G11B5/658

Magnetic Film and Perpendicular Magnetic Recording Medium
20230227964 · 2023-07-20 ·

Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.

Sputtering Target
20230019656 · 2023-01-19 ·

A sputtering target according to the present invention contains Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, and wherein the sputtering target contains Nb.sub.2O.sub.5 as a metal oxide component.

Glass for magnetic recording medium substrate, magnetic recording medium substrate, magnetic recording medium and glass spacer for magnetic recording and reproducing apparatus
11551714 · 2023-01-10 · ·

A glass for magnetic recording medium substrate is an amorphous oxide glass. In terms of mol %, SiO.sub.2 content ranges from 45 to 68%, Al.sub.2O.sub.3 from 5 to 20%, total content of SiO.sub.2 and Al.sub.2O.sub.3 60 to 80%, B.sub.2O.sub.3 from 0 to 5%, MgO from 3 to 28%, CaO from 0 to 18%, total content of BaO and SrO 0 to 2%, total content of alkali earth metal oxides from 12 to 30%, total content of alkali metal oxides from 3.5 to 15%, and at least one kind selected from the group made of Sn oxide and Ce oxide being included, a total content of Sn oxide and Ce oxide ranges from 0.05 to 2.00%, a glass transition temperature ≥625° C., a Young's modulus ≥83 GPa, a specific gravity ≤2.85, and an average linear expansion coefficient at 100 to 300° C.≥48×10.sup.−7/° C.

HEAT-ASSISTED MAGNETIC RECORDING (HAMR) MEDIA WITH MAGNESIUM TRAPPING LAYER

Various apparatuses, systems, methods, and media are disclosed to provide a heat-assisted magnetic recording (HAMR) medium that has a magnesium (Mg) trapping layer that is configured to mitigate Mg migration in the HAMR medium so as to prevent near field transducer (NFT) damage caused by dissociated Mg reacting with a compound used in the NFT. In one example, the HAMR medium can include a substrate, a seed layer on the substrate and including MgO, a magnetic recording layer on the seed layer, and a Mg trapping layer on the substrate and configured to mitigate Mg migration from the seed layer to a surface of the HAMR medium above the magnetic recording layer.

SPUTTERING TARGET FOR HEAT-ASSISTED MAGNETIC RECORDING MEDIUM
20220383901 · 2022-12-01 ·

Provided is a sputtering target to be used for forming a granular magnetic thin film in which FePt magnetic grains are isolated by an oxide and which constitutes a heat-assisted magnetic recording medium having enhanced uniaxial magnetic anisotropy, thermal stability, and SNR (signal-to-noise ratio).

The sputtering target for a heat-assisted magnetic recording medium contains an FePt alloy and a nonmagnetic material as main components, where the nonmagnetic material is an oxide having a melting point of 800° C. or higher and 1100° C. or lower.

Sputtering target, granular film and perpendicular magnetic recording medium

Provided is a sputtering target containing 0.05 at % or more of Bi, and having a total content of metal oxides of from 10 vol % to 70 vol %, the balance containing at least Ru.

GLASS FOR MAGNETIC RECORDING MEDIUM SUBSTRATE, MAGNETIC RECORDING MEDIUM SUBSTRATE, MAGNETIC RECORDING MEDIUM AND GLASS SPACER FOR MAGNETIC RECORDING AND REPRODUCING APPARATUS
20230103236 · 2023-03-30 · ·

A glass for magnetic recording medium substrate is an amorphous oxide glass. In terms of mol %, SiO.sub.2 content ranges from 45 to 68%, Al.sub.2O.sub.3 from 5 to 20%, total content of SiO.sub.2 and Al.sub.2O.sub.3 60 to 80%, B.sub.2O.sub.3 from 0 to 5%, MgO from 3 to 28%, CaO from 0 to 18%, total content of BaO and SrO 0 to 2%, total content of alkali earth metal oxides from 12 to 30%, total content of alkali metal oxides from 3.5 to 15%, and at least one kind selected from the group made of Sn oxide and Ce oxide being included, a total content of Sn oxide and Ce oxide ranges from 0.05 to 2.00%, a glass transition temperature ≥625° C., a Young's modulus ≥83 GPa, a specific gravity ≤2.85, and an average linear expansion coefficient at 100 to 300° C.≥48×10.sup.−7/° C.

Magnetic recording medium

An object is to provide a magnetic recording medium having excellent traveling stability and a thin total thickness. The present technology provides a tape-shaped magnetic recording medium including: a magnetic layer; an underlayer; a base layer; and a back layer, in which a surface on a side of the magnetic layer has a kurtosis of 3.0 or more, a surface on a side of the back layer has a kurtosis of 2.0 or more, the surface on the magnetic layer side has arithmetic average roughness R.sub.a of 2.5 nm or less, the base layer includes a polyester as a main component, the magnetic recording medium has an average thickness t.sub.T of 5.6 μm or less, the magnetic recording medium includes a lubricant, the lubricant includes a fatty acid and a fatty acid ester, and a mass ratio between the fatty acid and the fatty acid ester extracted with hexane satisfies fatty acid/fatty acid ester≤0.6, and the magnetic recording medium has pores, and the pores have an average diameter of 6 nm or more and 11 nm or less when the diameters of the pores are measured in a state where the lubricant has been removed from the magnetic recording medium and the magnetic recording medium has been dried.

MAGNETIC TAPE, MAGNETIC TAPE CARTRIDGE, AND MAGNETIC TAPE DEVICE
20230110514 · 2023-04-13 · ·

A magnetic tape in which a tape thickness of the magnetic tape is 5.2 μm or less, and in an environment with a temperature of 32° C. and a relative humidity of 80%, a frictional force F.sub.45° on the surface of the magnetic layer with respect to an LTO8 head measured at a head tilt angle of 45° is 4 gf to 15 gf, and a standard deviation of a frictional force F on the surface of the magnetic layer with respect to the LTO8 head measured at each of head tilt angles of 0°, 15°, 30°, and 45° is 10 gf or less.

Sputtering target, magnetic film, and perpendicular magnetic recording medium

Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.