Patent classifications
G05D11/132
PRECISION CONTROL AND CHARACTERIZATION OF DISPENSED SUBSTANCES
Method for dispensing a recipe includes measuring characterization data for components of a recipe. A signal representing an instruction to dispense the recipe is received at a processor operably coupled to a dispenser. In response to receiving the signal representing the instruction to dispense, an instruction set is generated based on the recipe and the characterization data. The instruction set is executed, to cause a series of delivery events of the components. Prior to each individual delivery event comprising the instruction set, a deviation, from their predetermined setpoints, is detected in a temperature and/or a pressure of the microfluidic dispenser. In response to detecting the deviation in temperature and/or pressure, the processor automatically causes an adjustment to one or more instructions from the instruction set based on the detected variation such that the amount of each component delivered more closely conforms to the amount specified in the recipe.
PROCESS FOR CONTROLLING HYDROGEN SULFIDE AND AMMONIA FLOW RATES
A control process and apparatus provide feed forward control of stoichiometric proportions of hydrogen sulfide and ammonia to a thermal oxidizer and an ammonia scrubber, respectively. To account for unmeasured or uncalculated sulfur feed to the thermal oxidizer, a feed back measurement of sulfur dioxide and ammonia concentration is used to correct the flow rate of hydrogen sulfide to the thermal oxidizer and/or ammonia to the ammonia scrubber.
Controlled blending of biodiesel into distillate streams
Methods are provided for accurately blending biodiesel into distillate streams to achieve a pre-determined percentage of biodiesel in the distillate, applicable to wild-type distillate streams as well as distillate streams that already contain some percentage of biodiesel.
CHEMICAL SOLUTION PREPARATION SYSTEM AND METHOD
The present disclosure provides a chemical solution preparation system and method. The chemical solution preparation system includes: a first mixing system, configured to mix a first chemical solution and a first diluent to obtain a first mixture; a second mixing system, configured to mix a second chemical solution and a second diluent to obtain a second mixture; a third mixing system, configured to mix the first mixture, the second mixture, and a third diluent to obtain a third mixture; an output system, configured to output the third mixture to a spray apparatus of the chemical mechanical polishing device; a sampling system, configured to collect a sample of the third mixture output from the output system; and a monitoring system, configured to monitor a status of the first mixture, a status of the second mixture, and a status of the third mixture.
Gas supply system and gas supply method
A gas supply system includes a first flow channel connected to a first gas source of a first gas, formed inside a ceiling or a sidewall of the treatment container, and communicating with the treatment space through a plurality of first gas discharge holes, a second flow channel connected to a second gas source of a second gas, formed inside the ceiling or the sidewall of the treatment container, and communicating with the treatment space through a plurality of second gas discharge holes, and a plurality of first diaphragm valves, wherein each of the first diaphragm valves is provided between the first flow channel and the first gas discharge hole to correspond to the first gas discharge hole.
Vaporization system and concentration control module used in the same
Provided is a concentration control module that improve responsiveness of concentration control of a vaporization system, and is used in a vaporization system. The concentration control module includes a concentration measuring part configured to measure a concentration of a source gas; a valve provided in a lead-out pipe configured to lead out the source gas from the tank; a pressure target value calculating part configured to calculate a pressure target value inside the tank by using a concentration target value of the source gas, and a concentration measured value of the concentration measuring part; a delay filter configured to generate a pressure control value by applying a predetermined time delay to the pressure target value obtained by the pressure target value calculating part; and a valve control part configured to feedback-control the valve by using a deviation between the pressure control value obtained by the delay filter, and a pressure inside the tank.
Mass flow control system, and semiconductor manufacturing equipment and vaporizer including the system
In a mass flow control system which comprises a first apparatus that is a mass flow controller, an external sensor that is at least one detection means constituting a second apparatus that is an apparatus disposed outside said first apparatus and at least one control section prepared in either one or both of housings of said first apparatus and said second apparatus, and is configured so as to control a flow rate of fluid flowing through a channel, the control section is configured such that opening of a flow control valve can be controlled based on at least an external signal that is a detection signal output from the external sensor.
Apparatus, method and system for calibrating a liquid dispensing system
An apparatus, method and system providing for calibration and/or control of a liquid dispensing system is disclosed. The hand-held calibration auditing tool includes a flow meter (36-37) with inlets adapted for quick connection to one or more liquid inputs and/or liquid outputs of a liquid dispensing system (10). A sensor (94-95) having a data output of liquid flow information for a liquid input to the dispensing system (10) is operably connected to a controller (12) to receive the liquid flow information for the liquid input. The controller (12) provides a dilution rate and other liquid flow information for a liquid product input to a dispenser. The tool may include any number of flow meters, and may also include a flow meter connected to an outlet of a dispenser (22) for providing flow information.
LIQUID SUPPLY SYSTEM AND LIQUID SUPPLY METHOD
Embodiments of the present application provide a liquid supply system and a liquid supply method. The liquid supply system includes: a mixing tank, the mixing tank being connected to at least a first injection pipe, a second injection pipe and a replenishing pipe; the first injection pipe and the second injection pipe being configured to inject a first liquid and a second liquid into the mixing tank respectively, so as to form a mixed liquid; a parameter acquisition module configured to acquire a concentration of the first liquid in the mixed liquid; and a treatment module configured to control, based on the acquired concentration of the first liquid and a preset concentration of the first liquid, the replenishing pipe to inject the first liquid with a first flow rate into the mixing tank, or inject the second liquid with a second flow rate into the mixing tank.
SMART GAS MIXER
A gas mixer device for mixing a plurality of gases to generate a gas mixture comprising a desired composition, wherein the gas mixer device comprises: a chassis supporting a mixing chamber for receiving the respective gas and storing said gas mixture, and a plurality of mass flow controllers configured to measure and control a mass flow of the respective gas. According to the present invention, the respective mass flow controller is configured to be releasably connected to the chassis. Furthermore, the present invention relates to a method for generating a gas mixture comprising a desired composition.