A device including an ionizer is disclosed. The ionizer comprises bulk bodies including one or more emitter materials and that is configured to at least partly depletable; and a heating unit that is configured to heat at least a part of the bulk bodies. The ionizer may comprise a electron emitter dispenser that is configured to exposes a limited part of the bulk bodies.

A device including an ionizer is disclosed. The ionizer comprises bulk bodies including one or more emitter materials and that is configured to at least partly depletable; and a heating unit that is configured to heat at least a part of the bulk bodies. The ionizer may comprise a electron emitter dispenser that is configured to exposes a limited part of the bulk bodies.

The invention relates to the field of fabrication of new materials and coatings and may be used in plants designed for electron-beam heating, melting and evaporating of materials in vacuum or reactive gas atmosphere. The disclosed axial electron gun that comprises, in particular, the primary and secondary cathodes and features the figure-shaped holder used for maintaining a stable position of the secondary cathode relative to the electron-beam axis of the axial gun and the pulsed voltage that is applied between the cathodes for electron bombardment of the secondary cathode. The invention ensures an improved stability of process parameters and operation of the electron gun.

Embodiments of the present invention describe electrical potential energy to electrical kinetic energy converters, ozone generators, and light emitters. A system for energy conversion from electrical potential energy to electrical kinetic energy may include a discharge device and a power supply. The power supply can be coupled with the discharge device, and supplies energy to the discharge device to form an initial electric field. The discharge device may further include at least two electrodes that are either mesh electrodes or wire-array electrodes. Furthermore, a space between the at least two electrodes is filled with a gas medium and an electric field is created by the power supply in a normal direction relative to planes formed by the elements of electrodes.

Embodiments of the present invention describe electrical potential energy to electrical kinetic energy converters, ozone generators, and light emitters. A system for energy conversion from electrical potential energy to electrical kinetic energy may include a discharge device and a power supply. The power supply can be coupled with the discharge device, and supplies energy to the discharge device to form an initial electric field. The discharge device may further include at least two electrodes that are either mesh electrodes or wire-array electrodes. Furthermore, a space between the at least two electrodes is filled with a gas medium and an electric field is created by the power supply in a normal direction relative to planes formed by the elements of electrodes.

The improved cathode sub-assembly includes a solid cylindrical cathode of tungsten, a cylindrical holder concentric to the cathode with an internal radially directed rib receiving one end of the cathode, and a cylindrical reflector threadably mounted within the holder in circumferentially spaced relation to the cathode. The holder is threadably mounted in a support plate to be able to be readily removed for servicing and/or replacement.

An ion source that may be used to introduce a dopant material into the arc chamber is disclosed. A component containing the dopant material is disposed in the path of an etching gas, which also enters the arc chamber. In some embodiments, the dopant material is in liquid form, and the etching gas travels through the liquid. In other embodiments, the dopant material is a solid material. In some embodiments, the solid material is formed as a porous structure, such that the etching gas flows through the solid material. In other embodiments, one or more components of the ion source are manufactured using a material that includes the dopant material, such that the etching gas etches the component to release the dopant material.

An ion source that may be used to introduce a dopant material into the arc chamber is disclosed. A component containing the dopant material is disposed in the path of an etching gas, which also enters the arc chamber. In some embodiments, the dopant material is in liquid form, and the etching gas travels through the liquid. In other embodiments, the dopant material is a solid material. In some embodiments, the solid material is formed as a porous structure, such that the etching gas flows through the solid material. In other embodiments, one or more components of the ion source are manufactured using a material that includes the dopant material, such that the etching gas etches the component to release the dopant material.

The invention relates to the field of fabrication of new materials and coatings and may be used in plants designed for electron-beam heating, melting and evaporating of materials in vacuum or reactive gas atmosphere. The disclosed axial electron gun that comprises, in particular, the primary and secondary cathodes and features the figure-shaped holder used for maintaining a stable position of the secondary cathode relative to the electron-beam axis of the axial gun and the pulsed voltage that is applied between the cathodes for electron bombardment of the secondary cathode. The invention ensures an improved stability of process parameters and operation of the electron gun.

The embodiments provide a thermionic emission device and a method for tuning a work function in a thermionic emission device is provided. The method includes illuminating an N type semiconductor material of a first member of a thermionic emission device, wherein a work function of the N type semiconductor material is lowered by the illuminating. The method includes collecting, on one of the first member or a second member of the thermionic emission device, electrons emitted from one of the first member or the second member.