G03C2200/47

METHOD FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

The present invention provides a method for producing a radiation-sensitive resin composition, in which an inter-lot variation in performance of radiation-sensitive resin compositions that have been filtered is suppressed, a pattern forming method, and a method for producing an electronic device. The method for producing a radiation-sensitive resin composition of an embodiment of the present invention has a step 1 of bringing a first solution including a first organic solvent into contact with a first filter to clean the first filter, and a step 2 of filtering a radiation-sensitive resin composition using the first filter cleaned in the step 1.