G05B2219/45096

Ethercat liquid flow controller communication for substrate processing systems

In a substrate processing system, such as a chemical mechanical system, updated controller configuration data is obtained for a plurality of liquid flow controllers of the substrate processing system. Each of a plurality of liquid flow controllers (LFCs) coupled to an Ethernet for Control Automation Technology (EtherCAT) bus automatically downloads a copy of the updated controller configuration data through the EtherCAT bus. Each of the plurality of liquid flow controllers controls fluid flow of a separate fluid line from a plurality of fluid lines in the substrate processing system, fluid flow through the plurality of fluid lines is controlled using the plurality of liquid flow controllers having the updated controller configuration data.

Force Control Parameter Setup Support Method And Force Control Parameter Setup Support System
20230001577 · 2023-01-05 ·

A force control parameter setup support method of supporting a setup of a force control parameter to be used for force control when controlling a robot arm a tip of which is attached with a polishing tool using the force control to perform a polishing task on an object including a first step of obtaining task information related to the polishing task, a second step of selectively reading out information of the force control parameter corresponding to the task information obtained in the first step from a storage section in which a plurality of pieces of information of the force control parameter is stored, and a third step of displaying the information of the force control parameter read out in the second step on a display section.

Teaching Support Device
20230001567 · 2023-01-05 ·

A teaching support device configured to perform teaching to a robot which has a robot arm a tip of which is attached with a polishing tool, and which controls the robot arm with force control to perform a polishing task on an object includes a teaching point acquisition section configured to obtain information related to a plurality of teaching points set to the object, a polishing parameter acquisition section configured to obtain information related to a polishing parameter of the polishing task at the plurality of teaching points obtained by the teaching point acquisition section, and a display control section configured to display the teaching point out of the plurality of teaching points with a color based on the polishing parameter obtained by the polishing parameter acquisition section so as to overlap the object.

POLISHING AMOUNT ESTIMATION DEVICE
20230034765 · 2023-02-02 · ·

There is provided a polishing amount estimation device which can facilitate the setting of parameters of teaching trajectory or force control in a polishing operation. A polishing amount estimation device for estimating a polishing amount in a polishing operation which is performed by bringing a polishing tool mounted on a robot manipulator into contact with a target workpiece by force control includes a memory which stores a motion program, and a polishing amount estimation part configured to estimate the polishing amount based on at least one of a motion trajectory of the polishing tool, a movement speed of the polishing tool, and a pressing force of the polishing tool against the target workpiece, which are obtained based on the motion program.

POLISHING HEAD MANAGEMENT SYSTEM AND METHOD

The embodiments of the present disclosure provide a polishing head management system and method. The polishing head management system includes: a storage device, a pick-and-place device and a data acquisition device, where the storage device is used to store polishing heads; the pick-and-place device is used to pick a polishing head or place a polishing head into the storage device; the data acquisition device is connected with the storage device and the pick-and-place device, and is used to record at least one management cycle of the polishing head.

ETHERCAT LIQUID FLOW CONTROLLER COMMUNICATION FOR SUBSTRATE PROCESSING SYSTEMS

In a substrate processing system, such as a chemical mechanical system, updated controller configuration data is obtained for a plurality of liquid flow controllers of the substrate processing system. Each of a plurality of liquid flow controllers (LFCs) coupled to an Ethernet for Control Automation Technology (EtherCAT) bus automatically downloads a copy of the updated controller configuration data through the EtherCAT bus. Each of the plurality of liquid flow controllers controls fluid flow of a separate fluid line from a plurality of fluid lines in the substrate processing system, fluid flow through the plurality of fluid lines is controlled using the plurality of liquid flow controllers having the updated controller configuration data.

ROBOT CONTROL BASED ON EQUIVALENT MASS MATRIX
20230249339 · 2023-08-10 ·

A robot control system includes circuitry configured to: acquire velocity of a robot in a working space in which the robot processes a workpiece based on a force control axis and a position control axis, the velocity being along the force control axis; select an equivalent mass matrix representing a relationship between acceleration and force in the working space, based on the acquired velocity, from a first equivalent mass matrix corresponding to the velocity being zero and a second equivalent mass matrix corresponding to the velocity not being zero; and generate a control signal for controlling the robot based on the selected equivalent mass matrix.

AUTOMATED SURFACE PREPARATION SYSTEM
20220016774 · 2022-01-20 ·

Automated systems and methods of using a smart end-effector tool to prepare (e.g., scuffing, abrading, sanding, polishing, etc.) an object surface are provided. The smart tool can update its working state with a robot arm in real time, which in turn adjusts locomotion parameters to optimize the tool's working state on the object surface.

Method and apparatus for adjusting robot motion path
11806877 · 2023-11-07 · ·

Embodiments of present disclosure relate to adjusting a robot motion path. In the method for adjusting a robot motion path, a first processing procedure may be performed on a first workpiece to obtain a first product. Then, first process data may be obtained, where the first process data describes an attribute of the first processing procedure for obtaining the first product from the first workpiece. Next, based on the obtained first process data, a robot motion path of a second processing procedure that is to be performed on the first product by a robot may be adjusted. Further, embodiments of present disclosure provide apparatuses, systems, and computer readable media for adjusting a robot motion path.

Automatic Teaching System

Provided is an automatic teaching system that is readily able to achieve automation, even when a small but varied number of processing objects are to undergo polishing or coating. The automatic teaching system includes a three-dimensional shape measurement apparatus, a reference marker, an image analysis apparatus, and a robot control device. The three-dimensional shape measurement apparatus acquires shape data of a processing target region on a processing object relative to the reference marker, and the image analysis apparatus divides the shape data of the processing target region into a plurality of continuous reference surfaces, in accordance with a predetermined algorithm, automatically generates a program of an operation path along which a polishing apparatus or coating apparatus of the robot is to be operated, for every reference surface, in accordance with a predetermined operation path generation rule, and transmits the program of the operation path to the robot control device.