H01J2229/507

EXTREME-ULTRAVIOLET LIGHT SOURCE DEVICE USING ELECTRON BEAMS
20230122253 · 2023-04-20 ·

An extreme-ultraviolet light source device comprises: a discharge chamber of which the inside is maintained in a vacuum; an electron beam-emitting unit which is located inside the discharge chamber and produces electron beams; and a metal radiator which is located inside the discharge chamber and is ionized by the electron beams. Extreme-ultraviolet radiation occurs in plasma generated from the metal radiator. The electron beam-emitting unit comprises: a cathode electrode; a plurality of emitters located on the cathode electrode and including a carbon-based material; and a gate electrode which is located on the plurality of emitters at a distance therefrom and to which a pulse voltage is applied.

Processor System, Correction Method, and Correction Program
20240222064 · 2024-07-04 ·

A multi-beam charged-particle microscope apparatus 100 includes an irradiation system 104 that irradiates a plurality of regions on a surface of a sample 9 with a plurality of beams, a detection system 125 (correction detector 132 and imaging detector 131) that detects emitted electrons from the surface of the sample 9, and a controller 102 that generates a first brightness of a first pixel in a first region based on a first signal of a first detector of a multi-detector 123 and generates a second brightness of a second pixel in a second region based on a second signal of a second detector. A processor of a processor system 103 that can communicate with the charged-particle microscope apparatus 100 specifies a first crosstalk amount from a second emitted electron to the first signal based on the first brightness obtained from the charged-particle microscope apparatus 100 and an output of the correction detector 132 and corrects the first brightness based on the first crosstalk amount.

Extreme-ultraviolet light source device using electron beams
12451316 · 2025-10-21 · ·

An extreme-ultraviolet light source device comprises: a discharge chamber of which the inside is maintained in a vacuum; an electron beam-emitting unit which is located inside the discharge chamber and produces electron beams; and a metal radiator which is located inside the discharge chamber and is ionized by the electron beams. Extreme-ultraviolet radiation occurs in plasma generated from the metal radiator. The electron beam-emitting unit comprises: a cathode electrode; a plurality of emitters located on the cathode electrode and including a carbon-based material; and a gate electrode which is located on the plurality of emitters at a distance therefrom and to which a pulse voltage is applied.