A method and a system for correcting lithography process hotspots based on stress damping adjustment are provided. The method includes: acquiring a mark hotspot of a mask pattern; forming N annuli centered on the mark hotspot from inner to outer on a mask; moving vertexes of the mask pattern located in each annulus by a specific distance in a direction deviating from the mark hotspot and connecting the moved vertexes according to an original connection relationship to acquire an updated layout; verifying electrical characteristics of the updated layout, determining whether a deviation of the electrical characteristics of the updated layout is within a tolerable range, and performing geometric correction to compensate for a deviation of electrical parameters if no is determined and then ending correction, or ending the correction if yes is determined.

Provided are a resin composition including a coloring material, a resin, and a solvent, in which the resin includes a graft polymer which has a main chain including a molecular chain having a structure derived from a compound having an ethylenically unsaturated bond-containing group and a graft chain, and the graft chain includes a repeating unit p1 having an oxetane group; a film formed of the resin composition; an optical filter; a solid-state imaging element; and an image display device.

Disclosed are a color filter including a wavelength conversion layer which converts the wavelength of light, a light transmission layer formed on the wavelength conversion layer, and a wavelength filter layer formed on the light transmission layer, and an image display device. The light transmission layer transmits a light moving between the wavelength conversion layer and the wavelength filter layer and blocks the flow of outgas. The color filter includes the light transmission layer which transmits a light moving between the wavelength conversion layer and the wavelength filter layer and blocks the flow of outgas, thereby capable of achieving high color reproductivity while having excellent light-emitting efficiency and light retention rate.

A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.

Methods and systems for a financial card with dynamic viewing angles are disclosed. A first portion of indicia and a second portion of indicia can be disposed on a first surface and/or a second surface of a financial card. The first portion of the indicia can be viewable only from at least a first viewing angle. The second portion of the indicia can be viewable only from at least a second viewing angle, the second viewing angle being different from the first viewing angle.

A method and apparatus for mass production of AR diffractive waveguides. Low-cost mass production of large-area AR diffractive waveguides (slanted surface-relief gratings) of any shape. Uses two-photon polymerization micro-nano 3D printing to realize manufacturing of slanted grating large-area masters of any shape (thereby solving the problem about manufacturing of slanted grating masters of any shape on the one hand, realizing direct manufacturing of large-size wafer-level masters on the other hand, and also having the advantages of low manufacturing cost and high production efficiency). Composite nanoimprint lithography technology is employed (in combination with the peculiar imprint technique and the composite soft mold suitable for slanted gratings) to solve the problem that a large-slanting-angle large-slot-depth slanted grating cannot be demolded and thus cannot be manufactured, and realize the manufacturing of the slanted grating without constraints (geometric shape and size).

Provided herein are encoded microcarriers for analyte detection in multiplex assays. The microcarriers are encoded with an analog code for identification and include a capture agent for analyte detection. Also provided are methods of making the encoded microcarriers disclosed herein. Further provided are methods and kits for conducting a multiplex assay using the microcarriers described herein.

An imprinting platform including a noble metal catalyst, a semiconductor substrate, and a pre-patterned polymer stamp, where the catalyst is attached to the stamp, and related methods and articles.

[Problem] To provide a negative type photosensitive composition which is capable of forming a cured film having high resolution and high light shielding properties. [Means for Solution] A negative type photosensitive composition comprising (I) an alkali-soluble resin, (II) a black colorant, (III) a polymerization initiator, and (IV) a solvent, wherein the black colorant (II) has a transmittance ratio represented by [transmittance at the wavelength of 365 nm]/[transmittance at the wavelength of 500 nm] of 1.2 more.

A method for manufacturing glass-based micro- and nanostructure comprising the step of dewetting a thin-film glass layer on a textured substrate to form the micro- and nanostructure from the thin-film glass layer.