A curing tool is described that comprises a tool body 12 having an end wall generally perpendicular to art axis 14 of the tool body 12, the tool being arranged to be moved, in use, in substantially the direction of the axis 14, an array 16 of LEDs carried by the tool body 12, the LEDs being arranged to emit light in a direction generally parallel to the axis 14, and a reflector 18 carried by the tool body 12 and arranged to reflect light emitted from the LEDs and incident upon the reflector 18 such that the reflected light is reflected in a direction generally perpendicular to the axis 14.

A curing tool is described that comprises a tool body 12 having an end wall generally perpendicular to art axis 14 of the tool body 12, the tool being arranged to be moved, in use, in substantially the direction of the axis 14, an array 16 of LEDs carried by the tool body 12, the LEDs being arranged to emit light in a direction generally parallel to the axis 14, and a reflector 18 carried by the tool body 12 and arranged to reflect light emitted from the LEDs and incident upon the reflector 18 such that the reflected light is reflected in a direction generally perpendicular to the axis 14.

Provided is a contactless internal measurement device including an electromagnetic wave irradiation unit that irradiates an electromagnetic wave to a measurement subject, and an electromagnetic wave receiver that detects the electromagnetic wave reflected by the measurement subject. The electromagnetic wave irradiation unit is disposed to reduce a polarization component of the electromagnetic wave detected by the electromagnetic wave receiver, the polarization component being the same as a polarization component of the electromagnetic wave irradiated by the electromagnetic wave irradiation unit.

Provided is a contactless internal measurement device including an electromagnetic wave irradiation unit that irradiates an electromagnetic wave to a measurement subject, and an electromagnetic wave receiver that detects the electromagnetic wave reflected by the measurement subject. The electromagnetic wave irradiation unit is disposed to reduce a polarization component of the electromagnetic wave detected by the electromagnetic wave receiver, the polarization component being the same as a polarization component of the electromagnetic wave irradiated by the electromagnetic wave irradiation unit.

A shutter for controlling radiation exposure includes a rotatable member. The rotatable member is rotatable between an open position and a closed position. The rotatable member includes a passageway, wherein the passageway is positioned to receive radiation in the open position and is not positioned to receive radiation in the closed position. In the closed position, the rotatable member may substantially block or absorb the radiation. The passageway may collimate the radiation into a beam of radiation. The rotatable member may include a plurality of passageways positioned to receive radiation in the open position. The rotatable member may be rotatable between a plurality of open positions, each open position corresponding to at least one passageway. The open positions may align the source of radiation with different passageways in the rotatable member to form a different beam shape, a different number of beams, a different beam direction, or combinations thereof.

Disclosed herein is a micro stage using a piezoelectric element that can be reliably operated even in a vacuum environment. In a particle column requiring a high precision, for example, a microelectronic column, the micro stage can be used as a stage with micro or nano degree precision for alignment of parts of the column, or for moving a sample, and so on.

A multiple degree of freedom sample stage or testing assembly including a multiple degree of freedom sample stage. The multiple degree of freedom sample stage includes a plurality of stages including linear, and one or more of rotation or tilt stages configured to position a sample in a plurality of orientations for access or observation by multiple instruments in a clustered volume that confines movement of the multiple degree of freedom sample stage. The multiple degree of freedom sample stage includes one or more clamping assemblies to statically hold the sample in place throughout observation and with the application of force to the sample, for instance by a mechanical testing instrument. Further, the multiple degree of freedom sample stage includes one or more cross roller bearing assemblies that substantially eliminate mechanical tolerance between elements of one or more stages in directions orthogonal to a moving axis of the respective stages.

A multiple degree of freedom sample stage or testing assembly including a multiple degree of freedom sample stage. The multiple degree of freedom sample stage includes a plurality of stages including linear, and one or more of rotation or tilt stages configured to position a sample in a plurality of orientations for access or observation by multiple instruments in a clustered volume that confines movement of the multiple degree of freedom sample stage. The multiple degree of freedom sample stage includes one or more clamping assemblies to statically hold the sample in place throughout observation and with the application of force to the sample, for instance by a mechanical testing instrument. Further, the multiple degree of freedom sample stage includes one or more cross roller bearing assemblies that substantially eliminate mechanical tolerance between elements of one or more stages in directions orthogonal to a moving axis of the respective stages.

The invention relates to a charged particle beam exposure apparatus configured to expose cut patterns or via patterns on a substrate having a plurality of line patterns 81a arranged on an upper surface of the substrate at a constant pitch by irradiating the substrate with a plurality of charged particle beams B1 to Bn while moving a one-dimensional array beam A1 in an X direction parallel to the line patterns 81a, the one-dimensional array beam A1 being a beam in which the charged particle beams B1 to Bn are arranged in an Y direction orthogonal to the line patterns 81a.

An electron beam sterilization device (1) for thin-walled containers (C) is fitted with an input (40) or output unit (60) provided with a swivelling body to bring a set of containers (C) from the outside environment into the sterilization chamber or vice versa, avoiding radioactive emissions from the sterilization chamber.