A display apparatus includes an acquisition unit acquiring a basic motion program, a life calculation unit calculating a first life of a robot arm when a motion is performed based on the basic motion program acquired by the acquisition unit, a creation unit creating a corrected motion program for setting a life of the robot arm to be a second life longer than the first life using the same configuration of the robot arm and work start position and work end position of a control point as those of the basic motion program and changing a position of a proximal end of the robot arm, and a display unit displaying a position of the proximal end of the robot arm in the corrected motion program.

The invention relates to a method for representing the machining operations in the machining area of a machine tool, wherein a tool or workpiece is scanned and the machining process is visualized. The invention relates furthermore to a corresponding machine tool and a corresponding system.

Methods for providing a workpiece computer model including a plurality of objects defined in a body of material. A temporary support frame is provided as part of a two-sided machining process in which the workpiece is partially milled from an obverse side. The machine-control instructions are also based on one or more occupying structures added to the workpiece to fill in one or more excess unoccupied regions of the workpiece that would otherwise be machined away during machining of the objects. Providing such occupying structure(s) reduces the amount of machining that needs to be performed.

A method for configuring a clean room (2) for the manufacture of pharmaceutical products and the manufacture of pharmaceutical products includes the steps: selecting a pharmaceutical product for the manufacture in the clean room (2); determining one or a plurality of specific devices (16) and/or one or a plurality of specific materials (18) for the manufacture of the selected pharmaceutical product; and assigning locations for the particular, respectively specific devices (16) and/or specific materials (18) in the clean room (2) and, that is, by using a navigation system (4). The navigation system (4) issues at least one notification (6, 8, 10, 12, 14) associated with a location in the clean room (2) indicating where the specific device (16) and/or the specific material (18) for the manufacture of the selected pharmaceutical product is/are to be placed.

A method for configuring a clean room (2) for the manufacture of pharmaceutical products and the manufacture of pharmaceutical products includes the steps: selecting a pharmaceutical product for the manufacture in the clean room (2); determining one or a plurality of specific devices (16) and/or one or a plurality of specific materials (18) for the manufacture of the selected pharmaceutical product; and assigning locations for the particular, respectively specific devices (16) and/or specific materials (18) in the clean room (2) and, that is, by using a navigation system (4). The navigation system (4) issues at least one notification (6, 8, 10, 12, 14) associated with a location in the clean room (2) indicating where the specific device (16) and/or the specific material (18) for the manufacture of the selected pharmaceutical product is/are to be placed.

A semiconductor wafer position display system, a semiconductor wafer position display method, and a semiconductor wafer position display program with which a deviation from an appropriate placement position of a semiconductor wafer mounted in a wafer mounting part can be displayed to a user in an easily understood manner are provided. The semiconductor wafer position display system includes: a data reception unit for receiving measurement data obtained by a semiconductor wafer position measurement device for measuring the deviation from the appropriate placement position of the semiconductor wafer mounted in the wafer mounting part; and a screen display control unit for controlling a display screen for visibly displaying the deviation from the appropriate placement position of the semiconductor wafer based on the measurement data received by the data reception unit, wherein the screen display control unit includes a circumference display screen control unit for presenting the deviation from the appropriate placement position of the semiconductor wafer by displaying a circumference of the semiconductor wafer based on the measurement data received by the data reception unit.

The disclosure relates to an arrangement for monitoring a position of a hand-held tool within a work region, comprising the hand-held tool for use within the work region; means that are designed to generate a virtual image of the work region; means that are designed to determine an actual position of the hand-held tool within the image; the hand-held tool having display means that are designed to display the actual position, and to a method for monitoring a position of a hand-held tool.

Methods for providing a workpiece computer model including a plurality of objects defined in a body of material. A temporary support frame is provided as part of a two-sided machining process in which the workpiece is partially milled from an obverse side. The machine-control instructions are also based on one or more occupying structures added to the workpiece to fill in one or more excess unoccupied regions of the workpiece that would otherwise be machined away during machining of the objects. Providing such occupying structure(s) reduces the amount of machining that needs to be performed.

The invention relates to a method for representing the machining operations in the machining area of a machine tool, wherein a tool or workpiece is scanned and the machining process is visualized. The invention relates furthermore to a corresponding machine tool and a corresponding system.