A magnetic-disk substrate has a pair of main surfaces and arithmetic average roughnesses Ra of the main surfaces are each 0.11 nm or less. Also, in surface unevenness of the main surfaces, an average area of regions occupied by a plurality of protrusions having a height of 0.1 [nm] or more from an average plane of the surface unevenness is 25 [nm.sup.2/protrusion] or less. The arithmetic average roughness Ra and the surface unevenness are measured using an atomic force microscope with a probe having a probe tip provided with a carbon nanofiber rod-shaped member.

A magnetic-disk glass substrate contains an alkaline earth metal component as a glass composition and includes a pair of main surfaces, and an outer circumferential side edge surface that is a mirror surface. The outer circumferential side edge surface includes a surface having a roughness percentage of 40% or more and 68% or less when a bearing ratio of a roughness cross-sectional area is 50% in a bearing ratio curve of roughness cross-sectional areas obtained when a surface roughness of the outer circumferential side edge surface obtained after the outer circumferential side edge surface is etched by 2.5 μm is measured. A glass transition point of the glass composition that constitutes the magnetic-disk glass substrate is 700° C. or more. The glass composition that constitutes the magnetic-disk glass substrate is alkali-free glass.

A magnetic disk substrate includes an aluminum alloy including one type or two or more types of Fe: 8.5 mass % or less, Mn: 2.5 mass % or less, Ni: 6.5 mass % or less, and Mg: 4.5 mass % or less, a balance being Al and unavoidable impurities, wherein, when f (Hz) is a resonance frequency, ρ (g/cm.sup.3) is a density, and t (mm) is a plate thickness, (f×ρ/t) is 3800 or greater; and a magnetic disk using the magnetic disk substrate.

A sputtering target according to the present invention contains Co and Pt as metal components, wherein a molar ratio of a content of Pt to a content of Co is from 5/100 to 45/100, and wherein the sputtering target contains Nb.sub.2O.sub.5 as a metal oxide component.

A method for manufacturing a ring-shaped glass spacer to be arranged in contact with a magnetic disk in a hard disk drive device includes processing for forming a film on the surface of a glass spacer main body, which is the base of the glass spacer. In the processing, the film is formed by passing the glass spacer main body through a location where the components of the film are in a spray state while an outer circumferential edge surface of the glass spacer main body is being rotated in a circumferential direction thereof.

A glass for magnetic recording medium substrate is an amorphous oxide glass. In terms of mol %, SiO.sub.2 content ranges from 45 to 68%, Al.sub.2O.sub.3 from 5 to 20%, total content of SiO.sub.2 and Al.sub.2O.sub.3 60 to 80%, B.sub.2O.sub.3 from 0 to 5%, MgO from 3 to 28%, CaO from 0 to 18%, total content of BaO and SrO 0 to 2%, total content of alkali earth metal oxides from 12 to 30%, total content of alkali metal oxides from 3.5 to 15%, and at least one kind selected from the group made of Sn oxide and Ce oxide being included, a total content of Sn oxide and Ce oxide ranges from 0.05 to 2.00%, a glass transition temperature ≥625° C., a Young's modulus ≥83 GPa, a specific gravity ≤2.85, and an average linear expansion coefficient at 100 to 300° C.≥48×10.sup.−7/° C.

A substrate for a magnetic disk includes a substrate main body having two main surfaces and an outer circumferential edge surface that has a side wall surface and chamfered surfaces, and a film that is an alloy film containing Ni and P and provided on a surface of the substrate main body. A disk shape of the substrate main body has an outer diameter of 90 mm or more. A thickness T of the substrate that includes the film provided on the main surfaces is 0.520 mm or less. A total thickness D mm of the film on the main surfaces and the thickness T mm satisfy D≥0.0082/T−0.0015. A film thickness of the film on the outer circumferential edge surface is larger than a film thickness of the film on the main surfaces, and is 150% or less of the film thickness of the film on the main surfaces.

A non magnetic substrate for a magnetic disk includes a substrate main body having two opposing main surfaces and being a glass substrate main body or an aluminum alloy substrate main body, and a metal film made of an Ni—P alloy and provided on the main surfaces and an outer circumferential edge surface of the substrate main body. The non magnetic substrate has a thickness (T+D) of 0.57 mm or less, which is the sum of a thickness T of the substrate main body and a thickness D of the metal film. The non magnetic substrate has a diameter of 90 mm or more. A ratio D/T is 0.025 or more. The outer circumferential edge surface of the substrate main body forming an interface with the metal film has a surface roughness maximum height Rz of 0.5 μm or more.

A magnetic-disk substrate has an average value of squares of inclinations that is 0.0025 or less, and a frequency at which squares of inclinations are 0.004 or more is 15% or less, in a case where samples of inclinations on a main surface are obtained at intervals of 10 nm. The main surface is configured to receive at least a magnetic recording layer thereon. The magnetic-disk substrate includes an outer circumferential end portion and an inner circumferential end portion, and the outer circumferential end portion and the inner circumferential end portion have chamfered portions.

A glass for magnetic recording medium substrate is an amorphous oxide glass. In terms of mol %, SiO.sub.2 content ranges from 45 to 68%, Al.sub.2O.sub.3 from 5 to 20%, total content of SiO.sub.2 and Al.sub.2O.sub.3 60 to 80%, B.sub.2O.sub.3 from 0 to 5%, MgO from 3 to 28%, CaO from 0 to 18%, total content of BaO and SrO 0 to 2%, total content of alkali earth metal oxides from 12 to 30%, total content of alkali metal oxides from 3.5 to 15%, and at least one kind selected from the group made of Sn oxide and Ce oxide being included, a total content of Sn oxide and Ce oxide ranges from 0.05 to 2.00%, a glass transition temperature ≥625° C., a Young's modulus ≥83 GPa, a specific gravity ≤2.85, and an average linear expansion coefficient at 100 to 300° C.≥48×10.sup.−7/° C.