A method for implementing a neural network system in an integrated circuit includes presenting digital pulses to word line inputs of a matrix vector multiplier including a plurality of word lines, the word lines forming intersections with a plurality of summing bit lines, a programmable Vt transistor at each intersection having a gate connected to the intersecting word line, a source connected to a fixed potential and a drain connected to the intersecting summing bit line, each digital pulse having a pulse width proportional to an analog quantity. During a charge collection time frame charge collected on each of the summing bit lines from current flowing in the programmable Vt transistor is summed. During a pulse generating time frame digital pulses are generated having pulse widths proportional to the amount of charge that was collected on each summing bit line during the charge collection time frame.

A semiconductor memory device includes a memory block, a plurality of bit lines, a plurality of select gate lines, a plurality of word lines, and a controller. The memory block includes a plurality of memory strings, each memory string including a selection transistor and a plurality of memory cells. The plurality of bit lines are arranged in the first direction and connected to the respective memory strings. The plurality of select gate lines are arranged in the second direction and connected to gates of the respective selection transistors of the memory strings. The plurality of word lines are arranged in the third direction and connected to gates of the respective memory cells of the memory strings. The controller is configured to perform an erase operation in a unit of the memory block, and perform a sequence of erase verify operations.

A semiconductor memory device comprises: a plurality of first conductive layers arranged separated from each other in a first direction; a plurality of second conductive layers arranged, electrically insulated from the plurality of first conductive layers, at a different position in a second direction intersecting the first direction with respect to the first conductive layers; a plurality of memory structures; and a source structure. Respective one ends of the plurality of memory structures and one end of the source structure are electrically connected. The respective other ends of the plurality of memory structures are respectively electrically connected to different first wirings of a plurality of first wirings formed in the same layer in the first direction. The other end of the source structure is electrically connected to a second wiring formed in a different layer from the plurality of first wirings in the first direction.

A semiconductor device that writes data to, instead of a defective memory cell, another memory cell is provided. The semiconductor device includes a first circuit and a second circuit over the first circuit; the first circuit corresponds to a memory portion and includes a memory cell and a redundant memory cell; a second circuit corresponds to a control portion and includes a third circuit and a fourth circuit. The memory cell is electrically connected to the third circuit, the redundant memory cell is electrically connected to the third circuit, and the third circuit is electrically connected to the fourth circuit. The fourth circuit has a function of sending data to be written to the memory cell or the redundant memory cell to the third circuit, and the third circuit has a function of bringing the memory cell and the fourth circuit into a non-conduction state and the redundant memory cell and the fourth circuit into a conduction state to send the data to the redundant memory cell when the memory cell is a defective cell.

A device includes a stack above a substrate in a first direction perpendicular to a surface of the substrate, the stack including conductive layers; a semiconductor layer neighboring the stack in a second direction parallel to the surface of the substrate; a memory layer between the first stack and the semiconductor layer; memory cells between the conductive layers and the semiconductor layer; a first transistor connected between one end of the semiconductor layer in a third direction parallel to the surface of the substrate and crossing the second direction and a first interconnect in the first direction; and a second transistor connected between the other end of the semiconductor layer and a second interconnect in the first direction.

Some embodiments include a memory cell having charge-trapping-material between a semiconductor channel material and a gating region. The charge-trapping-material includes silicon, nitrogen and trap-enhancing-additive. The trap-enhancing-additive includes one or more of carbon, phosphorus, boron and metal. Some embodiments include an integrated assembly having a stack of alternating first and second levels. The first levels include conductive structures and the second levels are insulative. Channel-material-pillars extend through the stack. Charge-trapping-regions are along the channel-material-pillars and are between the channel-material-pillars and the conductive structures. The charge-trapping-regions include a charge-trapping-material which contains silicon, nitrogen and trap-enhancing-additive. The trap-enhancing-additive includes one or more of carbon, phosphorus, boron and metal.

A three-dimensional semiconductor memory device may include a substrate, a stack structure including interlayer dielectric layers and gate electrodes alternately and repeatedly stacked on the substrate and including a first stack structure on the substrate and a second stack structure on the first stack structure, a seed layer interposed between the first and second stack structures and extended in a horizontal direction, vertical channel structures that penetrate the stack structure and are in contact with the substrate, and a first contact plug that penetrates the stack structure and is in contact with one of the gate electrodes. The seed layer may include first and second seed patterns enclosing the vertical channel structures and the first contact plug, and the first and second seed patterns may be spaced apart from each other in the horizontal direction.

A 3-dimensional array of NOR memory strings being organized by planes of NOR memory strings, in which (i) the storage transistors in the NOR memory strings situated in a first group of planes are configured to be programmed, erased, program-inhibited or read in parallel, and (ii) the storage transistors in NOR memory strings situated within a second group of planes are configured for storing resource management data relating to data stored in the storage transistors of the NOR memory strings situated within the first group of planes, wherein the storage transistors in NOR memory strings in the second group of planes are configured into sets.

A semiconductor device including an oxide-nitride-oxide (ONO) structure having a multi-layer charge storing layer and methods of forming the same are provided. Generally, the method involves: (i) forming a first oxide layer of the ONO structure; (ii) forming a multi-layer charge storing layer comprising nitride on a surface of the first oxide layer; and (iii) forming a second oxide layer of the ONO structure on a surface of the multi-layer charge storing layer. Preferably, the charge storing layer comprises at least two silicon oxynitride layers having differing stoichiometric compositions of Oxygen, Nitrogen and/or Silicon. More preferably, the ONO structure is part of a silicon-oxide-nitride-oxide-silicon (SONOS) structure and the semiconductor device is a SONOS memory transistor. Other embodiments are also disclosed.

A flash memory device includes a substrate, a semiconductor quantum well layer, a semiconductor spacer, a semiconductor channel layer, a gate structure, and source/drain regions. The semiconductor quantum well layer is formed of a first semiconductor material and is disposed over the substrate. The semiconductor spacer is formed of a second semiconductor material and is disposed over the first semiconductor channel layer. The semiconductor channel layer is formed of the first semiconductor material and is disposed over the semiconductor spacer. Thea gate structure is over the second semiconductor channel layer. The source/drain regions are over the substrate and are on opposite sides of the gate structure.