A dielectric material is provided. The dielectric material includes at least one layer of a substantially continuous phase material. The material is selected from the group consisting of an organic, organometallic, or combination thereof in which the substantially continuous phase material has delocalized electrons.

A dielectric material is provided. The dielectric material includes at least one layer of a substantially continuous phase material. The material is selected from the group consisting of an organic, organometallic, or combination thereof in which the substantially continuous phase material has delocalized electrons.

A high voltage capacitive device having: a non-impregnatable film having a plurality of physically separated regions each defined by a conductive coating provided on the non-impregnatable film, wherein the non-impregnatable film is wound in a plurality of turns to form a plurality of layers, wherein the regions are arranged in overlapping layers in the radial direction, wherein the non-impregnatable film forms a dielectric between adjacent layers of the regions, and wherein the conductive coating of at least some of the regions is provided with a plurality of first radial openings extending through the conductive coating to the non-impregnatable film, which delimits a radial extension of each first radial opening.

A high voltage capacitive device having: a non-impregnatable film having a plurality of physically separated regions each defined by a conductive coating provided on the non-impregnatable film, wherein the non-impregnatable film is wound in a plurality of turns to form a plurality of layers, wherein the regions are arranged in overlapping layers in the radial direction, wherein the non-impregnatable film forms a dielectric between adjacent layers of the regions, and wherein the conductive coating of at least some of the regions is provided with a plurality of first radial openings extending through the conductive coating to the non-impregnatable film, which delimits a radial extension of each first radial opening.

A dielectric material is provided. The dielectric material includes at least one layer of a substantially continuous phase material. The material is selected from the group consisting of an organic, organometallic, or combination thereof in which the substantially continuous phase material has delocalized electrons.

A thin film capacitor is provided. The thin film capacitor includes a dielectric layer and a conductive layer. The dielectric layer includes polyimide and conductive particles. The polyimide includes ether linkages. Based on 100 weight parts of the polyimide, a total amount of monomer units including the ether linkages is 50 weight parts to 100 weight parts. Based on 100 weight parts of the dielectric layer, a total amount of the conductive particles is 10 weight parts to 70 weight parts. The conductive layer is disposed on a surface of the dielectric layer.