A doubly bent X-ray spectroscopic device (1) according to the present invention includes: a glass plate (3) which is deformed into a shape having a doubly bent surface by being sandwiched between a doubly curved convex surface (21a) of a convex forming die (21) and a doubly curved concave surface (22a), of a concave forming die (22), that matches the doubly curved convex surface (21a), and being heated to a temperature of 400° C. to 600° C.; and a reflection coating (5) configured to reflect X-rays, which is formed on a concave surface (3a) of the deformed glass plate (3 ).

Systems and methods of providing X-ray optics are described. The optics are formed from CVD thin film diamond. The optics lave three sections that include a tip on which X-rays impinge, a base, and an intermediate section connecting the base and the tip. The intermediate section tapers from the base to the tip. The base has a substantially larger thickness than the tip. The base is disposed within a holder that securely retains the optics to provide vibration control, while the tip is thin enough to provide thermal management and reduce crystal strain.

An imaging system (IS) including device (G, IFD) for phase contrast and/or dark field imaging such as a grating (G). The device has a periodic structure with a spatial period p. The imaging system (IS) further includes a phase stepping mechanism (PSM) configured to facilitate a relative phase stepping motion between the device (G, IFD) and a focal spot (FS) of an X-ray source (XS) of the imaging system (IS). The relative phase stepping motion covers a distance greater than the said spatial period to reduce artifacts in dark-field or phase contrast imagery caused by defects in the grating.

A reflector comprising a hollow body having an interior surface defining a passage through the hollow body, the interior surface having at least one optical surface part configured to reflect radiation and a supporter surface part, wherein the optical surface part has a predetermined optical power and the supporter surface part does not have the predetermined optical power. The reflector is made by providing an axially symmetric mandrel; shaping a part of the circumferential surface of the mandrel to form at least one inverse optical surface part that is not rotationally symmetric about the axis of the mandrel; forming a reflector body around the mandrel; and releasing the reflector body from the mandrel whereby the reflector body has an optical surface defined by the inverse optical surface part and a supporter surface part defined by the rest of the outer surface of the mandrel.

A method and a novel flexure interface apparatus are provided for ultrahigh-vacuum (UHV) applications for precision nanopositioning systems. An ultrahigh-vacuum (UHV) metrology base is integrated with an ultrahigh-vacuum (UHV) flange together including a precision and compact flexure interface structure defining a UHV metrology base near-zero-length feedthrough. The UHV metrology base is directly mounted to a flange mounting surface in air with nanopositioning and thermal stability. The precision and compact flexure interface structure has sufficient strength to hold the vacuum force and sufficiently flexible to survive with the thermal expansion stress during bakeout process.

An electroconductive-film-coated substrate includes a glass substrate and an electroconductive film disposed on one main surface of the glass substrate. The electroconductive film has an inclined portion in a peripheral edge. A distance from a position in the inclined portion where a thickness of the electroconductive film is 10% of a film thickness of a center of the electroconductive film to an edge end of the glass substrate is 3.00 mm or less. A distance from an end of the inclined portion to the edge end of the glass substrate is longer than 0.00 mm.

A method of making a mirror for use with extreme ultraviolet (EUV) or X-ray radiation is disclosed. The method includes: a) providing an optical element having a curved mirror surface, wherein the curved mirror surface comprises localized defects that degrade performance of the curved mirror surface; b) spin-coating the curved mirror surface with a material to cover at least some of the defects; and c) curing the spin-coated material on the curved mirror surface to reduce the number of defects and improve the performance of the curved mirror surface. Also disclosed is a mirror made by the method.

An EUV collector mirror for an extreme ultra violet (EUV) radiation source apparatus includes an EUV collector mirror body on which a reflective layer as a reflective surface is disposed, a heater attached to or embedded in the EUV collector mirror body and a drain structure to drain melted metal from the reflective surface of the EUV collector mirror body to a back side of the EUV collector mirror body.

A reflective film coated substrate includes a substrate having two main surfaces opposite to each other and end faces connected to outer edges of the two main surfaces; and a reflective film formed on one of the main surfaces and extending onto at least part of the end faces. The reflective film on the main surface has a multilayer structure including low refractive index layers and high refractive index layers alternately formed. The reflective film which extends onto the end faces has a single-layer structure containing a first element higher in content than any other element in the low refractive index layers and a second element higher in content than any other element in the high refractive index layers.

A mirror including a substrate (110), a reflection layer system (120), and at least one continuous piezoelectric layer (130, . . . ) arranged between the substrate and the layer system. An electric field producing a locally variable deformation is applied to the piezoelectric layer via a first, layer-system-side electrode arrangement and a second, substrate-side electrode arrangement. At least one of the electrode arrangements is assigned a mediator layer (170) setting an at least regionally continuous profile of the electrical potential along the respective electrode arrangement. The electrode arrangement to which the mediator layer is assigned has a plurality of electrodes (160, . . . ), each of which is configured to receive an electrical voltage relative to the respective other electrode arrangement. In the region that couples two respectively adjacent electrodes, the mediator layer is subdivided into a plurality of regions (171, . . . ) that are electrically insulated from one another.