An environmentally friendly photoresist removing composition includes 20 parts by weight to 80 parts by weight of a carbonate compound, 0.5 parts by weight to 15 parts by weight of a hydramine compound, an amide compound, or an ammonium compound, 1 part by weight to 20 parts by weight of an organic base compound, and 2 parts by weight to 70 parts by weight of an alcohol ether compound.

An environmentally friendly photoresist removing composition includes 20 parts by weight to 80 parts by weight of a carbonate compound, 0.5 parts by weight to 15 parts by weight of a hydramine compound, an amide compound, or an ammonium compound, 1 part by weight to 20 parts by weight of an organic base compound, and 2 parts by weight to 70 parts by weight of an alcohol ether compound.

The conductive film is arranged on the support and contains a binder and a metal portion, in which a position at which the contour line reaches the metal portion included in the thin conductive wire is set as an upper end position, and an average area ratio VA of the metal portion in a region ranging from the upper end position to 100 nm toward the support side is 1% or more and less than 50%, and a position at which the contour line reaches the thin conductive wire does not include the metal portion is set to a lower end position, and an average area ratio VM1 of the metal portion in a region ranging from a middle position between the upper end position and the lower end position to 50 nm toward the support side and to 50 nm toward the surface X side is 50% or more.

The conductive film is arranged on the support and contains a binder and a metal portion, in which a position at which the contour line reaches the metal portion included in the thin conductive wire is set as an upper end position, and an average area ratio VA of the metal portion in a region ranging from the upper end position to 100 nm toward the support side is 1% or more and less than 50%, and a position at which the contour line reaches the thin conductive wire does not include the metal portion is set to a lower end position, and an average area ratio VM1 of the metal portion in a region ranging from a middle position between the upper end position and the lower end position to 50 nm toward the support side and to 50 nm toward the surface X side is 50% or more.

The production of photocatalytic color switching of redox imaging nanomaterials for rewritable media is disclosed. The new color switching system is based on photocatalytic redox reaction enabling reversible and considerably fast color switching in response to light irradiation. In accordance with an exemplary embodiment, the color switching system can include a photocatalyst and an imaging media. With the assistance of photocatalyst, UV light irradiation can rapidly reduce the redox imaging nanomaterials accompany with obvious color changing, while the resulting reduced system can be switched back to original color state through visible light irradiation or heating in air condition. The excellent performance of the new color switching system promises their potential use as an attractive rewritable media to meet increasing needs for sustainability and environmental protection.

The production of photocatalytic color switching of redox imaging nanomaterials for rewritable media is disclosed. The new color switching system is based on photocatalytic redox reaction enabling reversible and considerably fast color switching in response to light irradiation. In accordance with an exemplary embodiment, the color switching system can include a photocatalyst and an imaging media. With the assistance of photocatalyst, UV light irradiation can rapidly reduce the redox imaging nanomaterials accompany with obvious color changing, while the resulting reduced system can be switched back to original color state through visible light irradiation or heating in air condition. The excellent performance of the new color switching system promises their potential use as an attractive rewritable media to meet increasing needs for sustainability and environmental protection.

Disclosed are articles having a thermoplastic photochromic coating. The articles exhibit a Bayer Abrasion ratio of at least 2 and desirable photochromic properties, i.e., the formation of darker activated colors and faster rates of photochromic activation and fade when irradiated with ultraviolet light.

Disclosed are articles having a thermoplastic photochromic coating. The articles exhibit a Bayer Abrasion ratio of at least 2 and desirable photochromic properties, i.e., the formation of darker activated colors and faster rates of photochromic activation and fade when irradiated with ultraviolet light.

Methods of forming structures including a photoresist underlayer and structures including the photoresist underlayer are disclosed. Exemplary methods include forming the photoresist underlayer using one or more of plasma-enhanced cyclic (e.g., atomic layer) deposition and plasma-enhanced chemical vapor deposition. Surface properties of the photoresist underlayer can be manipulated using a treatment process.

The production of photocatalytic color switching of redox imaging nanomaterials for rewritable media is disclosed. The new color switching system is based on photocatalytic redox reaction enabling reversible and considerably fast color switching in response to light irradiation. In accordance with an exemplary embodiment, the color switching system can include a photocatalyst and an imaging media. With the assistance of photocatalyst, UV light irradiation can rapidly reduce the redox imaging nanomaterials accompany with obvious color changing, while the resulting reduced system can be switched back to original color state through visible light irradiation or heating in air condition. The excellent performance of the new color switching system promises their potential use as an attractive rewritable media to meet increasing needs for sustainability and environmental protection.