G03F7/002

Photosensitive Microcapsules

A photosensitive microcapsule having a shell encapsulating a core material. The core material can comprise a benefit agent and the shell can comprise a photosensitive polymer. The photosensitive polymer can include one or more photosensitive moieties having a substituted amine and a 1,3 dione moiety. The core material can be released from the photosensitive microcapsule upon exposure to an electromagnetic radiation field selected from the group consisting of infrared radiation, visible light, ultraviolet radiation and mixtures thereof.

Pattern forming method

A pattern forming method includes forming a guide pattern on a substrate including first and second regions and applying a directed self-assembly material including a first and a second polymer portion to the substrate. The first region is irradiated with an energy beam. The substrate is subjected to a heating process after irradiation and the directed self-assembly material in the second region separates into a first polymer phase and a second polymer phase. The directed self-assembly material is removed from the first region after irradiation.

Method for manufacturing patterned object, patterned object, and light irradiation apparatus
09939727 · 2018-04-10 · ·

Disclosed herein is a method for manufacturing a patterned object and a light irradiation apparatus that make it possible to form a pattern that accurately follows a mask pattern with higher accuracy in a patterning process of irradiating a pattern forming substrate with vacuum ultra violet light. The light irradiation apparatus includes a mask stage arranged apart from the pattern forming substrate and configured to hold a mask on which a prescribed pattern is formed, and a vacuum ultra violet light source unit configured to irradiate the pattern forming substrate with vacuum ultra violet light through the mask. A space between the mask and the pattern forming substrate is set to be an atmosphere containing oxygen. The vacuum ultra violet light source unit irradiates light, as the vacuum ultra violet light, having a continuous spectrum in a range where a wavelength ranges from 180 nm to 200 nm.

Liquid radiation curable resins capable of curing into layers with selective visual effects and methods for the use thereof

The invention relates to a method for forming a liquid radiation curable resin capable of curing into a solid upon irradiation comprising at least one thermally sensitive visual effect initiator. The liquid radiation curable resin is capable of curing into three-dimensional articles having selective visual effects. The resulting three-dimensional articles possess excellent color and/or transparency stability and excellent mechanical properties.

Atomic layer chemical patterns for block copolymer assembly

Provided herein are methods of directed self-assembly (DSA) on atomic layer chemical patterns and related compositions. The atomic layer chemical patterns may be formed from two-dimensional materials such as graphene. The atomic layer chemical patterns provide high resolution, low defect directed self-assembly. For example, DSA on a graphene pattern can be used achieve ten times the resolution of DSA that is achievable on a three-dimensional pattern such as a polymer brush. Assembly of block copolymers on the atomic layer chemical patterns may also facilitate subsequent etch, as the atomic layer chemical patterns are easier to etch than conventional pattern materials.

Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom

Disclosed herein is a method, comprising disposing a first composition on a substrate, wherein the first composition comprises a first block copolymer comprising a first block and a second block, wherein the first block comprises a repeat unit containing a hydrogen acceptor or a hydrogen donor, and the second block comprises a repeat unit containing a blocked donor when the repeat unit of the first block is a hydrogen acceptor, or a blocked acceptor when the repeat unit of the first block is a hydrogen donor; and a solvent; and deprotecting the blocked acceptor or the blocked donor with a deprotecting agent.

Method of forming pattern of semiconductor device

A method of forming a pattern of a semiconductor device includes forming a lower film on a substrate having a first surface and a second surface at different levels, forming an upper film of hydrophobic material on the lower film, forming a block copolymer film on the upper film, phase-separating the block copolymer film to form first patterns spaced apart from one another and a second pattern spanning the first patterns and interposed between a bottom surface of each of the first patterns and the upper film, removing the first patterns, and performing an etch process using the second pattern or a residual part of the second pattern as an etch mask.

METHOD OF NEGATIVE TONE DEVELOPMENT USING A COPOLYMER MULTILAYER ELECTROLYTE AND ARTICLES MADE THEREFROM

Disclosed herein is a method, comprising disposing a first composition on a substrate, wherein the first composition comprises a first block copolymer comprising a first block and a second block, wherein the first block comprises a repeat unit containing a hydrogen acceptor or a hydrogen donor, and the second block comprises a repeat unit containing a blocked donor when the repeat unit of the first block is a hydrogen acceptor, or a blocked acceptor when the repeat unit of the first block is a hydrogen donor; and a solvent; and deprotecting the blocked acceptor or the blocked donor with a deprotecting agent.

Liquid radiation curable resins capable of curing into layers with selective visual effects and methods for the use thereof

The invention relates to a method for forming a liquid radiation curable resin capable of curing into a solid upon irradiation comprising at least one thermally sensitive visual effect initiator. The liquid radiation curable resin is capable of curing into three-dimensional articles having selective visual effects. The resulting three-dimensional articles possess excellent color and/or transparency stability and excellent mechanical properties.

Primers with improved reflective and thermally insulative properties for microcapsule imaging system
12210282 · 2025-01-28 · ·

Primer layers having improved reflectivity and thermal insulation properties are provided for use in microencapsulated thermal imaging sheets. Primer layers having a polymeric binder, of about 3% to about 60% by weight, relative to the total weight of the primer layer, of a white particulate, a primer substrate, and hollow particulate particles improve the reflectivity, color development, color density, and thermal insulation of microcapsule imaging sheets including the same. A black back-coat applied to the substrate on a side opposite the primer layer further enhances the Dmax and E.sub.10 of microcapsule imaging sheets and prevents premature exposure of microcapsule imaging sheets in stacked media.