G03F1/60

MASK BLANKS SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME

A mask blanks substrate having a flatness of a calculation surface of 100 nm or less when a calculation region passing through central portions of first and second main surfaces and extending in a horizontal direction is set, a first region surface is cut out, a second region surface is cut out by setting a reference plane and a rotation axis and rotating the substrate by 180°, least square planes are calculated, the first and second region surfaces are converted into height maps to positions on the least square planes, the height map of the to second region surface is set as a reverse height map by symmetrically moving the height map, and a map of a calculated height obtained by adding heights of the height map of the first region surface and the reverse height map of the second region surface is set as the calculation surface.

MASK BLANKS SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME

A mask blanks substrate having a flatness of a calculation surface of 100 nm or less when a calculation region passing through central portions of first and second main surfaces and extending in a horizontal direction is set, a first region surface is cut out, a second region surface is cut out by setting a reference plane and a rotation axis and rotating the substrate by 180°, least square planes are calculated, the first and second region surfaces are converted into height maps to positions on the least square planes, the height map of the to second region surface is set as a reverse height map by symmetrically moving the height map, and a map of a calculated height obtained by adding heights of the height map of the first region surface and the reverse height map of the second region surface is set as the calculation surface.

Pixel arrangement structure, organic light emitting device, display device and mask

A pixel arrangement structure includes a plurality of pixel groups that are periodically arranged. Each pixel group includes four pixels, a first pixel (310) and a second pixel (320) are arranged in a same row, a third pixel (330) and a fourth pixel (340) are arranged in adjacent another row, the first pixel (310) and the third pixel (330) are arranged in a same column, and the second pixel (320) and the fourth pixel (340) are arranged in adjacent another column. An arrangement of sub-pixels in the first pixel (310) is different from an arrangement of sub-pixels in the second pixel (320), an arrangement of sub-pixels in the third pixel (330) is same as the arrangement of the sub-pixels in the second pixel (320), and an arrangement of sub-pixels in the fourth pixel (340) is same as the arrangement of the sub-pixels in the first pixel (310). The pixel arrangement structure allows the opening area of the metal mask for manufacturing the pixel arrangement structure to be larger, and therefore the aperture ratio is increased and the brightness, service life and image definition of the AMOLED product are improved. An organic light emitting device, a display device and a mask are also provided.

Pixel arrangement structure, organic light emitting device, display device and mask

A pixel arrangement structure includes a plurality of pixel groups that are periodically arranged. Each pixel group includes four pixels, a first pixel (310) and a second pixel (320) are arranged in a same row, a third pixel (330) and a fourth pixel (340) are arranged in adjacent another row, the first pixel (310) and the third pixel (330) are arranged in a same column, and the second pixel (320) and the fourth pixel (340) are arranged in adjacent another column. An arrangement of sub-pixels in the first pixel (310) is different from an arrangement of sub-pixels in the second pixel (320), an arrangement of sub-pixels in the third pixel (330) is same as the arrangement of the sub-pixels in the second pixel (320), and an arrangement of sub-pixels in the fourth pixel (340) is same as the arrangement of the sub-pixels in the first pixel (310). The pixel arrangement structure allows the opening area of the metal mask for manufacturing the pixel arrangement structure to be larger, and therefore the aperture ratio is increased and the brightness, service life and image definition of the AMOLED product are improved. An organic light emitting device, a display device and a mask are also provided.

Substrate with conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing method
11561463 · 2023-01-24 · ·

A substrate with a conductive film for manufacturing a reflective mask which has a rear-surface conductive film with high mechanical strength and is capable of correcting positional deviation of the reflective mask from the rear surface side by a laser beam or the like. A substrate with a conductive film has a conductive film formed on one surface of a main surface of a mask blank substrate used for lithography, wherein the conductive film includes a transparent conductive layer provided on a substrate side and an upper layer provided on the transparent conductive layer, the conductive film has a transmittance of 10% or more for light of wavelength 532 nm, the upper layer is made of a material including tantalum (Ta) and boron (B), and the upper layer has a film thickness of 0.5 nm or more and less than 10 nm.

DEVICE FOR DETECTING A TEMPERATURE, INSTALLATION FOR PRODUCING AN OPTICAL ELEMENT AND METHOD FOR PRODUCING AN OPTICAL ELEMENT
20230018331 · 2023-01-19 ·

A device (20) for detecting a temperature on a surface (15) of an optical element (14) for semiconductor lithography. The device includes an optical element (14) having a face (16) irradiated with electromagnetic radiation (7, 8, 43), a temperature recording device (21), and a temperature controlled element (22) configured to be temperature-controlled and arranged so that the predominant proportion of the intensity of the thermal radiation (25.2) detected by the temperature recording device and reflected by reflection at the surface of the optical element is emitted by the temperature-controlled element.

Also disclosed are an installation (1) for producing a surface (15) of an optical element (14) for semiconductor lithography and a method for producing a surface (15) of an optical element (14) of a projection exposure apparatus (30), wherein the surface is temperature-controlled and the surface temperature is detected during the temperature control.

PHOTOMASK AND PHOTOMASK FIXING DEVICE
20230021136 · 2023-01-19 ·

Embodiment discloses a photomask and a photomask fixing device. The photomask includes a photomask body. The photomask body includes a first side surface and a second side surface arranged in parallel, and a pattern surface connecting the first side surface and the second side surface. The first side surface and the second side surface are respectively provided with a plurality of fixing holes configured for fitting with a fixing portion to fix the photomask body. In the above photomask, two parallel side surfaces positioned on the pattern surface are used as fixing surface of the photomask, i.e., the first side surface and the second side surface. The first side surface and the second side surface are respectively provided with a plurality of fixing holes configured for fitting with the fixing portion configured to fix the photomask, to strengthen fixation of the photomask.

PHOTOMASK AND PHOTOMASK FIXING DEVICE
20230021136 · 2023-01-19 ·

Embodiment discloses a photomask and a photomask fixing device. The photomask includes a photomask body. The photomask body includes a first side surface and a second side surface arranged in parallel, and a pattern surface connecting the first side surface and the second side surface. The first side surface and the second side surface are respectively provided with a plurality of fixing holes configured for fitting with a fixing portion to fix the photomask body. In the above photomask, two parallel side surfaces positioned on the pattern surface are used as fixing surface of the photomask, i.e., the first side surface and the second side surface. The first side surface and the second side surface are respectively provided with a plurality of fixing holes configured for fitting with the fixing portion configured to fix the photomask, to strengthen fixation of the photomask.

MASK, MASK ASSEMBLY HAVING THE SAME, AND SUBSTRATE TRANSFER APPARATUS

A mask, a mask assembly including a mask, and a substrate transfer apparatus including a mask. According to an embodiment, a mask includes a frame including an opening, accommodation structure disposed on the frame and including an accommodation space shielded from an outside, and a sensor disposed in the accommodation space.

MASK, MASK ASSEMBLY HAVING THE SAME, AND SUBSTRATE TRANSFER APPARATUS

A mask, a mask assembly including a mask, and a substrate transfer apparatus including a mask. According to an embodiment, a mask includes a frame including an opening, accommodation structure disposed on the frame and including an accommodation space shielded from an outside, and a sensor disposed in the accommodation space.