According to one embodiment, in an X-ray tube, an electron convergence cup has a first surface located closer to the anode, and an electron convergence groove opening on the first surface and housing a filament. The first surface has a first edge located on the opening, and a second edge located on the opening and opposite to the first edge in a first direction. The first edge is closer to an outer peripheral part than the second edge is. When the distance between the first edge and the filament in the first direction is defined as a first distance and the distance between the second edge and the filament in the first direction is defined as a second distance, the first distance is shorter than the second distance.

An X-ray module includes a housing in which an opening portion is formed; an electron gun that emits an electron beam; a target that transmits an X-ray generated when the electron beam is incident on the target and emits the X-ray from an X-ray-emitting surface; an X-ray-emitting window that seals the opening portion, and that transmits the X-ray and emits the X-ray to a first side in an axial direction; and a heat radiating unit disposed outside the housing. The housing includes a surface on which a protrusion protruding to the first side is formed, the opening portion is formed in the protrusion, and the target is disposed in the opening portion. The heat radiating unit includes a first portion extending along the surface and thermally connected to the surface, and a second portion extending from the first portion to a second side opposite the first side.

Methods and systems for realizing a high radiance x-ray source based on a high density electron emitter array are presented herein. The high radiance x-ray source is suitable for high throughput x-ray metrology and inspection in a semiconductor fabrication environment. The high radiance X-ray source includes an array of electron emitters that generate a large electron current focused over a small anode area to generate high radiance X-ray illumination light. In some embodiments, electron current density across the surface of the electron emitter array is at least 0.01 Amperes/mm.sup.2, the electron current is focused onto an anode area with a dimension of maximum extent less than 100 micrometers, and the spacing between emitters is less than 5 micrometers. In another aspect, emitted electrons are accelerated from the array to the anode with a landing energy less than four times the energy of a desired X-ray emission line.

X-ray transparent insulation can be sandwiched between an x-ray window and a ground plate. The x-ray transparent insulation can include aluminum nitride, boron nitride, or polyetherimide. The x-ray transparent insulation can include a curved side. The x-ray transparent insulation can be transparent to x-rays and resistant to x-ray damage, and can have high thermal conductivity. An x-ray window can have high thermal conductivity, high electrical conductivity, high melting point, low cost, and matched coefficient of thermal conductivity with the anode. The x-ray window can be made of tungsten. For consistent x-ray spot size and location, a focusing plate and a filament can be attached to a cathode with an open channel of the focusing plate aligned with a longitudinal dimension of the filament. Tabs of the focusing plate bordering the open channel can be bent to align with a location of the filament.

Provided is a target assembly for an x-ray apparatus comprising a target housing and an entrance path formed in an entrance part of the target housing for accepting an incident electron beam, as well as a target member for generating x-rays under electron beam illumination through the entrance path and an exit path formed in an exit part of the target housing for allowing generated x-rays to exit the target assembly, the exit path being covered by an x-ray transmissive window. In the assembly, the exit path comprises an exit bore formed in the exit part which is configured to limit the generation of x-rays by impact of scattered electrons, which have been reflected from the target member, onto an inside of the bore. Also provided is a target assembly, an x-ray apparatus, a structure measurement apparatus, a structure measurement method, and a method of modifying a target assembly.

An x-ray apparatus includes a vacuum chamber that includes a window for exit of x-rays. Electrons are generated at a cathode within the vacuum chamber and accelerated toward a target anode associated with the window. An x-ray generating layer is included as a surface of the target anode to receive the electrons emitted by the cathode and to create x-rays. A blocking path blocks over 70% of the free electrons reaching said target anode from continuing on to exit through the window, while allowing x-rays leaving the x-ray generating layer to continue along the selectively blocking path to exit through the window. The x-ray apparatus is capable of operating at low voltage and relatively high power to reduce the necessary shielding and the corresponding weight of the apparatus yet allow more ready absorption of x-rays by items being irradiated.

A window portion has a membrane that separates a space inside a container and a space outside the container, and a structure (glass structure) that is bonded to the membrane to support the membrane. The membrane and the structure are bonded by anodic bonding, and a chemical bonding layer is formed between them. The structure is composed of a grid having a plurality of openings, and an outer frame around the grid. A metal layer may be provided between the membrane and the structure.

A method for producing a radiation window includes patterning a photo resist structure onto a double-sided silicon wafer, plasma etching the silicon wafer to create an etched silicon wafer having a silicon supporting structure etched upon a first side of the double-sided silicon wafer, applying a silicon nitride thin film to the etched silicon wafer, patterning a photo resist structure and plasma etching a second side of the double-sided silicon wafer to create an initial window in the silicon nitride thin film, and wet etching the second side of the double-sided silicon wafer to release the silicon nitride thin film and supporting structure from the portion of the double-sided silicon wafer defined by the initial window.

X-ray transparent insulation can be sandwiched between an x-ray window and a ground plate. The x-ray transparent insulation can include aluminum nitride, boron nitride, or polyetherimide. The x-ray transparent insulation can include a curved side. The x-ray transparent insulation can be transparent to x-rays and resistant to x-ray damage, and can have high thermal conductivity. An x-ray window can have high thermal conductivity, high electrical conductivity, high melting point, low cost, and matched coefficient of thermal conductivity with the anode. The x-ray window can be made of tungsten. For consistent x-ray spot size and location, a focusing plate and a filament can be attached to a cathode with an open channel of the focusing plate aligned with a longitudinal dimension of the filament. Tabs of the focusing plate bordering the open channel can be bent to align with a location of the filament.

Methods and systems for realizing a high radiance x-ray source based on a high density electron emitter array are presented herein. The high radiance x-ray source is suitable for high throughput x-ray metrology and inspection in a semiconductor fabrication environment. The high radiance X-ray source includes an array of electron emitters that generate a large electron current focused over a small anode area to generate high radiance X-ray illumination light. In some embodiments, electron current density across the surface of the electron emitter array is at least 0.01 Amperes/mm.sup.2, the electron current is focused onto an anode area with a dimension of maximum extent less than 100 micrometers, and the spacing between emitters is less than 5 micrometers. In another aspect, emitted electrons are accelerated from the array to the anode with a landing energy less than four times the energy of a desired X-ray emission line.