A semiconductor device that writes data to, instead of a defective memory cell, another memory cell is provided. The semiconductor device includes a first circuit and a second circuit over the first circuit; the first circuit corresponds to a memory portion and includes a memory cell and a redundant memory cell; a second circuit corresponds to a control portion and includes a third circuit and a fourth circuit. The memory cell is electrically connected to the third circuit, the redundant memory cell is electrically connected to the third circuit, and the third circuit is electrically connected to the fourth circuit. The fourth circuit has a function of sending data to be written to the memory cell or the redundant memory cell to the third circuit, and the third circuit has a function of bringing the memory cell and the fourth circuit into a non-conduction state and the redundant memory cell and the fourth circuit into a conduction state to send the data to the redundant memory cell when the memory cell is a defective cell.

A system includes a volatile storage device, a read-only memory (ROM), a memory built-in self-test (BIST) controller and a central processing unit (CPU). The CPU, upon occurrence of a reset event, executes a first instruction from the ROM to cause the CPU to copy a plurality of instructions from a range of addresses in the ROM to the volatile storage device. The CPU also executes a second instruction from the ROM to change a program counter. The CPU further executes the plurality of instructions from the volatile storage device using the program counter. The CPU, when executing the plurality of instructions from the volatile storage device, causes the ROM to enter a test mode and the memory BIST controller to be configured to test the ROM.

Provided is a static random-access memory (SRAM) device. The SRAM device includes a substrate including a PMOS area, a circuit wiring structure including an insulating layer and a wiring layer alternately stacked on the substrate, wherein the circuit wiring structure includes a first NMOS area and a second NMOS area vertically separated from the PMOS area with the first NMOS area therebetween, a first transistor including a first gate electrode disposed on the PMOS area, source/drain areas formed on the PMOS area on both sides of the first gate electrode, and a first channel connecting the source and drain areas to each other, a second transistor including a second gate electrode disposed in the first NMOS area and a second channel vertically overlapping the second gate electrode, and a third transistor including a third gate electrode disposed in the second NMOS area and a third channel vertically overlapping the third gate electrode, wherein the first channel includes silicon, wherein the second channel and the third channel include an oxide semiconductor.

A fuse latch of a semiconductor device including PMOS transistors and NMOS transistors includes a data transmission circuit configured to transmit data to a first node and a second node in response to a first control signal, a latch circuit configured to latch the data received from the data transmission circuit through the first node and the second node, and a data output circuit configured to output the data latched by the latch circuit in response to a second control signal. NMOS transistors contained in the data transmission circuit, the latch circuit, and the data output circuit may be formed in first, fourth, and fifth active regions, PMOS transistors are formed in second and third active regions, and the first to fifth active regions are sequentially arranged in a first direction.

A semiconductor device including a memory which can perform a pipeline operation is provided. The semiconductor device includes a processor core, a bus, and a memory section. The memory section includes a first memory. The first memory includes a plurality of local arrays. The local array includes a sense amplifier array and a local cell array stacked thereover. The local cell array is provided a memory cell including one transistor and one capacitor. The transistor is preferably an oxide semiconductor transistor. The first memory is configured to generate a wait signal. The wait signal is generated when a request for writing data to the same local array is received over two successive clock cycles from the processor core. The wait signal is sent to the processor core via the bus. The processor core stands by for a request for the memory section on the basis of the wait signal.

A semiconductor device includes a first wiring having a first portion, a second portion, a third portion provided between the first portion and the second portion, memory cells connected to the third portion of the first wiring, a field effect transistor having a drain connected to the second portion, and a gate, and a second wiring provided in parallel with the first wiring. The third portion of the first wiring includes a fourth portion located nearest to the first portion and a fifth portion located nearest to the second portion. The first wiring further includes a sixth portion disposed between the first portion and the fourth portion. The memory cells include a first memory cell connected to the fourth portion and a second memory cell connected to the fifth portion. The second wiring is electrically connected between the sixth portion and the gate of the field effect transistor.

A memory device with a novel structure that is suitable for a register file is provided. The memory device includes a first memory circuit and a second memory circuit. The first memory circuit includes a first logic element and a second logic element each of which is configured to perform logic inversion, a selection circuit, a first switch, a second switch, and a third switch. The second memory circuit includes a first transistor in which a channel formation region is provided in an oxide semiconductor film, a second transistor, and a capacitor to which a potential is supplied through the first transistor.

Non-Volatile Static Random Access Memory (NVSRAM) cell devices applying only one single non-volatile element embedded in a conventional Static Random Access Memory (SRAM) cell are disclosed. The NVSRAM cell devices can be integrated into a compact cell array. The NVSRAM devices of the invention have a read/write speed of a conventional SRAM and non-volatile property of a non-volatile memory cell. The methods of operations for the NVSRAM devices of the invention are also disclosed.

A non-volatile static random access memory has an operating mode, a data backup mode and a data restore mode. The non-volatile static random access memory includes a memory cell and a power saving module. The memory cell includes a latch, a set of latch switch units, a set of backup memory units, a set of backup activation units, a backup setting unit and a driving signal transmission unit. The power saving module includes a control switch unit, a backup determination unit and a restore switch unit. When backup data is different from data stored in the latch, a backup driving signal is generated by a node voltage of the backup memory units and outputted to a backup determination unit, which drives the backup setting unit to turn on according to the backup driving signal, so as to change the backup data in the backup memory units and ensure correct backup.

A semiconductor structure includes first and second source/drain region disposed in a semiconductor body and spaced from each other by a channel region. A gate electrode overlies the channel region and a capacitor electrode is disposed between the gate electrode and the channel region. A first gate dielectric is disposed between the gate electrode and the capacitor electrode and a second gate dielectric disposed between the capacitor electrode and the channel region. A first electrically conductive contact region is in electrical contact with the gate electrode and a second electrically conductive contact region in electrical contact with the capacitor electrode. The first and second contact regions are electrically isolated from one another.