Methods and systems are provided for monitoring sensors and other data sources and detecting data anomalies. One exemplary method involves determining a probable range for a metric influenced by a behavior a sensor based at least in part on historical data associated with the sensor, identifying an anomalous condition with respect to the sensor based on a relationship between a current value for the metric indicative of a current behavior of the sensor and the probable range, and providing a graphical indication of the anomalous condition on a display device.

Methods and systems are provided for monitoring sensors and other data sources and detecting data anomalies. One exemplary method involves determining a probable range for a metric influenced by a behavior a sensor based at least in part on historical data associated with the sensor, identifying an anomalous condition with respect to the sensor based on a relationship between a current value for the metric indicative of a current behavior of the sensor and the probable range, and providing a graphical indication of the anomalous condition on a display device.

A method for detecting an anomaly in sensor data generated in a substrate processing apparatus is disclosed herein. A plurality of data sets is received. A first data set from a first sensor and second data set from a second sensor are selected. The first second sensors are defined as a sensor pair. A reference correlation is generated by selecting a subset of values in each data set for each of the first and second data sets. A difference of remaining data correlation outside the subset of values in each data set to the reference correlation is normalized. The normalized data set is filtered to smooth the normalized difference to avoid isolated outliers with high chance of false positive candidates. One or more anomalies are identified. Process parameters of the substrate processing apparatus are adjusted, based on the one or more identified anomalies from the filtered data set.

A method for detecting an anomaly in sensor data generated in a substrate processing apparatus is disclosed herein. A plurality of data sets is received. A first data set from a first sensor and second data set from a second sensor are selected. The first second sensors are defined as a sensor pair. A reference correlation is generated by selecting a subset of values in each data set for each of the first and second data sets. A difference of remaining data correlation outside the subset of values in each data set to the reference correlation is normalized. The normalized data set is filtered to smooth the normalized difference to avoid isolated outliers with high chance of false positive candidates. One or more anomalies are identified. Process parameters of the substrate processing apparatus are adjusted, based on the one or more identified anomalies from the filtered data set.