In some examples, a transport cylinder for transporting a sheet-format substrate includes at least one channel extending on an outer surface of the transport cylinder in an axial direction. Each channel includes at least one gripper, which is supported on a shaft, for holding a substrate on the outer surface of the transport cylinder. Each channel is covered by a respective cover at the outer surface of the transport cylinder. The cover and/or a shaft supporting the at least one gripper may include a cooling unit. In some examples, a drying unit that includes the transport cylinder may further include an electron beam for curing a printing fluid on a substrate on the transport cylinder. In some examples, a printing press may include the drying unit including the transport cylinder.

A neutron ray irradiation target apparatus 100 of the present invention is used to irradiate irradiation targets (seeds, etc.) with a neutron ray generated by a neutron ray irradiation apparatus. The neutron ray irradiation target apparatus 100 has a holding means 70 for holding the irradiation targets. The holding means 70 holds at least one closed container 30 which can accommodate the irradiation targets 20 stacked randomly and three-dimensionally. In the case where the irradiation targets are stacked three-dimensionally and accommodated in the closed container, the irradiation targets overlapping each other are irradiated with the neutron ray in a chain reaction fashion. The neutron ray irradiation target apparatus 100 can be used in a method for irradiating a large amount of irradiation targets (seeds of crops, etc.) with a neutron ray, while reducing a required time, thereby efficiently inducing mutations in the irradiation targets.

An x-ray generating unit includes an x-ray tube that is substantially transparent to x-rays. A cathode is within the x-ray tube and defines a plurality of spaced apart cavities. An anode includes a material that emits x-rays when impacted by electrons. A plurality of filaments is each disposed in a different one of the cavities. Each of the filaments is electrically coupled to each other and to an activating voltage source in parallel. Each of the filaments emits a focused electron beam directed to a different predetermined spot on the anode upon application of a predetermined voltage between the cathode and the anode, thereby causing the anode to generate x-rays. Each of the plurality of spaced apart cavities is aimed at the anode so that each predetermined spot on the anode is separated from each other spot by a gap that is not impacted by an electron beam.

A neutron beam generating device includes a supporting base, an outer shell, a target material, and a first pipe. The outer shell surrounds a rotating axis, rotatable engages the supporting base, and has a first opening. The target material is disposed in the outer shell. The first pipe extends from the first opening of the outer shell along the rotating axis to the target material. The first pipe is configured to transmit an ion beam to bombard the target material to generate a neutron beam.

Disclosed are systems and methods for generating a beam of charged particles, such as an ion beam. Such a system may comprise an interaction chamber configured to support a target, one or more electromagnetic radiation sources, a sensor, and at least one processor. The one or more electromagnetic radiation sources may be configured to provide a probe beam at a first energy for determining orientation data of the target and a particle-generating beam at a second energy, which is greater than the first energy, for producing a beam of charged particles. The processor may be configured to receive feedback information from the sensor and to cause a change in a relative orientation between the particle-generating beam and the target.

Disclosed are systems and methods for generating a beam of charged particles, such as an ion beam. Such a system may comprise an interaction chamber configured to support a target, one or more electromagnetic radiation sources, a sensor, and at least one processor. The one or more electromagnetic radiation sources may be configured to provide a probe beam at a first energy for determining orientation data of the target and a particle-generating beam at a second energy, which is greater than the first energy, for producing a beam of charged particles. The processor may be configured to receive feedback information from the sensor and to cause a change in a relative orientation between the particle-generating beam and the target.

An x-ray scanning system includes an x-ray source that produces a collimated fan beam of incident x-ray radiation. The system also includes a chopper wheel that can be irradiated by the collimated fan beam. The chopper wheel is oriented with a wheel plane containing the chopper wheel substantially non-perpendicular relative to a beam plane containing the collimated fan beam. In various embodiments, a disk chopper wheel's effective thickness is increased, allowing x-ray scanning with end point energies of hundreds of keV using relatively thinner, lighter, and less costly chopper wheel disks. Backscatter detectors can be mounted to an exterior surface of a vehicle housing the x-ray source, and slits in the disk chopper wheel can be tapered for more uniform target irradiation.

Technology is described to uniformly apply doses of radiation to a target material. An irradiation device may comprise an enclosure configured to receive a target material and a source configured to emit primary radiation within the enclosure. The primary radiation may be configured to irradiate at least a first portion of the target material. The irradiation device may further comprise a scattering medium disposed within the enclosure. The scattering medium may be configured to produce secondary radiation through scatter interactions in response to the primary radiation, the secondary radiation configured to irradiate at least a second portion of the target material. A thickness of the scattering medium relative to the primary radiation may have a thickness of at least 3 millimeters).

Technology is described to uniformly apply doses of radiation to a target material. An irradiation device may comprise an enclosure configured to receive a target material and a source configured to emit primary radiation within the enclosure. The primary radiation may be configured to irradiate at least a first portion of the target material. The irradiation device may further comprise a scattering medium disposed within the enclosure. The scattering medium may be configured to produce secondary radiation through scatter interactions in response to the primary radiation, the secondary radiation configured to irradiate at least a second portion of the target material. A thickness of the scattering medium relative to the primary radiation may have a thickness of at least 3 millimeters).

Technology is described to uniformly apply doses of radiation to a target material. An irradiation device may comprise an enclosure configured to receive a target material and a source configured to emit primary radiation within the enclosure. The primary radiation may be configured to irradiate at least a first portion of the target material. The irradiation device may further comprise a scattering medium disposed within the enclosure. The scattering medium may be configured to produce secondary radiation through scatter interactions in response to the primary radiation, the secondary radiation configured to irradiate at least a second portion of the target material. A thickness of the scattering medium relative to the primary radiation may have a thickness of at least 3 millimeters).