Provided are a washout processor and a washing method in which a device configuration is small and processing such as development can be stably performed on a flexographic printing plate precursor. There is provided a washout processor that performs development using a washing solution while transporting an imagewise exposed flexographic printing plate precursor, the washout processor having a leader that fixes both of a leading end and a trailing end of the flexographic printing plate precursor and a tension applying unit that applies tension to the flexographic printing plate precursor.

Digitally imagable flexographic printing elements for producing flexographic printing plates, which comprise an organically soluble relief-forming layer, a water-soluble barrier layer for oxygen, and a water-soluble laser-ablatable mask layer. A method for producing flexographic printing plates using such flexographic printing elements, which comprises a two-stage washout procedure using aqueous and organic washout media.

A developing method of performing a developing treatment on a substrate includes: supplying a developing solution containing an organic solvent to the substrate having a metal-containing coating film exposed into a predetermined pattern; and supplying a cleaning solution containing an organic solvent to the substrate supplied with the developing solution, wherein the cleaning solution is lower in solubility of the metal-containing coating film than the developing solution.

This invention relates to a photoresist stripper composition. The photoresist stripper composition according to the present invention comprises at least one choline compound; at least one polar aprotic solvent; and water; the weight percentage of the choline compound is from 2.5 to 50%, preferably from 5 to 50%, more preferably from 7 to 30%, and most preferably from 9 to 18% by weight based on the total weight of the composition. The photoresist stripper composition according to the present invention exhibits excellent photoresist cleaning performance and low etching to the substrate.

An apparatus for treating a relief precursor having a back side and a relief side. The apparatus includes a housing, a treating means for treating the relief precursor with at least one liquid, a removal means for removing debris and/or liquid from the relief precursor, the removal means arranged downstream of the treating means, and a conveying mechanism configured for transporting the relief precursor in a transport direction through the housing. The removal means includes a liquid removal and guidance body mounted for removing liquid from the back side of the relief precursor. The conveying mechanism is configured for pulling the relief precursor over and against said liquid removal and guidance body whilst the relief precursor is moved in the transport direction, such that in operation liquid is removed from the back side.

A developing treatment method performs a developing treatment on a resist film on a substrate. The method includes: a pattern forming step of forming a resist pattern by supplying a developing solution to the substrate and developing the resist film on the substrate; a coating step of coating the developed substrate with an aqueous solution of a water-soluble polymer; and a rinse step of cleaning the substrate by supplying a rinse solution to the substrate coated with the aqueous solution of the water-soluble polymer.

A photoresist layer is coated over a wafer. The photoresist layer includes a metal-containing material. An extreme ultraviolet (EUV) lithography process is performed to the photoresist layer to form a patterned photoresist. The wafer is cleaned with a cleaning fluid to remove the metal-containing material. The cleaning fluid includes a solvent having Hansen solubility parameters of delta D in a range between 13 and 25, delta P in a range between 3 and 25, and delta H in a range between 4 and 30. The solvent contains an acid with an acid dissociation constant less than 4 or a base with an acid dissociation constant greater than 9.

Provided is a washing device that has a small device configuration, is excellent in maintainability, and further has a high productivity. The washing device performs development using a washing solution while transporting an imagewise exposed flexographic printing plate precursor. The washing device has a transporting unit that transports the flexographic printing plate precursor along a transport path having a curved transport passage and a linear transport passage, using a leader and a developing portion that performs development by removing an unexposed portion of the flexographic printing plate precursor. The transporting unit transports the flexographic printing plate precursor using a winding transmission method or transports the flexographic printing plate precursor using a method of winding a traction member provided at the leader.

There is provided a manufacturing method for a cured substance, which makes it possible to obtain a cured substance having excellent breaking elongation, a manufacturing method for a laminate, including the manufacturing method for a cured substance, a manufacturing method for a semiconductor device, including the manufacturing method for a cured substance or the manufacturing method for a laminate, and there is provided a treatment liquid that is used in the manufacturing method for a cured substance.

The manufacturing method for a cured substance includes a film forming step of applying a resin composition containing a precursor of a cyclization resin onto a base material to form a film, a treatment step of bringing a treatment liquid into contact with the film, and a heating step of heating the film after the treatment step, in which the treatment liquid contains at least one compound selected from the group consisting of a basic compound having an amide group and a base generator having an amide group.

The present invention relates to an apparatus (10) for developing printing precursors (11) comprising a developing station (20) comprising a rotating drum (22) having a fixation mechanism (24) for the precursor (11) and at least one brush (26). The apparatus (10) further comprises a pre-cleaning station (30) and a first transport mechanism (12), the first transport mechanism (12) being configured for transporting the precursor (11) through the pre-cleaning station (30) and, after the precursor (11) has passed the pre-cleaning station (30), to the developing station (20). Further aspects relate to a method for developing a printing precursor using such an apparatus.