Disclosed are methods and devices suitable for producing an electron beam.

Disclosed are methods and devices suitable for producing an electron beam.

Disclosed are methods and devices suitable for generating electron beams and pulses of radiation. Specifically, in some disclosed embodiments, multiple emitting electrodes of a ferroelectric emitter are sequentially activated, generating a relatively long electron beam pulse that is substantially a series of substantially consecutive short electron beam pulses generated by the sequentially-activated individual emitting electrodes.

A plasma source is configured to be in fluid communication with the interior of a vacuum vessel, a vacuum chamber, such as by being installed in a wall of a vacuum vessel that encloses the chamber, or in a pipe that is connected to the chamber. The plasma source may produce plasma in a line of sight of a surface to be cleaned, such as an internal surface of the vessel, which may be used for processes such as deposition or etching.