apparatus
The present invention provides an image forming apparatus including: a first moving member pressed and moved by an openable/closable member when the openable/closable member is opened, and switching a cartridge from a state where the cartridge is positioned in an image forming position to a state where the positioning is released; and a second moving member pressed and moved by the openable/closable member when the openable/closable member is opened, and moving the exposure member from an exposure position to a retracted position, wherein when the positioning of the cartridge is released, a reaction force applied from the first moving member to the openable/closable member reaches a first peak, when the exposure member is moved to the retracted position, a reaction force applied from the second moving member to the openable/closable member reaches a second peak, and timing of the first peak is different from timing of the second peak.
Interconnectable ultrasound transducer probes and related methods and apparatus
Ultrasound devices and methods are described, including a repeatable ultrasound transducer probe having ultrasonic transducers and corresponding circuitry. The repeatable ultrasound transducer probe may be used individually or coupled with other instances of the repeatable ultrasound transducer probe to create a desired ultrasound device. The ultrasound devices may optionally be connected to various types of external devices to provide additional processing and image rendering functionality.
Interconnectable ultrasound transducer probes and related methods and apparatus
Ultrasound devices and methods are described, including a repeatable ultrasound transducer probe having ultrasonic transducers and corresponding circuitry. The repeatable ultrasound transducer probe may be used individually or coupled with other instances of the repeatable ultrasound transducer probe to create a desired ultrasound device. The ultrasound devices may optionally be connected to various types of external devices to provide additional processing and image rendering functionality.
Lithographic apparatus and device manufacturing method
A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
A FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO.sub.2 gas so as to provide a substantially pure CO.sub.2 gas environment adjacent to, and radially outward of, the space.
A FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO.sub.2 gas so as to provide a substantially pure CO.sub.2 gas environment adjacent to, and radially outward of, the space.
Illumination optical apparatus and device manufacturing method
Provided is an illumination optical apparatus that illuminates the surface with light from a light source and includes an optical integrator (the integrator) configured to form a plurality of secondary source images (the images); a adjuster having a plurality of adjusting elements for adjusting a light of the images; and a consensor configured such that the adjuster is in a conjugate relationship with the end surface of the integrator, wherein the element is located at positions, which corresponds to a secondary source formed by an odd reflection times in the first direction by the integrator and a secondary source formed by an even times and a secondary source formed by an odd times in the second direction and a secondary source formed by an even times, wherein the element is not located at a position which corresponds to a secondary source formed by no reflection in the integrator.
Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method
A support table to support a surface of a substrate, wherein the support table includes: a base surface substantially parallel to the surface of the substrate, a plurality of burls protruding above the base surface, each of the burls having a respective distal end and a first height above the base surface, the burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal ends, and a plurality of elongate raised protrusions separated by gaps, each of the elongate raised protrusions having a second height above the base surface, wherein the elongate raised protrusions protrude above the base surface between the burls, and the second height is less than the first height; wherein the protrusions are arranged such that a plurality of the gaps are aligned to form a straight gas flow path towards an edge of the base surface.
IMAGE EXPOSURE DEVICE, IMAGE EXPOSURE METHOD, AND PROGRAM
An image exposure device includes: an image display device that has a plurality of pixels and irradiates a photosensitive recording medium with light from the plurality of pixels; a support member that supports the photosensitive recording medium in a state in which an exposure surface of the photosensitive recording medium faces the image display device; a limiting member that is provided between the image display device and the support member and limits an angle of the light emitted from the image display device to the photosensitive recording medium; and a processor. The processor controls the image display device to display a display image generated by emphasizing only a dark portion among density differences of high-frequency components of an input image.
Substrate holding device, method for manufacturing such a device, and use of such a device in a lithography system
The invention relates to a substrate holding device comprising a holding plate, a base plate, an array of supports, and an array of droplets of a heat absorbing material. The holding plate comprises a first side for holding a substrate. The base plate is arranged at a distance from the holding plate and provides a gap between the base plate and the holding plate at a side of the holding plate opposite to the first side. The array of supports is arranged in between the holding plate and the base plate. The array of liquid and/or solid droplets is arranged in between the holding plate and the base plate, and the droplets are arranged to contact both the base plate and the holding plate. The droplets are arranged spaced apart from each other and from the supports, and are arranged adjacent to each other in a direction along the gap.