A processing apparatus that performs processing to a wafer is provided, the processing apparatus comprising a wafer chuck disposed on a stage and that holds the wafer; three pins that attract the wafer and move the wafer from the wafer chuck; and a control unit that is configured to stop or decrease the attraction of the three pins based on information about a through hole of the wafer when the wafer is moved from the wafer chuck by the three pins.

An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage.

The present invention provides a lithography apparatus which forms a pattern on a substrate, including a stage configured to hold the substrate, a substrate transport system configured to transfer the substrate to the stage, an obtaining unit configured to obtain information about a holding state of the substrate on the stage, and a processor configured to perform processing of determining a transport position on the stage when the substrate transport system transfers the substrate to the stage, wherein based on information obtained by the obtaining unit when the stage holds the substrate at each of a plurality of positions on the stage, the processor determines the transport position at which the substrate transport system transfers the substrate to the stage.