G03H2240/55

GRADED PORE STRUCTURE WITHOUT PHASE MASK

A method to form a three-dimensional photonic crystal template with a gradient structure involves irradiating a photoresist composition of a thickness of at least 15 μm from at least four laser beams to yield a periodic patterned with a percolating matrix of mass in constructive volumes of a cured photoresist composition and destructive volumes of voids free of condensed matter where the proportion of constructive volume displays a gradient from the irradiated surface to the substrate after development. For a given light intensity, photoinitiator concentration in the photoresist composition, and a given thickness, by irradiating for a relatively short period, a three-dimensional photonic crystal template displaying a gradient having greater constructive volume proximal the air interface forms and a relatively long irradiation period results in a gradient having greater constructive volume proximal the substrate.

Refractive index modulation modification in a holographic grating

Techniques disclosed herein relate to modifying refractive index modulation in a holographic optical element, such as a holographic grating. According to certain embodiments, a holographic optical element or apodized grating includes a polymer layer comprising a first region characterized by a first refractive index and a second region characterized by a second refractive index. The holographic optical element or apodized grating includes a plurality of nanoparticles dispersed in the polymer layer. The nanoparticles have a higher concentration in either the first region or the second region. In some embodiments, the nanoparticles may be configured to increase the refractive index modulation. In some embodiments, the nanoparticles may be configured to apodize the grating by decreasing the refractive index modulation proximate to sides of the grating. The refractive index may be modulated by applying a monomer reservoir buffer layer to the polymer layer, either before or after hologram fabrication.

Graded pore structure without phase mask

A method to form a three-dimensional photonic crystal template with a gradient structure involves irradiating a photoresist composition of a thickness of at least 15 μm from at least four laser beams to yield a periodic patterned with a percolating matrix of mass in constructive volumes of a cured photoresist composition and destructive volumes of voids free of condensed matter where the proportion of constructive volume displays a gradient from the irradiated surface to the substrate after development. For a given light intensity, photoinitiator concentration in the photoresist composition, and a given thickness, by irradiating for a relatively short period, a three-dimensional photonic crystal template displaying a gradient having greater constructive volume proximal the air interface forms and a relatively long irradiation period results in a gradient having greater constructive volume proximal the substrate.

REFRACTIVE INDEX MODULATION MODIFICATION IN A HOLOGRAPHIC GRATING

Techniques disclosed herein relate to modifying refractive index modulation in a holographic optical element, such as a holographic grating. According to certain embodiments, a holographic optical element or apodized grating includes a polymer layer comprising a first region characterized by a first refractive index and a second region characterized by a second refractive index. The holographic optical element or apodized grating includes a plurality of nanoparticles dispersed in the polymer layer. The nanoparticles have a higher concentration in either the first region or the second region. In some embodiments, the nanoparticles may be configured to increase the refractive index modulation. In some embodiments, the nanoparticles may be configured to apodize the grating by decreasing the refractive index modulation proximate to sides of the grating. The refractive index may be modulated by applying a monomer reservoir buffer layer to the polymer layer, either before or after hologram fabrication.

HOLOGRAPHIC OPTICAL DEVICE AND MANUFACTURING METHOD THEREFOR

An embodiment of the present disclosure provides a holographic optical element and a manufacturing method of a holographic optical element including holographic gratings, the manufacturing method including: a step (a) of forming a photosensitive substrate by coating one surface of a substrate with a photosensitive resin; and a step (b) of recording the holographic gratings by irradiating each of one surface and the other surface of the photosensitive substrate with laser light, wherein in the step (a), the photosensitive resin is applied so that a height of a photosensitive resin coating layer varies along a predetermined direction.

ILLUMINATION DEVICE FOR VEHICLES
20210278803 · 2021-09-09 · ·

A hologram for an illumination device for vehicles and a corresponding illumination device are provided. The hologram has a plurality of holographic structures designed for a respectively associated wavelength, wherein the holographic structures have diffraction properties that are identical among one another.

Illumination device for vehicles
11841683 · 2023-12-12 · ·

A hologram for an illumination device for vehicles and a corresponding illumination device are provided. The hologram has a plurality of holographic structures designed for a respectively associated wavelength, wherein the holographic structures have diffraction properties that are identical among one another.

Method for producing a holographic optical element

The invention relates to a method for producing a holographic optical element by providing a recording stack comprising at least one recording element laminated on at least one supporting element, irradiating at least a part of the recording stack with at least one recording beam in an irradiating step, wherein during the irradiating step, the recording stack bends, providing a bending deviation threshold for the recording stack, and adjusting at least one first process parameter such that an expected maximum bending deviation of the recording stack does not exceed the bending deviation threshold, wherein the at least one first process parameter influences the bending behaviour of the recording stack during the irradiating step.

REFRACTIVE INDEX MODULATION MODIFICATION IN A HOLOGRAPHIC GRATING

Techniques disclosed herein relate to modifying refractive index modulation in a holographic optical element, such as a holographic grating. According to certain embodiments, a holographic optical element or apodized grating includes a polymer layer comprising a first region characterized by a first refractive index and a second region characterized by a second refractive index. The holographic optical element or apodized grating includes a plurality of nanoparticles dispersed in the polymer layer. The nanoparticles have a higher concentration in either the first region or the second region. In some embodiments, the nanoparticles may be configured to increase the refractive index modulation. In some embodiments, the nanoparticles may be configured to apodize the grating by decreasing the refractive index modulation proximate to sides of the grating. The refractive index may be modulated by applying a monomer reservoir buffer layer to the polymer layer, either before or after hologram fabrication.

Method for producing a beam shaping holographic optical element

A method for recording a plurality of scatter volume holograms in a photopolymeric recording medium, the method including at least the following steps providing a first laser light source, providing a photopolymeric recording medium including a substrate and a photoactive layer, wherein the photopolymeric recording medium has an index modulation n of at least 0.04 and a thickness d of the photoactive layer of at least 25 m, and irradiating the photopolymeric recording medium with the first laser light beam generated by the first laser light source with a minimum irradiation energy dosage of 3*D.sub.i, D.sub.i being the inhibition dosage of the photoactive layer.