H01J2237/0266

APPARATUS FOR ARCING DIAGNOSIS, PLASMA PROCESS EQUIPMENT INCLUDING THE SAME, AND ARCING DIAGNOSIS METHOD

An apparatus includes first and second VI sensors, an optical sensor, and an arcing detector. The first VI sensor is disposed in a power filter or on a power supply line connected to a heater disposed in a lower electrode of a process chamber in which a plasma process is performed. The first VI sensor senses a harmonic generated from a first power supply supplying power to the lower electrode and outputs a first signal. The optical sensor senses an intensity of light generated from the process chamber and outputs a second signal. The second VI sensor is disposed on a power supply line connected to an upper electrode and senses a harmonic generated from a second power supply supplying power to the upper electrode and outputs a third signal. The arcing detector determines whether arcing occurs based on one or more of the first, second, and third signals.

PARTICLE BEAM SYSTEM
20230109124 · 2023-04-06 ·

A particle beam system comprises a particle beam column, a detection system and a controller. The particle beam column is configured to generate a particle beam and to direct it onto a sample, as a result of which charged particles are emitted by the sample. The detection system detects charged particles and comprises: an electrode, which can accelerate the charged particles; a potential source, which applies an adjustable electrical potential to the electrode; a scintillator; and a light detector, which outputs a detection signal. The controller controls the potential source and is configured to change the potential on the basis of the detection signal such that the scintillator operates outside its saturation and such that the light detector operates outside its saturation.

Charged particle beam device

The present invention provides a charged particle beam apparatus capable of efficiently reducing the effect of a residual magnetic field when SEM observation is performed. The charged particle beam apparatus according to the present invention includes a first mode for passing a direct current to a second coil after turning off a first coil, and a second mode for passing an alternating current to the second coil after turning off the first coil.

Electromagnetic field shielding plate, method for manufacturing same, electromagnetic field shielding structure, and semiconductor manufacturing environment

Provided is an electromagnetic field shielding plate, etc., in which it is possible to reduce weight while achieving high shielding performance from relatively high-frequency electromagnetic fields. The electromagnetic field shielding plate is configured by layering a permalloy layer 3 comprising a plate or sheet of permalloy, and an amorphous layer 1 comprising an Fe—Si—B—Cu—Nb-based amorphous plate or sheet.

Thermoelectric field emission electron source and electron beam application device

To stabilize an emitted electron beam, a thermoelectric field emission electron source includes: an electron source having a needle shape; a metal wire to which the electron source is fixed and configured to heat the electron source; a stem fixed to an insulator and configured to energize the metal wire; a first electrode having a first opening portion and arranged such that a tip of the electron source protrudes from the first opening portion; a second electrode having a second opening portion; and an insulating body configured to position the first electrode and the second electrode such that a central axis of the first opening portion and a central axis of the second opening portion coincide with each other, and to provide electrical insulation between the first and second electrodes, so as to provide a structure that reduces an amount of gas released when the first electrode is heated.

Showerhead shroud

A processing chamber includes an upper surface and a showerhead arranged to supply gases through the upper surface into the processing chamber. At least a portion of the showerhead extends above the upper surface of the processing chamber. A shroud enclosure is arranged on the upper surface of the processing chamber. The shroud enclosure is arranged around the portion of the showerhead extending above the upper surface of the processing chamber and is configured to isolate radio frequency interference generated by the showerhead.

Radio frequency screen for an ultraviolet lamp system

A radio frequency (RF) screen for a microwave powered ultraviolet (UV) lamp system is disclosed. In one example, a disclosed RF screen includes: a sheet comprising a conductive material; and a frame around edges of the sheet. The conductive material defines a predetermined mesh pattern of individual openings across substantially an operative area of the screen. Each of the individual openings has a triangular shape.

XRF analyzer
09775574 · 2017-10-03 · ·

A portable XRF analyzer includes a hand shield to substantially block x-rays from impinging on a hand of a user. The portable XRF analyzer includes a heat sink over an x-ray source and a heat sink over an x-ray detector. The heat sinks are separated from each other by a thermally insulative material.

Charged particle beam apparatus

The present invention realizes a composite charged particle beam apparatus capable of suppressing a leakage magnetic field from a pole piece forming an objective lens of an SEM with a simple structure. The charged particle beam apparatus according to the present invention obtains an ion beam observation image while passing a current to a first coil constituting the objective lens, and performs an operation of reducing the image shift by passing a current to a second coil with a plurality of current values, and determines a current to be passed to the second coil based on a difference between the operations.

THERMOELECTRIC FIELD EMISSION ELECTRON SOURCE AND ELECTRON BEAM APPLICATION DEVICE

To stabilize an amount of electron beam emitted from a thermoelectric field emission electron source. A thermoelectric field emission electron source includes: an electron source 301 having a needle shape; a metal wire 302 to which the electron source is fixed and configured to heat the electron source; a stem 303 fixed to an insulator and configured to energize the metal wire; a first electrode 304 having a first opening portion 304a and arranged such that a tip of the electron source protrudes from the first opening portion; a second electrode 306 having a second opening portion 306a; and an insulating body 307 configured to position the first electrode and the second electrode such that a central axis of the first opening portion and a central axis of the second opening portion coincide with each other, and provide electrical insulation between the first electrode and the second electrode, so as to provide a structure in which an amount of gas released when the first electrode is heated is reduced.