A neutron producing target is irradiated with a deuteron beam accelerated by a deuteron accelerator to generate neutrons, and first samples are directly irradiated with the fast neutrons produced in the neutron producing target. The fast neutrons, which have initially been scattered by a nuclear reaction in the first samples and have passed through the first samples, are multi-scattered by a neutron scattering material made of a light element disposed around the neutron producing target and the first samples to generate, by a nuclear reaction with the first samples and second samples, various radioisotopes in large amounts at the same time from the first samples and the second samples. Thereby, a new RI production technology can generate various radioisotopes in large amounts at the same time.

A neutron producing target is irradiated with a deuteron beam accelerated by a deuteron accelerator to generate neutrons, and first samples are directly irradiated with the fast neutrons produced in the neutron producing target. The fast neutrons, which have initially been scattered by a nuclear reaction in the first samples and have passed through the first samples, are multi-scattered by a neutron scattering material made of a light element disposed around the neutron producing target and the first samples to generate, by a nuclear reaction with the first samples and second samples, various radioisotopes in large amounts at the same time from the first samples and the second samples. Thereby, a new RI production technology can generate various radioisotopes in large amounts at the same time.

An object of the present invention is to provide a charge stripping film in a charge stripping device of an ion beam, which has high heat resistance and no toxicity, with which there is no risk of activation, with which an ion beam can be made multivalent even if the charge stripping film is thin, and which is resistant to high-energy beam radiation over an extended period of time. The present invention comprises a charge stripping film used in a device which strips a charge of an ion beam, wherein the charge stripping film is a rotary charge stripping film comprising a carbon film having a thermal conductivity of 20 W/mK or more in a film surface direction at 25° C., and a film thickness of the carbon film is more than 3 μm and less than 10 μm. The present invention also comprises a charge stripping film used in a device which strips a charge of an ion beam, wherein the charge stripping film is a rotary charge stripping film comprising a carbon film produced by a polymer annealing method, and a film thickness of the carbon film is more than 3 μm and less than 10 μm.

An object of the present invention is to provide a charge stripping film in a charge stripping device of an ion beam, which has high heat resistance and no toxicity, with which there is no risk of activation, with which an ion beam can be made multivalent even if the charge stripping film is thin, and which is resistant to high-energy beam radiation over an extended period of time. The present invention comprises a charge stripping film used in a device which strips a charge of an ion beam, wherein the charge stripping film is a rotary charge stripping film comprising a carbon film having a thermal conductivity of 20 W/mK or more in a film surface direction at 25° C., and a film thickness of the carbon film is more than 3 μm and less than 10 μm. The present invention also comprises a charge stripping film used in a device which strips a charge of an ion beam, wherein the charge stripping film is a rotary charge stripping film comprising a carbon film produced by a polymer annealing method, and a film thickness of the carbon film is more than 3 μm and less than 10 μm.

A converter for generating photons from an electron beam is provided. The converter may include a plurality of converter plates (i) positioned perpendicular to an axis and (ii) arranged sequentially in a direction along the axis from a first converter plate of the plurality of converter plates to a last converter plate of the plurality of converter plates. The first converter plate may be configured to receive an electron beam traveling in the direction along the axis. Further, the first converter plate may have a thickness smaller than a thickness of the last converter plate, wherein a thickness of a particular converter plate is measured along the axis.

A converter for generating photons from an electron beam is provided. The converter may include a plurality of converter plates (i) positioned perpendicular to an axis and (ii) arranged sequentially in a direction along the axis from a first converter plate of the plurality of converter plates to a last converter plate of the plurality of converter plates. The first converter plate may be configured to receive an electron beam traveling in the direction along the axis. Further, the first converter plate may have a thickness smaller than a thickness of the last converter plate, wherein a thickness of a particular converter plate is measured along the axis.

An X-ray generator capable of reliably reducing an X-ray focal spot size without depending on the focal spot size of an electron beam on a target. Providing, within the irradiation range of an electron beam B of a target laminated structure 3 comprising a target 2 and an X-ray irradiation window 1, a low X-ray absorptivity region 3a of localized low X-ray absorptivity in the irradiation direction of the electron beam B results in the suppression of emission to the outside of X-rays from among the X-rays generated as a result of the irradiation of the electron beam B onto the target 2 that are from regions other than the low X-ray absorptivity region 3a, and an X-ray focal spot of a size corresponding to the size of the low X-ray absorptivity region 3a is obtained regardless of the size of the irradiation region of the electron beam B.

An X-ray generator capable of reliably reducing an X-ray focal spot size without depending on the focal spot size of an electron beam on a target. Providing, within the irradiation range of an electron beam B of a target laminated structure 3 comprising a target 2 and an X-ray irradiation window 1, a low X-ray absorptivity region 3a of localized low X-ray absorptivity in the irradiation direction of the electron beam B results in the suppression of emission to the outside of X-rays from among the X-rays generated as a result of the irradiation of the electron beam B onto the target 2 that are from regions other than the low X-ray absorptivity region 3a, and an X-ray focal spot of a size corresponding to the size of the low X-ray absorptivity region 3a is obtained regardless of the size of the irradiation region of the electron beam B.

An illuminated feedneck may be utilized in a toy blaster, laser tag gun, airsoft or other toy gun, and the like to illuminate ammunition, such as Gellets, for use in non-daylight hours or indoors. A feedneck may be illuminated through ultraviolet light that may be powered through batteries and/or one or more other forms of power. The illuminated feedneck may charge ammunition through a series of specialty UVA (˜400 nM) wavelength light emitting diodes (LEDs) that safely become illuminated with a long-lasting and bright green glow. The ammunition may be infused to create a glow-in-the dark tracer effect as they are powered and pass through the illuminated feedneck.

An illuminated feedneck may be utilized in a toy blaster, laser tag gun, airsoft or other toy gun, and the like to illuminate ammunition, such as Gellets, for use in non-daylight hours or indoors. A feedneck may be illuminated through ultraviolet light that may be powered through batteries and/or one or more other forms of power. The illuminated feedneck may charge ammunition through a series of specialty UVA (˜400 nM) wavelength light emitting diodes (LEDs) that safely become illuminated with a long-lasting and bright green glow. The ammunition may be infused to create a glow-in-the dark tracer effect as they are powered and pass through the illuminated feedneck.