Patent classifications
G21K5/02
APPARATUS FOR SYNTHESIZING NANO-PARTICLES USING ELECTRON BEAM
An embodiment of the present disclosure relates to an apparatus for synthesizing nanoparticles by irradiating, with an electron beam, a nanoparticle aqueous solution in a reaction vessel provided inside a shielding chamber, and more particularly, to an apparatus for synthesizing nanoparticles, which is capable of preventing radiation generated in a shielding chamber from leaking out, and facilitating maintenance and repair.
Modular ion generator device
The present invention provides methods and systems for a modular ion generator device that includes a bottom portion, two opposed side portions, a front end, a back end, and a top portion. A cavity is formed within the two opposed side portions, front end, back end, and top portion. At least one electrode is positioned within the cavity, and an engagement device is engaged to the front end and/or an engagement device engaged to the back end for allowing one or more modular ion generator devices to be selectively secured to one another.
Modular ion generator device
The present invention provides methods and systems for a modular ion generator device that includes a bottom portion, two opposed side portions, a front end, a back end, and a top portion. A cavity is formed within the two opposed side portions, front end, back end, and top portion. At least one electrode is positioned within the cavity, and an engagement device is engaged to the front end and/or an engagement device engaged to the back end for allowing one or more modular ion generator devices to be selectively secured to one another.
Irradiation control device for charged particles
An irradiation control device which controls irradiation of charged particles to a target that includes a substance that generates neutrons by being irradiated with a charged particle beam, includes: a deflector that deflects the charged particles; and a controller that controls the deflector such that a plurality of peaks of heat density formed by the beam are formed between a center of an irradiation surface of the target and an end portion of the irradiation surface by moving the beam of the charged particles on the irradiation surface.
Irradiation control device for charged particles
An irradiation control device which controls irradiation of charged particles to a target that includes a substance that generates neutrons by being irradiated with a charged particle beam, includes: a deflector that deflects the charged particles; and a controller that controls the deflector such that a plurality of peaks of heat density formed by the beam are formed between a center of an irradiation surface of the target and an end portion of the irradiation surface by moving the beam of the charged particles on the irradiation surface.
Systems and methods for laser systems with variable beam parameter product utilizing thermo-optic effects
In various embodiments, a beam-parameter adjustment system and focusing system alters a spatial power distribution of a radiation beam, via thermo-optic effects, before the beam is coupled into an optical fiber or delivered to a workpiece.
Systems and methods for laser systems with variable beam parameter product utilizing thermo-optic effects
In various embodiments, a beam-parameter adjustment system and focusing system alters a spatial power distribution of a radiation beam, via thermo-optic effects, before the beam is coupled into an optical fiber or delivered to a workpiece.
Scalable, electro-optically induced force system and method
A technique is disclosed for electro-optically inducing a force to fabricated samples and/or devices with laser light. The technique uses the interaction of the oscillating electric field of the laser beam in opposition with the electric field produced by an appropriate electric charge carrier to achieve a net repulsive (or attractive) force on the component holding the electric charge. In one embodiment, force is achieved when the field near the charge carrier is modulated at a subharmonic of the electric field oscillation frequency of the laser and the relative phases of the light field and electric charge carrier field are controlled to provide optimal repulsion/attraction. The effect is scalable by applying the technique to an array of charge carrier fields sequentially as well as using higher power lasers and higher carrier field voltages.
Scalable, electro-optically induced force system and method
A technique is disclosed for electro-optically inducing a force to fabricated samples and/or devices with laser light. The technique uses the interaction of the oscillating electric field of the laser beam in opposition with the electric field produced by an appropriate electric charge carrier to achieve a net repulsive (or attractive) force on the component holding the electric charge. In one embodiment, force is achieved when the field near the charge carrier is modulated at a subharmonic of the electric field oscillation frequency of the laser and the relative phases of the light field and electric charge carrier field are controlled to provide optimal repulsion/attraction. The effect is scalable by applying the technique to an array of charge carrier fields sequentially as well as using higher power lasers and higher carrier field voltages.
ELECTRON BEAM GENERATOR, ELECTRON BEAM EMISSION DEVICE AND X-RAY EMISSION DEVICE
Disclosed is an electron beam generation source including: an electron discharge part extending on a desired axis and configured to discharge electrons; a support part electrically connected to a power supply device that supplies electric power to the electron discharge part; a tension holding part connected between one end of the electron discharge part and the support part and configured to hold tension of the electron discharge part with a pressing force or a tensile force; and a power supply path part having one end electrically connected to the support part and the other end electrically connected to the one end of the electron discharge part. An electric resistance value of the tension holding part is larger than an electric resistance value of the power supply path part.