A lithography apparatus is disclosed, which comprises a mirror having at least two mirror segments which are joined together in such a way that an interspace is formed between the mirror segments, and a sensor for detecting the relative position of the mirror segments, wherein the sensor is arranged in the interspace between the mirror segments.

A faceted reflector (32, 32″) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.

An image exposure device includes: an image display device that has a plurality of pixels and irradiates a photosensitive recording medium with light from the plurality of pixels; a support member that supports the photosensitive recording medium in a state in which an exposure surface of the photosensitive recording medium faces the image display device; a limiting member that is provided between the image display device and the support member and limits an angle of the light emitted from the image display device to the photosensitive recording medium; and a processor. The processor controls the image display device to display a display image generated by emphasizing only a dark portion among density differences of high-frequency components of an input image.

An image exposure device includes: an image display device that has a plurality of pixels and irradiates a photosensitive recording medium with light from the plurality of pixels; a support member that supports the photosensitive recording medium in a state in which an exposure surface of the photosensitive recording medium faces the image display device; a limiting member that is provided between the image display device and the support member and limits an angle of the light emitted from the image display device to the photosensitive recording medium; and a processor. The processor controls the image display device to display a display image generated by emphasizing only a dark portion among density differences of high-frequency components of an input image.

An illumination system of a microlithographic projection exposure apparatus comprises an optical integrator having a plurality of light entrance facets and a beam deflection array of reflective or transparent beam deflecting elements. Each beam deflecting element is configured to illuminate a spot on the optical integrator at a position that is variable by changing a deflection angle produced by the beam deflecting element. The illumination system further comprises a control unit which is configured to control the beam deflection elements in such a manner that a light pattern assembled from the spots on at least one of the light entrance facets is varied in response to an input command that a field dependency of the angular irradiance distribution in a mask plane shall be modified.

An optical component comprising a mirror array having a multiplicity of mirror elements, which each have at least one degree of freedom of displacement, and which are each connected to at least one actuator for displacement, has a multiplicity of local regulating devices for damping oscillations of the mirror elements, wherein each of the regulating devices in each case has at least one capacitive sensor having at least one moveable electrode and at least one electrode arranged rigidly relative to the carrying structure.

A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.

Embodiments provide image capturing apparatuses having a screen, a plurality of mirrors and a plurality of cameras. The plurality of mirrors and the plurality of cameras is arranged such that the plurality of cameras capture a portion of the screen via a respective one of the plurality of mirrors, wherein the plurality of cameras is arranged obliquely with respect to the screen.

The present disclosure relates to systems and methods relating to the fabrication of light guide elements. An example system includes an optical component configured to direct light emitted by a light source to illuminate a photoresist material at one or more desired angles so as to expose an angled structure in the photoresist material. The photoresist material overlays at least a portion of a first surface of a substrate. The optical component includes a container containing a light-coupling material that is selected based in part on the one or more desired angles. The system also includes a reflective surface arranged to reflect at least a first portion of the emitted light to illuminate the photoresist material at the one or more desired angles.

A correction mask for an optical beam homogenizer includes a lens array. The correction mask is configured to provide a shaped initial beam profile. A subset of a plurality of optical paths between the incoming light beam and the illumination plane is at least partially blocked by the correction mask to provide a further homogenized beam profile having a further reduced light intensity variance with respect to an initial homogenized beam profile. The mask includes a plurality of submasks arranged according to a mask grid layout matching the lens grid layout of the lens array. Each one of the submasks is designed with a specific submask pattern to shape the respective subarea of the initial beam profile passing a specific one of the lenslets.